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Si-channel Hanle-effect spin devices for spin injection and spin transport.

Research Project

Project/Area Number 26630153
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeMulti-year Fund
Research Field Electron device/Electronic equipment
Research InstitutionTokyo Institute of Technology

Principal Investigator

Sugahara Satoshi  東京工業大学, 科学技術創成研究院, 准教授 (40282842)

Project Period (FY) 2014-04-01 – 2017-03-31
Project Status Completed (Fiscal Year 2016)
Budget Amount *help
¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000)
Fiscal Year 2016: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2015: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2014: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Keywordsスピントロニクス / スピン注入 / スピントランジスタ / スピン伝導 / シリコン / スピンデバイス / 非局所デバイス / スピン蓄積効果 / スピン注入源
Outline of Final Research Achievements

Spin injection phenomena for a Si channel employing tunnel-contact-type spin injectors with MgO, TiO2, and HfO2 barriers were investigated. Using three-terminal spin-accumulation devices with these spin injectors, Hanle-effect signals from spin-polarized electrons injected in the device were successfully observed. The Hanle-effect signals were decomposed into channel-spin and trap-spin components. The proportion of the channel-spin component strongly depended on the process condition of the tunnel barriers. In particular, the MgO spin injector fabricated by an optimized process condition exhibited spin injection with only a single channel-spin component. Fabrication processes, spin injection abilities, and other features of spin injectors with TiO2 and HfO2 tunnel barriers were also demonstrated. In addition, the design scheme of a spin injector/detector in four-terminal Hanle-effect Si-channel MOS devices was also established.

Report

(4 results)
  • 2016 Annual Research Report   Final Research Report ( PDF )
  • 2015 Research-status Report
  • 2014 Research-status Report
  • Research Products

    (17 results)

All 2017 2016 2015 2014

All Journal Article (4 results) (of which Peer Reviewed: 4 results,  Acknowledgement Compliant: 3 results) Presentation (13 results) (of which Int'l Joint Research: 6 results)

  • [Journal Article] abrication and characterization of a spin injector using a high-quality B2-ordered-Co2FeSi0.5Al0.5 /MgO /Si tunnel contact2015

    • Author(s)
      Yu Kawame, Taiju Akushichi, Yota Takamura, Yusuke Shuto, and Satoshi Sugahara
    • Journal Title

      J. Appl. Phys.

      Volume: 117

    • Related Report
      2015 Research-status Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Journal Article] Spin accumulation in Si channels using CoFe/MgO/Si and CoFe/AlOx/Si tunnel contacts with high quality tunnel barriers prepared by radical-oxygen annealing2015

    • Author(s)
      Taiju Akushichi, Yota Takamura, Yusuke Shuto, and Satoshi Sugahara
    • Journal Title

      J. Appl. Phys.

      Volume: 117

    • Related Report
      2015 Research-status Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Journal Article] Analysis and design of nonlocal spin devices with bias-induced spin-transport acceleration2015

    • Author(s)
      Yota Takamura, Taiju Akushichi, Yusuke Shuto, and Satoshi Sugahara
    • Journal Title

      J. Appl. Phys.

      Volume: 117

    • Related Report
      2015 Research-status Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Journal Article] Analysis of Hanle-effect signals observed in Si-channel spin accumulation devices2014

    • Author(s)
      6.Y. Takamura, T. Akushichi, A. Sadano, T. Okihio, Y. Shuto, and S. Sugahara
    • Journal Title

      J. Appl. Phys

      Volume: 115 Issue: 17

    • DOI

      10.1063/1.4868502

    • NAID

      120006582326

    • Related Report
      2014 Research-status Report
    • Peer Reviewed
  • [Presentation] Analysis of Spin Accumulation in a Si Channel Using CoFe/MgO/Si Spin Injectors2017

    • Author(s)
      T. Akushichi, D. Kitagata, Y. Shuto, and S. Sugahara
    • Organizer
      Electron Device Technology and Manufacturing Conference
    • Place of Presentation
      Toyama, Japan
    • Year and Date
      2017-02-28
    • Related Report
      2016 Annual Research Report
    • Int'l Joint Research
  • [Presentation] 電界アシスト4端子非局所MOSデバイスの解析と設計2016

    • Author(s)
      北形大樹,悪七泰樹,菅原聡
    • Organizer
      第21回スピン工学の基礎と応用 (PASPS-21)
    • Place of Presentation
      札幌市
    • Year and Date
      2016-12-12
    • Related Report
      2016 Annual Research Report
  • [Presentation] Robust Design of Electric-field-assisted Nonlocal Si-MOS Spin-devices2016

    • Author(s)
      D. Kitagata, T. Akushichi, Y. Takamura, Y. Shuto, and S. Sugahara
    • Organizer
      2016 IEEE Silicon Nanoelectronics Workshop (SNW 2016)
    • Place of Presentation
      Honolulu, USA
    • Year and Date
      2016-06-12
    • Related Report
      2016 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Spin Accumulation in a Si Channel using High-Quality CoFe/MgO/Si Spin Injectors2016

