Investigation of formation mechanism of crystal defects induced by machining at the surface of single crystal SiC
Project/Area Number |
26420071
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Research Category |
Grant-in-Aid for Scientific Research (C)
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Allocation Type | Multi-year Fund |
Section | 一般 |
Research Field |
Production engineering/Processing studies
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Research Institution | Japan Fine Ceramics Center |
Principal Investigator |
ISHIKAWA Yukari 一般財団法人ファインセラミックスセンター, その他部局等, 主席研究員 (60416196)
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Co-Investigator(Kenkyū-buntansha) |
菅原 義弘 一般財団法人ファインセラミックスセンター, その他部局等, 上級研究員 (70466291)
姚 永昭 一般財団法人ファインセラミックスセンター, その他部局等, 上級研究員 (80523935)
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Project Period (FY) |
2014-04-01 – 2017-03-31
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Project Status |
Completed (Fiscal Year 2016)
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Budget Amount *help |
¥5,070,000 (Direct Cost: ¥3,900,000、Indirect Cost: ¥1,170,000)
Fiscal Year 2016: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2015: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
Fiscal Year 2014: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
|
Keywords | 材料工学 / 単結晶 / 加工 / 潜傷 / 転位 / 積層欠陥 / SiC / 欠陥 / EBSD / SiC / ダイヤ |
Outline of Final Research Achievements |
We investigated the defect structures in 4H-SiC single crystal induced by the model machining under control of abrasive motion. Wiresawing with fixed abrasive i.e. machining with abrasive translation uniformly introduced defects: high density defective layer, dislocation half loops, and stacking faults. On the other hand, distributed defects: stacking fault and triangular defective area with dislocation half-loop bundle were formed after wiresawing with loose abrasive i.e. machining with abrasive translation and rotation.
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Report
(4 results)
Research Products
(4 results)
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[Journal Article] Comparison of slicing-induced damage in hexagonal SiC by wire sawing with loose abrasive,wire sawing with fixed abrasive, and electric discharge machining2014
Author(s)
Yukari Ishikawa, Yong-Zhao Yao, Yoshihiro Sugawara, Koji Sato, Yoshihiro Okamoto,Noritaka Hayashi, Benjamin Dierre, Kentaro Watanabe, and Takashi Sekiguchi
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Journal Title
Japanese Journal of Applied Physics
Volume: 53
Issue: 7
Pages: 1-11
DOI
NAID
Related Report
Peer Reviewed / Acknowledgement Compliant
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