| Project/Area Number |
26600044
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Multi-year Fund |
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| Research Field |
Nanomaterials engineering
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| Research Institution | Osaka University |
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Principal Investigator |
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| Co-Investigator(Renkei-kenkyūsha) |
Negishi Ryota 大阪大学, 大学院工学研究科, 助教 (30381586)
Shinoda Yoshihiko 若狭湾エネルギー研究センター, 研究開発部, 研究員 (60421468)
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| Project Period (FY) |
2014-04-01 – 2016-03-31
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| Project Status |
Completed (Fiscal Year 2015)
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| Budget Amount *help |
¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2015: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2014: ¥3,120,000 (Direct Cost: ¥2,400,000、Indirect Cost: ¥720,000)
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| Keywords | グラフェン / 酸化グラフェン / 超高温プロセス / 構造修復 / 乱層構造 / 太陽炉 / 還元 / 積層構造 / ラマン分光 / 超高温処理 / 欠陥修復 |
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| Outline of Final Research Achievements |
The restoration of graphitic structures from defective graphene oxide (GO) was examined in a reactive ethanol environment at ultrahigh temperatures up to 1800C. The processed GO thin films exhibit much better features of D- and G-bands in Raman spectra than that for GO processed in inert (N2 or Ar) environment. The stacking order of the processed GO was analyzed by 2D-band shape in Raman spectra. The volume ratio of Bernal stacking in the GO processed in ethanol gave rise to the ratio of ~30 %, which is much smaller than that for the GO processed in inert environment. This result means that ethanol effectively suppresses unfavorable GO graphitization at ultrahigh temperatures and turbostratic structures are preferentially formed. GO thin films processed in ethanol at ultrahigh temperature should be promising process for fabricating turbostratic graphene towards application such as quasi single-layer electronics in future studies.
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