Development of Soft X-Ray Sources and Optical Elements for X-Ray Lithography
| Project/Area Number |
59850007
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| Research Category |
Grant-in-Aid for Developmental Scientific Research
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| Allocation Type | Single-year Grants |
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| Research Field |
物理計測・光学
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| Research Institution | Tohoku University |
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Principal Investigator |
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| Project Period (FY) |
1984 – 1985
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| Project Status |
Completed (Fiscal Year 1985)
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| Budget Amount *help |
¥8,700,000 (Direct Cost: ¥8,700,000)
Fiscal Year 1985: ¥2,900,000 (Direct Cost: ¥2,900,000)
Fiscal Year 1984: ¥5,800,000 (Direct Cost: ¥5,800,000)
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| Keywords | lithography / soft x-rays / multilayer / mirror / laser-produced plasma / 軟X線光源 |
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| Research Abstract |
Laser-produced plasmas generated on Fe, W, Sm, Yb targets by a Qswitched Nd:YAG laser (Quanta-Ray DCR-2(10)) have been studied for the purpose of a soft x-ray source for x-ray lithography. 20-30 degree angle of incidence of laser beam to the target was found to be best compromise between a contamination level og a mask fue to deposition of target material and a useful level of the soft x-ray output. With 60-90 sec (600-900 pulses) exposures using a Fe target, a polyimide supported resolution-test pattern in gold for 0.0005 mm resolution was fully reproduced in photo-resist (Hitachi Kasei RE-5000P), showing a resolution of 500 nm or better.
Multilayer mirrors were fabricated by ion-beam sputtering, which was in-situ monitored by an ellipsometer having 0.01 nm thickness sensitivity. A Mo-Si 27-layer mirror showed a peak reflectivity of 17.5% at a wavelength of 13.8 nm at normal incidence (9.6 degrees). Using a WYCO surface profiler, RMS roughness of the substrates and the multilayers was found to be about 0.6nm.
The soft x-ray source and the multilayer mirror thus developed have shown their potentiality for the application to soft x-ray lithography.
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Report
(1 results)
Research Products
(6 results)
