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Development of exciton laser with two-dimensional layered atomically thin films

Research Project

Project/Area Number 26600081
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeMulti-year Fund
Research Field Applied materials
Research InstitutionNational Institute of Advanced Industrial Science and Technology

Principal Investigator

Mori Takahiro  国立研究開発法人産業技術総合研究所, ナノエレクトロニクス研究部門, 研究員 (70443041)

Research Collaborator NINOMIYA Naruki  
Project Period (FY) 2014-04-01 – 2016-03-31
Project Status Completed (Fiscal Year 2015)
Budget Amount *help
¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2015: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2014: ¥2,990,000 (Direct Cost: ¥2,300,000、Indirect Cost: ¥690,000)
Keywords二次元層状物質 / 発光素子 / トランジスタ / 絶縁膜界面 / 遷移金属ダイカルコゲナイド / 二硫化モリブデン / 電界効果トランジスタ / 励起子発光 / 固定電荷
Outline of Final Research Achievements

This research aims to develop high-efficiency laser diode with two-dimensional layered atomically thin films. We intended to utilize emission from excitons bound to fixed charge at film/insulator interface in order to realize high-efficiency light emission. Molybdenum disulfide, which is the representative of two-dimensional layered transition metal dichalcogenides, was utilized in this work. For the interface diagnostics, the electrical characterization was performed with fabricated transistors. We observed strong light emission in photoluminescence measurements; however, we were not able to clarify fixed charge at the interface. This is because our electrical characterization could not distinguish the fixed charge at the interface with charged impurity in the material. For accomplishing the objective of this work, the charged impurity in the material should be reduced in the future projects.

Report

(3 results)
  • 2015 Annual Research Report   Final Research Report ( PDF )
  • 2014 Research-status Report
  • Research Products

    (9 results)

All 2016 2015 2014

All Journal Article (2 results) (of which Peer Reviewed: 2 results,  Acknowledgement Compliant: 2 results) Presentation (7 results) (of which Int'l Joint Research: 1 results,  Invited: 4 results)

  • [Journal Article] Characterization of Effective Mobility and its Degradation Mechanism in MoS2 MOSFETs2016

    • Author(s)
      Takahiro Mori, Naruki Ninomiya, Toshitaka Kubo, Noriyuki Uchida, Eiichiro Watanabe, Daiju Tsuya, Satoshi Moriyama, Masatoshi Tanaka, and Atsushi Ando
    • Journal Title

      IEEE Transactions on Nanotechnology

      Volume: 未定

    • Related Report
      2015 Annual Research Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Journal Article] Fabrication of high-k/metal-gate MoS2 field-effect transistor by device isolation process utilizing Ar-plasma etching2015

    • Author(s)
      N. Ninomiya, T. Mori, N. Uchida, E. Watanabe, D. Tsuya, S. Moriyama, M. Tanaka, and A. Ando
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 54 Issue: 4 Pages: 046502-046502

    • DOI

      10.7567/jjap.54.046502

    • NAID

      210000144937

    • Related Report
      2014 Research-status Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Presentation] 二次元原子膜のトランジスタ応用2016

    • Author(s)
      森貴洋
    • Organizer
      2016年真空・表面科学合同講演会
    • Place of Presentation
      名古屋市
    • Year and Date
      2016-11-29
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] MoS2デバイスの現状と展望2016

    • Author(s)
      森貴洋
    • Organizer
      日本学術振興会ナノプローブテクノロジー第167委員会研究会
    • Place of Presentation
      東京都
    • Year and Date
      2016-06-19
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] 遷移金属ダイカルコゲナイドの極薄ボディMOSFET応用2015

    • Author(s)
      森貴洋、二之宮成樹、内田紀行、久保利隆、渡辺英一郎、津谷大樹、森山悟士、田中正俊、安藤淳
    • Organizer
      第76回応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋市
    • Year and Date
      2015-09-13
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] Characterization of the effective mobility by split C-V technique in MoS2 MOSFETs with high-k/metal gate2015

    • Author(s)
      Takahiro Mori, Naruki Ninomiya, Toshitaka Kubo, Noriyuki Uchida, Eiichiro Watanabe, Daiju Tsuya, Satoshi Moriyama, Masatoshi Tanaka, and Atsushi Ando
    • Organizer
      2015 IEEE International Conference on Nanotechnology
    • Place of Presentation
      イタリア・ローマ
    • Year and Date
      2015-07-27
    • Related Report
      2015 Annual Research Report
    • Int'l Joint Research
  • [Presentation] High-k/MetalゲートMoS2 MOSFETの試作と評価2015

    • Author(s)
      森貴洋、二之宮成樹、内田紀行、久保利隆、渡辺英一郎、津谷大樹、森山悟士、田中正俊、安藤淳
    • Organizer
      電子情報通信学会シリコン材料・デバイス研究会
    • Place of Presentation
      名古屋市
    • Year and Date
      2015-06-19
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] HfO2絶縁膜を用いたMoS2 FETにおける実効移動度の評価2015

    • Author(s)
      二之宮成樹,森貴洋, 内田紀行, 久保利隆, 渡辺英一郎, 津谷大樹, 森山悟士, 田中正俊, 安藤淳
    • Organizer
      2015年第62回応用物理学会春季学術講演会
    • Place of Presentation
      神奈川県平塚市
    • Year and Date
      2015-03-11 – 2015-03-14
    • Related Report
      2014 Research-status Report
  • [Presentation] Investigation of Electrical Characteristics on Top-gate MoS2 MOSFETs with high-k Al2O3 dielectric2014

    • Author(s)
      N. Ninomiya, T. Mori, N. Uchida, E. Watanabe, D. Tsuya, S. Moriyama, M. Tanaka, and A. Ando
    • Organizer
      27th International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      2014-11-04 – 2014-11-07
    • Related Report
      2014 Research-status Report

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Published: 2014-04-04   Modified: 2017-05-10  

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