Study on efficient removal method of microstructure by using high hydrostatic pressure
| Project/Area Number |
26340079
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Multi-year Fund |
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| Section | 一般 |
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| Research Field |
Environmental conscious materials and recycle
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| Research Institution | Soka University |
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Principal Investigator |
Shimizu Akio 創価大学, 理工学部, 教授 (20235641)
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| Project Period (FY) |
2014-04-01 – 2017-03-31
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| Project Status |
Completed (Fiscal Year 2016)
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| Budget Amount *help |
¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000)
Fiscal Year 2016: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2015: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2014: ¥2,080,000 (Direct Cost: ¥1,600,000、Indirect Cost: ¥480,000)
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| Keywords | 高静水圧 / 洗浄 / 微細構造 / 高静水圧処理 / モールド / ナノインプリント / 付着樹脂 / 加圧処理 / 圧力処理 / 樹脂 / 静水圧 |
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| Outline of Final Research Achievements |
Nanoimprint Lithography (NIL) is known as a low cost and simple method to manufacture microstructures. In the technology, there is a problem that the resin adheres, but the efficient removing method have not been reported yet. In this study, I propose the effective removing method of resin adhered on mold by high hydrostatic pressure treatments and its mechanism.
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Report
(4 results)
Research Products
(6 results)
