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二ホウ化物薄膜のエピタキシャル成長における機能元素の解明

Publicly Offered Research

Project AreaNano Materials Science for Atomic Scale Modification
Project/Area Number 22015008
Research Category

Grant-in-Aid for Scientific Research on Priority Areas

Allocation TypeSingle-year Grants
Review Section Science and Engineering
Research InstitutionJapan Advanced Institute of Science and Technology

Principal Investigator

高村 由起子 (山田 由起子)  Japan Advanced Institute of Science and Technology, マテリアルサイエンス研究科, 講師 (90344720)

Project Period (FY) 2010 – 2011
Project Status Completed (Fiscal Year 2011)
Budget Amount *help
¥3,800,000 (Direct Cost: ¥3,800,000)
Fiscal Year 2011: ¥1,900,000 (Direct Cost: ¥1,900,000)
Fiscal Year 2010: ¥1,900,000 (Direct Cost: ¥1,900,000)
Keywordsエピタキシー / 二ホウ化物 / 薄膜 / 気相成長 / 走査トンネル顕微鏡 / 機能元素 / 導電性セラミックス / シリコン
Research Abstract

本研究では、超高真空化学気相エピタキシー(UHV-CVE)法による二ホウ化物薄膜のエピタキシャル成長に果たす機能元素の役割を解明し、薄膜の高品質化を目指す。金属二ホウ化物は高融点と高電気・熱伝導率を合わせ持つ導電性セラミックス材料であり、薄膜化することで、格子整合性に優れるIII族窒化物半導体の反射層、拡散防止層としての機能を兼ね備えた成長バッファ層や耐熱電極等、他の材料とのインテグレーションが可能となる。高純度ボロハイドライド蒸気を原料としたUHV-CVE法は、固体を原料とするプロセスでは避け難い酸素の混入を低減し、高純度かつ単結晶配向している二ホウ化物薄膜の成長を可能にした。更なる薄膜の高品質化を目的として、元素も含めた原子レベルでの表面・界面微細構造を明らかにし、得られた知見をもとに成長表面への積極的な機能元素付与など、プロセスへのフィードバックを試みる。今年度は、二ホウ化物薄膜の成長表面に基板由来のシリコンが存在することを放射光施設(BL-18A、KEK-PF)における表面敏感・高分解能Si_2p内殻準位光電子分光から明らかにした。このシリコンが機能元素として(0001)面を安定化・不活性化し、気相からの薄膜成長がテラス端から進んで行くために、広い領域において原子レベルで平坦な膜が得られていると考えられる。また、走査トンネル顕微鏡による成長表面の詳細な観察から、(0001)配向していない結晶粒の側面に観察された再構成構造がこの面を安定化し、異配向粒の一方向への成長を促していることが示唆された。異配向粒の成長端は(0001)配向結晶のテラス端と比較して小さいため、薄膜の高品質化にはこの異配向粒の成長を抑制するために二次核生成が起きない程度に気体原料を多く供給し、早い速度で成長することが望ましいとの結論が得られた。

Report

(1 results)
  • 2010 Annual Research Report
  • Research Products

    (16 results)

All 2011 2010

All Journal Article (1 results) (of which Peer Reviewed: 1 results) Presentation (15 results)

  • [Journal Article] Scanning tunneling microscopy investigations of the epitaxial growth of ZrB_2 on Si(111)2011

    • Author(s)
      A.Fleurence, Y.Yamada-Takamura
    • Journal Title

      Physica Status Solidi(c)

      Volume: 8 Pages: 779-783

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Presentation] 二ホウ化ジルコニウム薄膜上シリセンの構造と電子状態2011

    • Author(s)
      高村(山田)由起子, アントワーヌフロランス, 川井弘之, 王鷹, 尾崎泰助, ライナーフリードライン
    • Organizer
      2011年春季第58回応用物理学関係連合講演会
    • Place of Presentation
      神奈川工科大学
    • Year and Date
      2011-03-25
    • Related Report
      2010 Annual Research Report
  • [Presentation] Epitaxial silicene formed on single-crystalline ZrB_2 thin films : structure and electronic properties2011

    • Author(s)
      A.Fleurence, R.Friedlein, Y.Wang, Y.Yamada-Takamura
    • Organizer
      American Physical Society March Meeting 2011
    • Place of Presentation
      Dallas, U.S.A.
    • Year and Date
      2011-03-24
    • Related Report
      2010 Annual Research Report
  • [Presentation] Epitaxial Silicene on Diboride Thin Film2011

    • Author(s)
      Yukiko Yamada-Takamura, Antoine Fleurence, Hiroyuki Kawai, Ying Wang, Taisuke Ozaki, Rainer Friedlein
    • Organizer
      The 2011 WPI-AIMR Annual Workshop
    • Place of Presentation
      Sendai, Japan(poster presentation)
    • Year and Date
      2011-02-22
    • Related Report
      2010 Annual Research Report
  • [Presentation] Experimental evidence for silicene on ZrB_2(0001)2011

