Naフラックス法における三次元成長モードを活用したデバイスキラー欠陥抑制技術の開発

• Project/Area Number: 25K01681
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Multi-year Fund
• Section: 一般
• Review Section: Basic Section 30010:Crystal engineering-related
• Research Institution: The University of Osaka
• Principal Investigator: 今西 正幸 大阪大学, 大学院工学研究科, 准教授 (00795487)
• Project Period (FY): 2025-04-01 – 2028-03-31
• Project Status: Adopted (Fiscal Year 2025)
• Budget Amount: ¥18,720,000 (Direct Cost: ¥14,400,000、Indirect Cost: ¥4,320,000); Fiscal Year 2027: ¥5,850,000 (Direct Cost: ¥4,500,000、Indirect Cost: ¥1,350,000); Fiscal Year 2026: ¥5,590,000 (Direct Cost: ¥4,300,000、Indirect Cost: ¥1,290,000); Fiscal Year 2025: ¥7,280,000 (Direct Cost: ¥5,600,000、Indirect Cost: ¥1,680,000)