Investigation of Hydrogen Bond by Bias Noncontact Atomic Force Microscopy/Spectroscopy
| Project/Area Number |
26600098
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Multi-year Fund |
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| Research Field |
Thin film/Surface and interfacial physical properties
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| Research Institution | Kanazawa University |
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Principal Investigator |
ARAI Toyoko 金沢大学, 数物科学系, 教授 (20250235)
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| Project Period (FY) |
2014-04-01 – 2016-03-31
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| Project Status |
Completed (Fiscal Year 2015)
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| Budget Amount *help |
¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
Fiscal Year 2015: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2014: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000)
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| Keywords | 走査型プローブ顕微鏡 / 水素結合 |
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| Outline of Final Research Achievements |
The hydrogen bond was investigated with atomic resolution by a homebuilt non-contact atomic force microscope (nc-AFM) in ultrahigh vacuum. The hydrogen bond [X-H…A] was made with an apex atom of a clean Si tip as a proton acceptor (A) and a proton donor (X-H) adsorbed on a sample substrate. The samples were Si(111)7x7 surfaces adsorbed NH2 group and H group. I identified those adsorption sites from Nc-AFM images, tunneling current images and Δf- distance curves. The maximum covalent bonding force of Si-Si was approximately 1.0 (nN). I estimated that the hydrogen bonding force between the NH2 group and the Si tip [Si-N-H…Si] was approximately 0.05 (nN) and between the H group and the Si tip [Si-H…Si] was approximately 0.1 (nN).
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Report
(3 results)
Research Products
(35 results)