    • Author(s)
      A.Fleurence, R.Friedlein, Y.Wang, Y.Yamada-Takamura
    • Organizer
      Symposium on Surface and Nano Science 2011 (SSNS'11)
    • Place of Presentation
      Shizukuishi, Japan
    • Year and Date
      2011-01-21
    • Related Report
      2010 Annual Research Report
  • [Presentation] Diboride thin films : growth, structure, and surface2011

    • Author(s)
      Y.Yamada-Takamura
    • Organizer
      3rd Annual CNSI-JAIST Workshop
    • Place of Presentation
      Los Angeles, U.S.A(招待講演)
    • Year and Date
      2011-01-14
    • Related Report
      2010 Annual Research Report
  • [Presentation] Diboride thin films : growth, structure, and surface2010

    • Author(s)
      Y.Yamada-Takamura
    • Organizer
      Friday Lunch Seminar, National Synchrotron Light Source
    • Place of Presentation
      Brookhaven National Laboratory, U.S.A.(招待講演)
    • Year and Date
      2010-12-03
    • Related Report
      2010 Annual Research Report
  • [Presentation] Crystal orientations of ZrB_2 thin films epitaxially grown on Si(111)2010

    • Author(s)
      Y.Yamada-Takamura, W.Y.Zhang, A.Fleurence
    • Organizer
      2010 Materials Research Society Fall Meeting
    • Place of Presentation
      Boston, U.S.A.
    • Year and Date
      2010-11-29
    • Related Report
      2010 Annual Research Report
  • [Presentation] Self-ordered silicene formed by surface segregation on ZrB_2(0001)/Si(111)2010

    • Author(s)
      A.Fleurence, R.Friedlein, Y.Wang, F.Bussolotti, Y.Yamada-Takamura
    • Organizer
      JAIST International Symposium on Nano Technology 2010
    • Place of Presentation
      Nomi, Japan(poster presentation)
    • Year and Date
      2010-09-30
    • Related Report
      2010 Annual Research Report
  • [Presentation] Surface study of ZrB_2 thin films grown on Si(111)2010

    • Author(s)
      A.Fleurence, W.Y.Zhang, Y.Wang, R.Friedlein, Y.Yamada-Takamura
    • Organizer
      European Conference on Surface Science 27 (ECOSS27)
    • Place of Presentation
      Groningen, Netherlands
    • Year and Date
      2010-08-31
    • Related Report
      2010 Annual Research Report
  • [Presentation] Study of the structural and electronic properties of epitaxial Si layers on ZrB_2 thin films2010

    • Author(s)
      A.Fleurence, W.Y.Zhang, Y.Wang, R.Friedlein, Y.Yamada-Takamura
    • Organizer
      18th International Vacuum Congress (IVC-18)
    • Place of Presentation
      Beijing, China
    • Year and Date
      2010-08-26
    • Related Report
      2010 Annual Research Report
  • [Presentation] Growth of single-crystalline ZrB_2 thin films on Si(111)2010

    • Author(s)
      Y.Yamada-Takamura, A.Fleurence, W.Zhang
    • Organizer
      18th International Vacuum Congress (IVC-18)
    • Place of Presentation
      Beijing, China
    • Year and Date
      2010-08-25
    • Related Report
      2010 Annual Research Report
  • [Presentation] Epitaxial diboride thin films for integration with III-nitrides2010

    • Author(s)
      Y.Yamada-Takamura
    • Organizer
      Seminar at Professor Daimon Research group, NAIST
    • Place of Presentation
      Nara, Japan(招待講演)
    • Year and Date
      2010-07-23
    • Related Report
      2010 Annual Research Report
  • [Presentation] Epitaxial Si layer on ZrB_2 thin films-structural and electronic properties2010

    • Author(s)
      A.Fleurence, W.Y.Zhang, Y.Wang, R.Friedlein, Y.Yamada-Takamura
    • Organizer
      70th Physical Electronics Conference (PEC2010)
    • Place of Presentation
      Milwaukee, U.S.A.
    • Year and Date
      2010-06-18
    • Related Report
      2010 Annual Research Report
  • [Presentation] Scanning tunneling microscopy investigations of epitaxial growth of ZrB_2 on Si(111)2010

    • Author(s)
      A.Fleurence, W.Zhang, Y.Yamada-Takamura
    • Organizer
      European Materials Research Society 2010 Spring Meeting
    • Place of Presentation
      Strasbourg, France
    • Year and Date
      2010-06-09
    • Related Report
      2010 Annual Research Report
  • [Presentation] Growth Process of Zirconium Diboride Thin Films Prepared by Ultrahigh-Vacuum CVD2010

    • Author(s)
      Y.Yamada-Takamura, S.Bera
    • Organizer
      The 37th International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2010)
    • Place of Presentation
      San Diego, U.S.A.
    • Year and Date
      2010-04-26
    • Related Report
      2010 Annual Research Report

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Published: 2010-08-23   Modified: 2018-03-28  

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