| Budget Amount *help |
¥4,940,000 (Direct Cost: ¥3,800,000、Indirect Cost: ¥1,140,000)
Fiscal Year 2016: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2015: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
Fiscal Year 2014: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
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| Outline of Final Research Achievements |
Ion process is significant in the preparation of hard coating materials. In this study, high power pulsed sputter (HPPS) system with a negative pulse bias system for a substrate was constructed and thin hard films such as diamond like carbon (DLC) and TiCN were prepared.
The hardness of DLC films prepared by methane containing HPPS system with a planar target reached 23 GPa. On the other hand, the hardness of DLC films, which were prepared at the pressure less than 1 Pa by HPPS system with a configuration of two facing targets, exceeded 25 GPa and the rate of sp3 C-C bond related area in X-ray photoelectron spectroscopy (XPS) C1s core level spectrum exceeded higher than 40%. Moreover, TiCN films were also prepared by HPPS with a two facing targets, flowing nitrogen gas into the chamber. The hardness of TiCN films reached 33 GPa. Results of XPS analysis indicated the existence of TiC in TiCN films may be significant in the formation of the films with high hardness.
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