プラズマによる原子スケール構造制御の理論・シミュレーション研究

• Project Area: Creation of Science of Plasma Nano-Interface Interactions
• Project/Area Number: 22110508
• Research Category: Grant-in-Aid for Scientific Research on Innovative Areas (Research in a proposed research area)
• Allocation Type: Single-year Grants
• Review Section: Science and Engineering
• Research Institution: Osaka University
• Principal Investigator: 浜口 智志 大阪大学, 大学院・工学研究科, 教授 (60301826)
• Project Period (FY): 2010 – 2011
• Project Status: Completed (Fiscal Year 2011)
• Budget Amount: ¥13,520,000 (Direct Cost: ¥10,400,000、Indirect Cost: ¥3,120,000); Fiscal Year 2011: ¥6,760,000 (Direct Cost: ¥5,200,000、Indirect Cost: ¥1,560,000); Fiscal Year 2010: ¥6,760,000 (Direct Cost: ¥5,200,000、Indirect Cost: ¥1,560,000)
• Keywords: プラズマ / 分子動力学シミュレーション / プラズマ表面相互作用 / イオンビーム / 反応性イオンエッチング / ダイヤモンドライクカーボン

Research Abstract

本研究では、プラズマ照射下という極めて強い非平衡状態における物質表面・界面近傍のナノスケールの自発的構造形成機構の解明と、そのナノ界面の近傍の「揺らぎ」の関係を、原子レベルシミュレーションとイオンビーム実験を用いて明らかにするととを目的とする。本年度は、昨年度に引き続き、半導体エッチングプロセスにおけるイオン照射と表面化学反応の相乗効果について議論した。イオン衝撃により、ナノメートルスケールで、原子の運動の揺らぎがきわめて大きくなり、化学反応がピコ(10^<-12>)秒程度の間、きわめて活性化し、通常の熱平衡系では得られない化学反応が誘起される。本研究では、特に、シリコン窒化膜のハイドロフロロカーボン(CHxFy)プラズマによるエッチングプロセスを例にとり、講論した。シリコシ窒化膜は、シリコンの選択酵化(LOCOS)プロセスのマスク材や、キャパシタの絶縁膜、層間絶縁膜、ゲートのサイドウォールのような保護膜、ひずみシリコンのFETチャネルを形成するためにキャップ層材料、エッチングやCMP(化学機械研磨)プロセスのエンドポイント検出膜(ストッパ膜)等として、様々な半導体デバイスに用いられている。窒化膜エッチングの表面反応過程を分子動力学シミュレーションによって解析し、シリコン窒化膜エッチングプロセスにおける水素の殺割を解明することを目的とした。シミュレーションでは、Si_3N_4の基板の数値モデルを作成し、入射イオン種として、CH_2F^+など、数種類のイオン種を一定の入射エネルギーでモデル基板に照射した際のスパッタリングイールドや表面状態を計測した。これらの結果より、入射イオン中の水素は、窒化膜上に堆積される炭素膜の厚さの調整に大きな影響を与えることが明らかとなった。

Research Products

• [Journal Article] Si damage due to oblique-angle ion impact relevant for vertical gate etching processes (2012)
  • Author(s): Tomoko Ito, Kazuhiro Karahashi, Song-Yun Kang, Satoshi Hamaguchi
  • Journal Title: Jpn.J.Appl.Phys. Volume: (掲載確定)
  • NAID: 210000141076
  • Peer Reviewed
• [Journal Article] Dependence of catalytic properties of Indium-implanted SiO2 thin films on the energy and dose of incident Indium ions (2012)
  • Author(s): S.Yoshimura, M.Kiuchi, Y.Nishimoto, M.Yasuda, A.Baba, S.Hamaguchi
  • Journal Title: Thin Solid Films Volume: (掲載確定)
  • Peer Reviewed
• [Journal Article] Sputtering yields of CaO, SrO, and BaO by monochromatic noble gas ion bombardment (2012)
  • Author(s): S.Yoshimura, K.Hine, M.Kiuchi, J.Hashimoto, M.Terauchi, Y.Honda, M.Nishitani, S.Hamaguchi
  • Journal Title: Jpn.J.Appl.Phys. Volume: (掲載確定)
  • NAID: 210000072700
  • Peer Reviewed
• [Journal Article] Low energy metal ion beam production with a modified Freeman-type ion source for development of novel catalysts (2012)
  • Author(s): S.Yoshimura, M.Kiuchi, Y.Nishimoto, M.Yasuda, A.Baba, S.Hamaguchi
  • Journal Title: e-J.Surf.Sci.Nanotech.(2012) Volume: (掲載確定)
  • Peer Reviewed
• [Journal Article] Extracellular Matrix Patterning for Cell Alignment by Atmospheric Pressure Plasma Jets (2012)
  • Author(s): Ayumi Ando, Toshifumi Asano, Md.Abu Sayed, Ryugo Tero, Katsuhisa Kitano, Tsuneo Urisu, Satoshi Hamaguchi