    • Author(s)
      T. Akushichi, D. Kitagata, Y. Takamura, Y. Shuto, and S. Sugahara
    • Organizer
      2016 IEEE Silicon Nanoelectronics Workshop (SNW 2016)
    • Place of Presentation
      Honolulu, USA
    • Year and Date
      2016-06-12
    • Related Report
      2016 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Spin injection into silicon using CoFe/TiO2/Si tunnel contacts2016

    • Author(s)
      Y. Ikuse, T. Akushichi, Y. Shuto, Y. Takamura, and S. Sugahara
    • Organizer
      The 13th Joint MMM-Intermag Conference
    • Place of Presentation
      San Diego, CA, USA
    • Year and Date
      2016-01-11
    • Related Report
      2015 Research-status Report
    • Int'l Joint Research
  • [Presentation] Design of electric-field-assisted nonlocal silicon-channel spin devices2015

    • Author(s)
      D. Kitagata, T. Akushichi, Y. Takamura, Y. Shuto, and S. Sugahara
    • Organizer
      第20回スピン工学の基礎と応用 (PASPS-20)
    • Place of Presentation
      仙台市, 宮城
    • Year and Date
      2015-12-03
    • Related Report
      2015 Research-status Report
  • [Presentation] Fabrication of high quality Co2FeSi0.5Al0.5/CoFe/MgO/Si tunnel contacts for Si-channel spin devices2015

    • Author(s)
      T. Kondo, T. Akushichi, Y. Takamura, Y. Shuto, and S. Sugahara
    • Organizer
      第20回スピン工学の基礎と応用 (PASPS-20)
    • Place of Presentation
      仙台市, 宮城
    • Year and Date
      2015-12-03
    • Related Report
      2015 Research-status Report
  • [Presentation] CoFe/TiO2/Siトンネルコンタクトを用いたSiへのスピン注入2015

    • Author(s)
      生瀬裕之, 悪七泰樹, 周藤悠介, 髙村陽太, 菅原聡
    • Organizer
      第20回スピン工学の基礎と応用 (PASPS-20)
    • Place of Presentation
      仙台市, 宮城
    • Year and Date
      2015-12-03
    • Related Report
      2015 Research-status Report
  • [Presentation] Design and analysis of electric-field-assisted nonlocal silicon-channel spin devices2015

    • Author(s)
      Daiki Kitagata, Taiju Akushichi, Yota Takamura, Yusuke Shuto, Satoshi Sugahara
    • Organizer
      2015 IEEE Silicon Nanoelectronics Workshop (SNW2015)
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2015-06-14
    • Related Report
      2015 Research-status Report
    • Int'l Joint Research
  • [Presentation] Fabrication of high-quality Co2FeSi0.5Al0.5/CoFe/MgO/Si spin injectors for Si-channel spin devices2015

    • Author(s)
      Tsuyoshi Kondo, Yu Kawame, Yota Takamura, Yusuke Shuto, Satoshi Sugahara
    • Organizer
      2015 IEEE Silicon Nanoelectronics Workshop (SNW2015)
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2015-06-14
    • Related Report
      2015 Research-status Report
    • Int'l Joint Research
  • [Presentation] Spin accumulation in Si channels using CoFe/MgO/Si and CoFe/AlOx/Si tunnel contacts with high quality tunnel barriers prepared by radical-oxygen annealing2014

    • Author(s)
      Taiju Akushichi, Yota Takamura, Yusuke Shuto, and Satoshi Sugahara
    • Organizer
      59th Annual Magnetism and Magnetic Materials Conference (MMM2014)
    • Place of Presentation
      Honolulu, HI, USA
    • Year and Date
      2014-11-03 – 2014-11-07
    • Related Report
      2014 Research-status Report
  • [Presentation] “Fabrication of a CoFe/TiO2/Si tunnel contact and its spin-injector application2014

    • Author(s)
      Yusuke Shuto, Katsunori Takahashi, Taiju Akushichi, and Satoshi Sugahara
    • Organizer
      59th Annual Magnetism and Magnetic Materials Conference (MMM2014)
    • Place of Presentation
      Honolulu, HI, USA
    • Year and Date
      2014-11-03 – 2014-11-07
    • Related Report
      2014 Research-status Report
  • [Presentation] Analysis and design of nonlocal spin devices with bias-induced spin-transport acceleration2014

    • Author(s)
      Yota Takamura, Taiju Akushichi, Yusuke Shuto, and Satoshi Sugahara
    • Organizer
      59th Annual Magnetism and Magnetic Materials Conference (MMM2014)
    • Place of Presentation
      Honolulu, HI, USA
    • Year and Date
      2014-11-03 – 2014-11-07
    • Related Report
      2014 Research-status Report

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Published: 2014-04-04   Modified: 2018-03-22  

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