任意基板上III-V族半導体作製法の新機軸: 完全濡れ金属融液を反応場とする溶液成長

• Project/Area Number: 25K01557
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Multi-year Fund
• Section: 一般
• Review Section: Basic Section 26060:Metals production and resources production-related
• Research Institution: Nagoya University
• Principal Investigator: 勝部 涼司 名古屋大学, 工学研究科, 講師 (10839947)
• Project Period (FY): 2025-04-01 – 2028-03-31
• Project Status: Adopted (Fiscal Year 2025)
• Budget Amount: ¥18,720,000 (Direct Cost: ¥14,400,000、Indirect Cost: ¥4,320,000); Fiscal Year 2027: ¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000); Fiscal Year 2026: ¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000); Fiscal Year 2025: ¥9,360,000 (Direct Cost: ¥7,200,000、Indirect Cost: ¥2,160,000)