  • Journal Title: Jpn.J.Appl.Phys. Volume: 51
  • NAID: 40019199845
  • Peer Reviewed
• [Journal Article] Experimental evaluation of CaO, SrO, and BaO sputtering yields by Ne or Xe ions (2011)
  • Author(s): S.Yoshimura, K.Hine, M.Kiuchi, J.Hashimoto, M.Terauchi, Y.Honda, M.Nishitani, S.Hamaguchi
  • Journal Title: J.Phys.D : Appl.Phys Volume: 44
  • Peer Reviewed
• [Journal Article] Electron density measurement of inductively coupled plasmas by terahertz time-domain spectroscopy (THz-TDS) (2011)
  • Author(s): Ayumi Ando, Tomoko Kurose, Vivien Reymond, Katsuhisa Kitano, Hideaki Kitahara, Keisuke Takano, Masahiko Tani, Masanori Hangyo, Satoshi Hamaguchi
  • Journal Title: J.Appl.Phys. Volume: 110
  • NAID: 120006955425
  • Peer Reviewed
• [Journal Article] Micro pattern formation of extracellular-matrix (ECM) layers by atmospheric-pressure plasmas and cell culture on the patterned ECMs (2011)
  • Author(s): Ayumi Ando, Tomoko Kurose, Vivien Reymond, Katsuhisa Kitano, Hideaki Kitahara, Keisuke Takaao, Masahiko Tani, Masanori Hangyo, Satoshi Hamaguchi
  • Journal Title: J.Phys.D : Appl.Phys. Volume: 44
  • Peer Reviewed
• [Journal Article] Arrangement of PC12 cells on a silicon chip via extracellular matrix (ECM) layer patterning by atmospheric pressure plasmas (2011)
  • Author(s): Ayumi Ando, Hidetaka Uno, Toshifumi Asano, Tsuneo Urisu, Satoshi Hamaguchi
  • Journal Title: Plasma Fusion Res. Volume: 6
  • NAID: 130002059489
  • Peer Reviewed
• [Journal Article] Plasma Microchannel and Jet Enhanced by an Array of Ellipsoidal Microcavities (2011)
  • Author(s): D.-S.Lee, O.Sakai, S.-J.Park, J.G.Eden, S.Hamaguchi
  • Journal Title: IEEE Trans.Plasma Sci. Volume: 39 Pages: 2690-2691
  • Peer Reviewed
• [Journal Article] Improvement of Hydrophilicity of Interconnected Porous Hydroxyapatite by Dielectric Barrier Discharge Plasma Treatment (2011)
  • Author(s): Dae-Sung Lee, Yu Moriguchi, Kiyoshi Okada, Akira Myoui, Hideki Yoshikawa, Satoshi Hamaguchi
  • Journal Title: IEEE Trans.Plasma Sci. Volume: 39 Pages: 2166-2167
  • Peer Reviewed
• [Journal Article] Dynamics of Near-Atmospheric Pressure Hydrogen Plasmas Driven by Pulsed High Voltages (2011)
  • Author(s): Chieh-Wen Lo, Satoshi Hamaguchi
  • Journal Title: IEEE Trans.Plasma Sci Volume: 39 Pages: 2100-2101
  • Peer Reviewed
• [Journal Article] Rapid Breakdown-Mechanisms of Open Air Nanosecond Dielectric Barrier Discharges (2011)
  • Author(s): Tsuyohito Ito, Tatsuya Kanazawa, Satoshi Hamaguchi
  • Journal Title: Phys.Rev.Lett. Volume: 107
  • NAID: 120006955423
  • Peer Reviewed
• [Journal Article] Hydrogen effects in hydrofluorocarbon plasma etching of silicon nitride : Beam study with CF^+, CF2^+, CHF_2^+, and CH_2F^+ ions (2011)
  • Author(s): Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi, Satoshi Hamaguchi
  • Journal Title: J.Vac.Sci.Technol.A Volume: 29
  • Peer Reviewed
• [Journal Article] Numerical analyses of hydrogen plasma generation by nanosecond pulsed high voltages at near-atmospheric pressure (2011)
