| Budget Amount *help |
¥5,200,000 (Direct Cost: ¥4,000,000、Indirect Cost: ¥1,200,000)
Fiscal Year 2016: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2015: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2014: ¥2,080,000 (Direct Cost: ¥1,600,000、Indirect Cost: ¥480,000)
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| Outline of Final Research Achievements |
Metallic oxide thin-films made of zinc oxide and silicon oxide, for example, exhibit photochromism (PC) and electrochromism. This study developed the method to fabricate such thin films using plasma processing. Two methods were used. One was the pulsed laser deposition (PLD) method and another was the plasma CVD method. By the PLD method, PC thin films were successfully fabricated on the whole surface of the 30 mm square substrate. For the CVD method, we found that the PC-transformation can be exhibited only by the zinc oxide (ZnO) thin film. The crystal structure of the ZnO PC thin films were examined by the x-ray absorption at the Zn-K edge. It is confirmed that the ionic valence around Zn atoms is changed as a result of the PC-transformation.
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