Study on diamond SAW with high piezoelectric ScAlN thin film

• Project/Area Number: 26420299
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Electron device/Electronic equipment
• Research Institution: Okinawa National College of Technology (2015-2016); Chiba University (2014)
• Principal Investigator: Fujii Satoshi 沖縄工業高等専門学校, 情報通信システム工学科, 教授 (30598933)
• Co-Investigator(Renkei-kenkyūsha): HASHIMOTO KENYA 千葉大学, 工学研究科, 教授 (90134353) ; OMORI TATSUYA 千葉大学, 工学研究科, 助教 (60302527)
• Project Period (FY): 2014-04-01 – 2017-03-31
• Project Status: Completed (Fiscal Year 2016)
• Budget Amount: ¥4,940,000 (Direct Cost: ¥3,800,000、Indirect Cost: ¥1,140,000); Fiscal Year 2016: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000); Fiscal Year 2015: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000); Fiscal Year 2014: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000)
• Keywords: 弾性表面波 / 圧電薄膜 / ダイヤモンド / マイクロ波工学 / ScAlN薄膜 / RFマグネトロンスパッタ / SAW / 電気機械結合係数 / マグネトロン / 位相ノイズ / ScAlN / RFスパッタリング / ラマン分光 / SAWフィルタ / スパッタリング

Outline of Final Research Achievements

ScAlN thin films were deposited by a conventional radiofrequency (RF)-magnetron sputtering system using two Sc-Al alloy metal targets with different Sc/Al ratios. A 10 h deposition time resulted in highly c-axis-oriented ScAlN thin films with Sc concentrations of 32 at% and 22 at% on Sc0.43-Al0.57 and Sc0.32-Al0.68 targets, respectively. C-axis orientation was lost in thin films deposited on the Sc0.43-Al0.57 target after sputtering times of over 50 h. XDS analysis showed a high-Sc-content ScAlN film with an amorphous phase layer near the Si substrate surface. A seed layer of c-axis-oriented ScAIN allowed for > 50 h deposition on the Sc0.43-Al0.57 target to result in highly c-axis-oriented ScAlN films. A one-port surface acoustic wave (SAW) resonator based on the ScAlN/Si structure has a K2 value of 2.7% at 2 GHz, six times larger than for that based on the AlN/Si structure.

