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Development of a new ion-beam sputtering apparatus and its application for scanning electron microscopy.

Research Project

Project/Area Number 59870002
Research Category

Grant-in-Aid for Developmental Scientific Research

Allocation TypeSingle-year Grants
Research Field General anatomy (including Histology/Embryology)
Research InstitutionTottori University School of Medicine

Principal Investigator

TANAKA Keiichi  Tottori University School of Medicine, 医学部, 教授 (00031948)

Co-Investigator(Kenkyū-buntansha) MITSUSHIMA Akira  Tottori University School of Medicine, 医学部, 助手 (80116376)
森 金太郎  日立工機(株), 精機部, 主任技師
MORI Kintaro  Hitachi Koki,Co.Ltd.
Project Period (FY) 1984 – 1986
Project Status Completed (Fiscal Year 1986)
Budget Amount *help
¥7,100,000 (Direct Cost: ¥7,100,000)
Fiscal Year 1986: ¥800,000 (Direct Cost: ¥800,000)
Fiscal Year 1985: ¥1,000,000 (Direct Cost: ¥1,000,000)
Fiscal Year 1984: ¥5,300,000 (Direct Cost: ¥5,300,000)
Keywordsion beam / metal deposition / scanning electron microscope / high resolution / ultra fine grain / 白金 / 蒸着 / 高分解能走査電子顕微鏡
Research Abstract

An ion beam sputter coater for high resolution scanning electron microscopy was newly developed. It is equipped with a specimen chamber (an ion beam gun, a specimen stage, metal targets and a thickness monitor), control units and a vacuum system. With this apparatus, very thin metal film which is composed of fine platinum particles of about 15-20 A in diameter was obtained. The size of the particles is much smaller than that obtained by ordinary ion sputter coater (50-60 A in diameter). Tantalum and tungsten can be also used as coating metals. On observation with an ultra high resolution scanning electron microscope, the specimens which had been thinly coated by the new coater provided enough conductivity and yield of secondary electrons for taking pictures in good contrast. Thus the newly developed ion beam sputter coater have very high ability in compare with the ordinary ion sputter coater and it exercises its power at ultra high resolution scanning electron microscopy. In the future, this apparatus surely become a necessary in this research field.

Report

(2 results)
  • 1986 Final Research Report Summary
  • 1985 Annual Research Report
  • Research Products

    (5 results)

All Other

All Publications (5 results)

  • [Publications] 田中敬一,満嶋明,森金太郎: 医生物走査電顕. 13. 15-16 (1984)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1986 Final Research Report Summary
  • [Publications] 田中敬一,満嶋明,森金太郎: 14. 60-63 (1985)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1986 Final Research Report Summary
  • [Publications] K. TANAKA, A. MITSUSHIMA and K. MORI: "A new apparatus of ion-beam sputtering deposition for electron microscopy." Biomedical SEM. 13. 15-16 (1984)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1986 Final Research Report Summary
  • [Publications] A. MITSUSHIMA, K.TANAKA and K. MORI: "An experiment on ion-beam deposition --Pt grain siz and its applicability for SEM" Biomedical SEM. 14. 60-61 (1985)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1986 Final Research Report Summary
  • [Publications] 医生物走査電顕. 14-1. (1985)

    • Related Report
      1985 Annual Research Report

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Published: 1987-03-31   Modified: 2016-04-21  

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