カルーセルスパッタ法を用いた高周波対応貴金属フリーナノグラニュラー薄膜の作製

• Project/Area Number: 25K01274
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Multi-year Fund
• Section: 一般
• Review Section: Basic Section 21050:Electric and electronic materials-related
• Research Institution: Research Institute for Electromagnetic Materials
• Principal Investigator: 直江 正幸 公益財団法人電磁材料研究所, その他部局等, 研究員 (50533725)
• Project Period (FY): 2025-04-01 – 2028-03-31
• Project Status: Adopted (Fiscal Year 2025)
• Budget Amount: ¥18,720,000 (Direct Cost: ¥14,400,000、Indirect Cost: ¥4,320,000); Fiscal Year 2027: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000); Fiscal Year 2026: ¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000); Fiscal Year 2025: ¥12,090,000 (Direct Cost: ¥9,300,000、Indirect Cost: ¥2,790,000)