Research Products

• [Journal Article] Injection-Locked Magnetron Using a Cross-Domain Analyzer (2016)
  • Author(s): Satoshi Fujii, Masato M. Maitani, Eiichi Suzuki, Satoshi Chonan, Miho Fukui, Yuji Wada
  • Journal Title: IEEE Microwave and Wireless Components Letters Volume: 26 Issue: 11 Pages: 966-968
  • DOI: 10.1109/lmwc.2016.2615030
  • Peer Reviewed / Open Access
• [Journal Article] Microwave-enhanced photocatalysis on CdS quantum dots - Evidence of acceleration of photoinduced electron transfer (2015)
  • Author(s): Kishimoto, Fuminao; Imai, Takashi; Fujii, Satoshi; Mochizuki, Dai; Maitani, Masato M.; Suzuki, Eiichi; Wada, Yuji
  • Journal Title: SCIENTIFIC REPORTS Volume: 5 Issue: 1 Pages: 11308-11308
  • DOI: 10.1038/srep11308
  • NAID: 120006582428
  • Peer Reviewed / Open Access / Acknowledgement Compliant
• [Journal Article] Sputter Deposition of ScAlN Thin Films Using a Sc-Al Alloy Target (2015)
  • Author(s): M. Sumisaka, K. Yamazaki, S. Fujii, G. Tang, T. Han, Y. Suzuki, S. Otomo, Tatsuya Omori, and K. Hashimoto
  • Journal Title: Japanese Journal of Applied Physics Volume: 54 Issue: 7S1 Pages: 1-5
  • DOI: 10.7567/jjap.54.07hd06
  • Peer Reviewed / Acknowledgement Compliant
• [Journal Article] Microwave sintering of Ag-nanoparticle thin films on a polyimide substrate (2015)
  • Author(s): S. Fujii, S. Kawamura, D. Mochizuki, M. M. Maitani, E. Suzuki, and Y. Wada
  • Journal Title: AIP Advances Volume: 5 Issue: 12 Pages: 127226-127226
  • DOI: 10.1063/1.4939095
  • Peer Reviewed / Open Access / Acknowledgement Compliant
• [Presentation] Study on Metal Refining Process of Sc metal using Microwave Irradiation (2016)
  • Author(s): S. Fujii, S. Tsubaki, E. Suzuki, S. Chonan, M. Fukui, Y. Wada
  • Organizer: Progress In Electromagnetics Research Symposium
  • Place of Presentation: 中国、上海
  • Year and Date: 2016-08-08
  • Int'l Joint Research
• [Presentation] Study on an Injection-Locked Magnetron (2016)
  • Author(s): S. Fujii, M. M. Maitani, E. Suzuki, S. Chonan, M. Fukui, Y. Wada
  • Organizer: IMPI'S 50th Annual Microwave Power Symposium
  • Place of Presentation: アメリカ、フロリダ
  • Year and Date: 2016-06-21
  • Int'l Joint Research
• [Presentation] Study on an Injection-Locked Magnetron (2016)
  • Author(s): Satoshi Fujii, Maitani Masato, Eichi Suzuki, Satoshi Chonan, Miho Fukui, and Yuji Wada
  • Organizer: IMP I’S 50th ANNUAL MICROWAVE POWER SYMPOSIUM
  • Place of Presentation: 米国・フロリダ
  • Year and Date: 2016-06-21
  • Int'l Joint Research
• [Presentation] DEPOSITION OF ScAlN THIN FILM USING RF-SPUTTERING METHOD (2016)
  • Author(s): Satoshi Fujii,Hayate Kadena, and Ken-ya Hashimoto
  • Organizer: The 3rd International Conference of Global Network for Innovative Technology（2016）
  • Place of Presentation: マレーシア・ペナン
  • Year and Date: 2016-01-27
  • Int'l Joint Research
• [Presentation] Sputter Deposition of ScAlN Films by Reactive Sputtering Using Large Size ScAl Alloy Target with High Sc Content -- Impact of Nitridation of Sputtering Target -- (2015)
  • Author(s): K.Hashimoto, M.Sumisaka, K.Yamazaki, S.Fujii, G.B.Tang, T.Han, Y.Suzuki, S.Otomo, and T.Omori
  • Organizer: Proc. Sixth Int’l Symp. on Acoustic Wave Devices for Future Mobile Comm. Systems
  • Place of Presentation: 日本・千葉市
  • Year and Date: 2015-11-24
  • Int'l Joint Research / Invited
• [Presentation] Deposition of ScAlN thin film using dual-sputtering method (2015)
  • Author(s): Satoshi Fujii, Masahiro Sumisaka, Yukihiko Okada, Noriyuki Hasuike, Kenji Kisoda, Hiroshi Harima, Tatsuya Omori, and Ken-ya Hashimoto
  • Organizer: The 36th Symposium on UltraSonic Electronics(USE2015)
  • Place of Presentation: 日本・つくば市
  • Year and Date: 2015-11-16
  • Int'l Joint Research
• [Presentation] Highly C-Axis Oriented ScAlN Thin Films Deposited Using a Sc-Al Alloy Target (2015)
  • Author(s): S. Fujii, M. Sumisaka,G. Tang, Y. Suzuki, S. Otomo, T. Omori, K. Hashimoto
  • Organizer: 2015 International Microwave Symposium
  • Place of Presentation: 米国、アリゾナ州フェニックス
  • Year and Date: 2015-05-17 – 2015-05-22
• [Presentation] Highly C-Axis-Oriented ScAlN Thin Films Deposited Using Sc-Al Alloy Target (2015)
  • Author(s): Satoshi Fujii, Masahiro Sumisaka, Gonbin Tang, Yu Suzuki, Shohei Otomo, Tatsuya Omori, and Ken-ya Hashimoto
  • Organizer: IEEE Microwave Conf. 2015, (IMS2015)
  • Place of Presentation: 米国・フェニックス
  • Year and Date: 2015-05-17
  • Int'l Joint Research
• [Presentation] Sputter Deposition of ScAlN Thin Films Using a Sc-Al Alloy Target (2014)
  • Author(s): M. Sumisaka, S. Fujii, G. Tang, Y. Suzuki, S. Otomo, T. Omori, K. Hashimoto
  • Organizer: 第35回超音波エレクトロニクスの基礎と応用に関するシンポジウム講演論文集(国際学会)
  • Place of Presentation: 日本、東京
  • Year and Date: 2014-12-03 – 2014-12-05
• [Presentation] Deposition of highly c-axis-oriented ScAlN thin films by RF magnetron sputtering using a Sc-Al alloy target (2014)
  • Author(s): S. Fujii, S. Shimizu, M. Sumisaka, Y. Suzuki, S. Otomo, T. Omori, K. Hashimoto
  • Organizer: IEEE International Frequency Control Symposium
  • Place of Presentation: Taipei, Taiwan
  • Year and Date: 2014-05-19 – 2014-05-22
• [Remarks] 東京工業大学リサーチリポジトリ
  • URL: http://t2r2.star.titech.ac.jp/cgi-bin/researcherinfo.cgi?q_researcher_content_number=CTT100679000