Film formation by thermoelectron activation RF ion plating and it's controle.
| Project/Area Number |
60550502
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| Research Category |
Grant-in-Aid for General Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Research Field |
金属材料(含表面処理・腐食防食)
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| Research Institution | Faculty of Engineering, Ibaraki University. |
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Principal Investigator |
URAO Ryoichi Ibaraki University, Associate professor., 工学部, 助教授 (10007776)
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| Project Period (FY) |
1985 – 1986
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| Project Status |
Completed (Fiscal Year 1986)
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| Budget Amount *help |
¥1,000,000 (Direct Cost: ¥1,000,000)
Fiscal Year 1986: ¥400,000 (Direct Cost: ¥400,000)
Fiscal Year 1985: ¥600,000 (Direct Cost: ¥600,000)
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| Keywords | Ion plating / Dry plating / coating / RF plasma / 窒化チタン |
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| Research Abstract |
A tungsten filament to emit thermoelectrons was installed to a radio frequency ion plating apparatus. Using this apparatus, a steel and Zn-Al eutectic alloy were coated with TiN by thermoelectron activation RF ion plating method. Vias voltages of -200 to -400 are applied. The voltages have fairly large effects on the crystal orientation of TiN TiN films. Gas pressure can be lowered to 3/ <10^(-4)> torr. Gas pressure and deposition rate relates to film colour and composition.
Using the same apparatus, Zr, Nb and Al were ion plated in nitogen gas atmosphere, These metals have high melting points or high thermal conductivity, so RF source of high power is needed to melt and evapolate the metals with a water cooled copper hearth.
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Report
(1 results)
Research Products
(4 results)