  • Author(s): Chieh-Wen Lo, Satoshi Hamaguchi
  • Journal Title: J.Phys.D : Appl.Phys. Volume: 44
  • Peer Reviewed
• [Journal Article] Si recess of Poly-Si Gate Etching : Damage Enhanced by Ion Assisted Oxygen Diffusion (2011)
  • Author(s): Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi, Satoshi Hamaguchi
  • Journal Title: Jpn.J.Appl.Phys. Volume: 50
  • Peer Reviewed
• [Journal Article] プラズマ医療におけるプラズマ生体相互作用 (2011)
  • Author(s): 浜口智志
  • Journal Title: J.Plasma Fusion Res. Volume: 87 Pages: 696-703
  • NAID: 110008750649
  • Peer Reviewed
• [Journal Article] 講座原子分子データベースの構築と利用:はじめに:-原子分子データベースの概要とプラズマ研究への応用- (2011)
  • Author(s): 村上泉, 長壁正樹, 池田勝則, 西浦正樹, 小田昭紀, 菅原広剛, 浜口智志
  • Journal Title: J.Plasma Fusion Res Volume: 88 Pages: 35-47
  • Peer Reviewed
• [Journal Article] Reverse Propagation of Atmospheric Pressure Plasma Jets (2010)
  • Author(s): Tsuyohito Ito, Aurelien Raddenzati, Artabaze Shams, Satoshi Hamaguchi
  • Journal Title: Jpn.J.Appl.Phys. Volume: 49
  • NAID: 40017341196
  • Peer Reviewed
• [Journal Article] Plasma-surface Interactions in Material Processing (2010)
  • Author(s): S.Hamaguchi
  • Journal Title: J.Phys.Conf.Series Volume: 257
  • Peer Reviewed
• [Journal Article] Novel catalysts : indium implanted SiO2 thin films (2010)
  • Author(s): S.Yoshimura, K.Hine, M.Kiuchi, Y.Nishimoto, M.Yasuda, A.Baba, S.Hamaguchi
  • Journal Title: Appl.Surf.Sci. Volume: 257 Pages: 192-196
  • Peer Reviewed
• [Journal Article] Protein pattering by atmospheric-pressure plasmas (2010)
  • Author(s): A.Ando, A.Sayed, T.Asano, R.Tero, K.Kitano, T.Urisu, S.Hamaguchi
  • Journal Title: J.Phys.: Conf.Series Volume: 227
  • Peer Reviewed
• [Journal Article] Effects of Hydrogen Incorporation in the Formation of Hydrogenated Diamond-like Carbon Films (2010)
  • Author(s): Y.Murakami, K.Hosaka, S.Hamaguchi
  • Journal Title: J.Phys.: Conf.Series Volume: 232
  • Peer Reviewed
• [Journal Article] Evaluation of Si etching yields by Cl^+, Br^+, and HBr^+ ion irradiation (2010)
  • Author(s): Tomoko Ito, Kazuhiro Karahashi, Song-Yun Kang, Satoshi Hamaguchi
  • Journal Title: J.Phys.: Conf.Series Volume: 232
  • Peer Reviewed
• [Journal Article] Particle-in-Cell Simulations of High-Pressure Hydrogen Plasmas Driven by Nano-second Pulsed High-Voltages (2010)
  • Author(s): C.W.Lo, S.Hamaguchi
  • Journal Title: J.Phys.: Conf.Series Volume: 232
  • Peer Reviewed
• [Journal Article] Effect of light irradiation from inductively coupled Ar plasma on etching yields of SiO_2 film by CF_3 ion beam injections (2010)
  • Author(s): S.Yoshimura, Y.Tsukazaki, K.Ikuse, M.Kiuchi, S.Hamaguchi
  • Journal Title: J.Phys.: Conference Series Volume: 232
  • Peer Reviewed
• [Journal Article] Electron density measurement for plasmas by Terahertz time-domain spectroscopy (2010)
  • Author(s): A.Ando, H.Kitahara, T.Kurose, K.Kitano, K.Takano, M.Tani, M.Hangyo, S.Hamaguchi
  • Journal Title: J.Phys.: Conf.Series Volume: 227
  • Peer Reviewed
• [Journal Article] Electric field measurements in near-atmospheric pressure nitrogen and air based on a four-wave mixing scheme (2010)
