Single-electron devices based on codoped silicon nanocrystals
Project/Area Number |
26886008
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Research Category |
Grant-in-Aid for Research Activity Start-up
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Allocation Type | Single-year Grants |
Research Field |
Nanostructural physics
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Research Institution | Kobe University |
Principal Investigator |
Kano Shinya 神戸大学, 工学(系)研究科(研究院), 助教 (20734198)
|
Project Period (FY) |
2014-08-29 – 2016-03-31
|
Project Status |
Completed (Fiscal Year 2015)
|
Budget Amount *help |
¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Fiscal Year 2015: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2014: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
|
Keywords | 単電子トランジスタ / シリコンナノ結晶 / ボトムアップ / ナノギャップ / クーロンブロッケード / 自己組織化 / 選択吸着 / クーロンダイアモンド / 電子デバイス / ナノ結晶 |
Outline of Final Research Achievements |
The purpose of this research is to fabricate single-electron devices by bottom-up processes using all-inorganic co-doped silicon nanocrystals. Fabricated single-electron transistor consists of co-doped silicon nanocrystals (diameter: 7 nm), Au nanogap electrodes, and self-assembled monolayers. The single-electron transistor shows Coulomb diamonds in a stability diagram at a temperature of 9 K. This result indicates that multiple co-doped silicon nanocrystals are involved in a current transport of the device.
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Report
(3 results)
Research Products
(16 results)
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[Patent(Industrial Property Rights)] ナノデバイス2014
Inventor(s)
真島豊、寺西利治、加納伸也、青山詠樹
Industrial Property Rights Holder
真島豊、寺西利治、加納伸也、青山詠樹
Industrial Property Rights Type
特許
Industrial Property Number
2014-176634
Filing Date
2014-08-29
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