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Production of a Large Diameter Plasma with a Lisitano Coil

Research Project

Project/Area Number 63880002
Research Category

Grant-in-Aid for Developmental Scientific Research

Allocation TypeSingle-year Grants
Research Field プラズマ理工学
Research InstitutionKyushu University

Principal Investigator

KAWAI Yoshinobu  Kyushu University, Interdisciplinary Graduate School of Engineering Sciences, Professor, 大学院総合理工学研究科, 教授 (10038565)

Co-Investigator(Kenkyū-buntansha) TANAKA Masayoshi  Kyushu University, Interdisciplinary Graduate School of Engineering Sciences, Re, 大学院総合理工学研究科, 助手 (90163576)
KOMORI Akio  Kyushu University, Interdisciplinary Graduate School of Engineering Sciences, As, 大学院総合理工学研究科, 助教授 (50143011)
Project Period (FY) 1988 – 1989
Project Status Completed (Fiscal Year 1989)
Budget Amount *help
¥7,000,000 (Direct Cost: ¥7,000,000)
Fiscal Year 1989: ¥1,800,000 (Direct Cost: ¥1,800,000)
Fiscal Year 1988: ¥5,200,000 (Direct Cost: ¥5,200,000)
KeywordsLisitano Coil / ECR Plasma / Plasma CVD / Microwave / ECRプラズマ / リジターノコイル / 大口径プラズマ / スパッタリング
Research Abstract

A large diameter ECR plasma is produced with a Lisitano coil and the mechanism of the plasma production is studied experimentally and theoretically. The experiments on plasma CVD using the Lisitano coil are also performed. The main results are as follows. 1. The mechanism of the production of a large diameter ECR plasma is clarified by measuring electromagnetic fields distributions radiated from the Lisitano coil with small antennas. 2. A 45 cm-diameter uniform plasma is realized by controlling ECR points even with a small Lisitano coil (diameter 9 cm). 3. An ECR plasma is usually used at relatively low pressures. It is necessary for plasma CVD, however, to produce the plasma at high pressures. We succeed in producing an ECR plasma at 20 mTorr by increasing the microwave power. 4. Uniform carbon films are formed on 5 inch silicon wafers by the ECR plasma CVD using H_2-CH_4 gas mixture. The deposition rate is examined as a function of pressure, gas mixing rate, and substrate temperature.
It is concluded from these results that a Lisitano coil is suitable for the ECR plasma CVD. Moreover, the results obtained in this experiment will be useful for the requirement of larger diameters of thin films, which is one of the most important subjects in such an industrial application as plasma processing.

Report

(3 results)
  • 1989 Annual Research Report   Final Research Report Summary
  • 1988 Annual Research Report
  • Research Products

    (11 results)

All Other

All Publications (11 results)

  • [Publications] 西本竜樹: "境界のあるプラズマにおける電子サイクロトロン波の分散関係、電磁場分布および偏波度" 九州大学総合理工学研究科報告. 11. 13-19 (1989)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1989 Final Research Report Summary
  • [Publications] Akio Komori: "ECR Plasma Production with a Lisitano Coil" Proc.of 1989 Int.Conf.on Plasma Phys.(New Delhi). 3. 1197-1200 (1989)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1989 Final Research Report Summary
  • [Publications] Masayoshi Tanaka: "Over-Dense Plasma Production Using Electron Cyclotron Waves" Proc.of 1989 Int.Conf.on Plasma Phys.(New Delhi). 3. 1225-1228 (1989)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1989 Final Research Report Summary
  • [Publications] Ryuji Nishimoto, Nobuhiro Harada, Masayoshi Tanaka and Yoshinobu Kawai: "Dispersion Relation, Field Profiles and Polarizations of Electron Cyclotron Wave in Bounded Plasmas" Engineering Sciences Reports, Kyushu Univ., 11, 13-19, 1989.

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1989 Final Research Report Summary
  • [Publications] Akio Komori, Yasuaki Takada, Akira Yonesu and Yoshinobu Kawai: "ECR Plasma Production with a Lisitano Coil" Proc. of 1989 Int. Conf. on Plasma Phys. (New Delhi), 3, 1197-1200, 1989.

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1989 Final Research Report Summary
  • [Publications] Masayoshi Tanaka, Ryuji Nishimoto, Nobuhiro Harada, Akio Komori and Yoshinobu Kawai: "Over-Dense Plasma Production Using Electron Cyclotron Waves" Proc. of 1989 Int. Conf. on Plasma Phys. (New Delhi), 3, 1225-1228, 1989.

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1989 Final Research Report Summary
  • [Publications] 西本竜樹: "境界のあるプラズマにおける電子サイクロトロン波の分散関係、電磁場分布および偏波度" 九州大学総合理工学研究所科報告. 11. 13-19 (1989)

    • Related Report
      1989 Annual Research Report
  • [Publications] Akio Komori: "ECR Plasma Production with a Lisitano Coil" Proc.of 1989 Int.Conf.on Plasma Phys.(New Delhi). 3. 1197-1200 (1989)

    • Related Report
      1989 Annual Research Report
  • [Publications] Masayoshi Tanaka: "Over-Denes Plasma Production Using Electron Cyclotron Waves" Proc.of 1989 Int.Conf.on Plasma Phys.(New Delhi). 3. 1225-1228 (1989)

    • Related Report
      1989 Annual Research Report
  • [Publications] Akira Yonesu: Jpn.J.Appl.Phys.27. 1427-1487 (1988)

    • Related Report
      1988 Annual Research Report
  • [Publications] Akira Yonesu: Jpn.J.Appl.Phys.27. 1746-1749 (1988)

    • Related Report
      1988 Annual Research Report

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Published: 1988-04-01   Modified: 2016-04-21  

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