| Budget Amount *help |
¥5,070,000 (Direct Cost: ¥3,900,000、Indirect Cost: ¥1,170,000)
Fiscal Year 2016: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2015: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2014: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000)
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| Outline of Final Research Achievements |
The reaction rate of isothermal adsorption / desorption of water vapor was measured for thin film adsorbents coated on a heat transfer plate. The cantilever method and the QCM method were adopted as the measurement apparatus. We confirmed that the temperature dependence of the rate can be represented by Arrhenius plot. In addition, each water vapor transfer resistance in the concentration boundary layer on the surface of the adsorbent and the vapor diffusion in the particle was separated. We clarified that the resistance of the concentration boundary layer was negligible in vapor and that the resistance became sufficiently small when the moist air flow rate was about 0.1 m/s in adsorption or desorption process. Finally, we presented the empirical formula to predict these transfer resistances.
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