| Budget Amount *help |
¥5,070,000 (Direct Cost: ¥3,900,000、Indirect Cost: ¥1,170,000)
Fiscal Year 2016: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2015: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2014: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
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| Outline of Final Research Achievements |
Excimer laser-assisted metal organic deposition is a promising method for realization of low temperature deposition of functional oxide films at low temperature in atmospheric conditions. In order to elucidate the mechanism of photo-assisted crystal growth during irradiation of nano-second pulsed UV laser, which is the key for low temperature deposition, we have developed a high-speed phosphor thermometry to monitor the low temperature field of oxide films under irradiation of a nano-second pulsed UV laser in addition to a high-speed radiation thermometry. We confirmed that the temperature fields drastically changed with the increase in the number of pulses, which is important for understanding photo-assisted crystal growth. We also confirmed that phosphor thermometry could be useful for temperature measurement in photo anneal processing.
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