  • Author(s): S.Mueller, T.Ito, K.Kobayashi, D.Luggenholscher, U.Czarnetzki, S.Hamaguchi
  • Journal Title: J.Phys.: Conf.Series Volume: 227
  • Peer Reviewed
• [Journal Article] Molecular dynamics simulation of the formation of sp3 hybridized bonds in hydrogenated diamond-like carbon deposition processes (2010)
  • Author(s): Y.Murakami, S.Horiguchi, S.Hamaguchi
  • Journal Title: Phys.Rev.E. Volume: 81
  • Peer Reviewed
• [Journal Article] Facile Creation of Biointerface on Commodity Plastic Surface by Combination of Atmospheric Plasma and Reactive Polymer Coating (2010)
  • Author(s): Naoki Kanayama, Swapan Kumar Saha, Naoki Nakayama, Jun Nakanishi, Katsuhisa Kitano, Satoshi Hamaguchi, Yukiko Nagasaki
  • Journal Title: J.Photopolymer Sci.Tecb. Volume: 23 Pages: 579-583
  • NAID: 130004833370
  • Peer Reviewed
• [Presentation] 低エネルギーイオンビーム照射によるPMMAエッチングイールドの測定と水素プラズマ暴露のエッチングイールドへの影響 (2012)
  • Author(s): 吉村智
  • Organizer: 第59回応用物理学関係連合講演会
  • Place of Presentation: 早稲田大学(東京都)
  • Year and Date: 2012-03-15
• [Presentation] 大気圧放電に接した水中における活性酸素・活性窒素種の化学反応シミュレーション (2012)
  • Author(s): 金澤龍也
  • Organizer: 第59回応用物理学関係連合講演会
  • Place of Presentation: 早稲田大学(東京都)
  • Year and Date: 2012-03-15
• [Presentation] ヘテロエピタキシャルダイヤモンド成長のためのIr(100)/MgOへの低エネルギー炭素イオン照射 (2012)
  • Author(s): 井谷司
  • Organizer: 第59回応用物理学関係連合講演会
  • Place of Presentation: 早稲田大学(東京都)
  • Year and Date: 2012-03-15
• [Presentation] 水素イオン入射によるシリコン中の増速酸化プロセスの入射エネルギー依存性 (2012)
  • Author(s): 溝谷浩平
  • Organizer: 第59回応用物理学関係連合講演会
  • Place of Presentation: 早稲田大学(東京都)
  • Year and Date: 2012-03-15
• [Presentation] メタノールプラズマプロセス中のイオン照射によるFeCoBエッチング反応 (2012)
  • Author(s): 唐橋一浩
  • Organizer: 第59回応用物理学関係連合講演会
  • Place of Presentation: 早稲田大学(東京都)
  • Year and Date: 2012-03-15
• [Presentation] フロロカーボンイオン照射におけるSiNx:H膜中の水素の含有率の違いによるエッチング反応への影響 (2012)
  • Author(s): 伊藤智子
  • Organizer: 第59回応用物理学関係連合講演会
  • Place of Presentation: 早稲田大学(東京都)
  • Year and Date: 2012-03-15
• [Presentation] Ion beam studies on plasma-surface interactions (2012)
  • Author(s): S.Hamaguchi
  • Organizer: Semiconductor Research Corporation (SRC) & Tokyo Electron (TEL) Workshop on Future Materials and Processes for Nanotechnology
  • Place of Presentation: Tokyo, Japan
  • Year and Date: 2012-02-17
• [Presentation] 磁気抵抗メモリ(MRAM)高集積化のための選択性エッチング機構の解明 (2012)
  • Author(s): 伊藤智子
  • Organizer: STARCフォーラム/シンポジウム2011「ライフ&グリーンイノベーション領域への挑戦」
  • Place of Presentation: 新横浜国際ホテル(神奈川)
  • Year and Date: 2012-02-01
• [Presentation] Applications of non-equilibrium plasmas in medicine (2012)
  • Author(s): S.Hamaguchi
  • Organizer: International Symposium for 25th Anniversary of H-mode Bifurcation Theory
  • Place of Presentation: Fukuoka, Japan(招待講演)
  • Year and Date: 2012-01-24
• [Presentation] Numerical analysis of silicon oxidation processes enhanced by energetic hydrogen ion injections (2012)
  • Author(s): Kohei Mizotani
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing
  • Place of Presentation: Nara, Japan
