| Budget Amount *help |
¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000)
Fiscal Year 2016: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2015: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2014: ¥2,080,000 (Direct Cost: ¥1,600,000、Indirect Cost: ¥480,000)
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| Outline of Final Research Achievements |
Nanoimprint Lithography (NIL) is known as a low cost and simple method to manufacture microstructures. In the technology, there is a problem that the resin adheres, but the efficient removing method have not been reported yet. In this study, I propose the effective removing method of resin adhered on mold by high hydrostatic pressure treatments and its mechanism.
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