  • Year and Date: 2012-01-16
• [Presentation] Effects of Thermostat Algorithms for Cooling and Relaxation Processes in MD Simulation (2012)
  • Author(s): Keita Miyake
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing
  • Place of Presentation: Nara, Japan
  • Year and Date: 2012-01-16
• [Presentation] Etching reactions of magnetic materials (Ni, Co) in methanol plasma etching processes (2012)
  • Author(s): Kazuhiro Karahashi
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing
  • Place of Presentation: Nara, Japan
  • Year and Date: 2012-01-16
• [Presentation] Si damage by grazing ion incidence during plasma etching processes (2012)
  • Author(s): Tomoko Ito
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing
  • Place of Presentation: Nara, Japan
  • Year and Date: 2012-01-16
• [Presentation] Low-energy carbon-ion injection into Ir(100)/MgO for hetero-epitaxial growth of diamond (2012)
  • Author(s): T.Itani
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing
  • Place of Presentation: Nara, Japan
  • Year and Date: 2012-01-16
• [Presentation] Low energy mass-selected metal ion beam production with a modified Freeman-type ion source (2012)
  • Author(s): Y.Yoshimura
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing
  • Place of Presentation: Nara, Japan
  • Year and Date: 2012-01-16
• [Presentation] Trapping of hydrogen in silicon near the surface resulting from simultaneous bombardment of argon and hydrogen ions (2012)
  • Author(s): C.Thomas
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing
  • Place of Presentation: Nara, Japan
  • Year and Date: 2012-01-16
• [Presentation] Mass-selected ion beam system for the study of beam-surface interaction (2012)
  • Author(s): Hu Li
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing
  • Place of Presentation: Nara, Japan
  • Year and Date: 2012-01-16
• [Presentation] Arrangement of PC12 cells on extracellular matrix (ECM) layers patterned by atmospheric pressure plasmas (2012)
  • Author(s): Ayumi Ando
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing
  • Place of Presentation: Nara, Japan
  • Year and Date: 2012-01-16
• [Presentation] Zero-Dimensional Reaction Simulations of Reactive Oxygen Species in Water (2012)
  • Author(s): Tatsuya Kanazawa
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing
  • Place of Presentation: Nara, Japan
  • Year and Date: 2012-01-16
• [Presentation] Molecular dynamic simulation for enhancement of Si_3N_4/SiO_2 etching selectivity by incorporation of hydrogen in fluorocarbon-based plasmas (2012)
  • Author(s): Ryota Shigekawa
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing
  • Place of Presentation: Nara, Japan
  • Year and Date: 2012-01-16
• [Presentation] Plasma-Tissue Interaction-Roles of Bio-interfaces in Plasma Medicine (2011)
  • Author(s): S.Hamaguchi
  • Organizer: 21st Material Research Society Japan
  • Place of Presentation: Yokohama, Japan(招待講演)
  • Year and Date: 2011-12-19
• [Presentation] Extracellular matrix (ECM) patterning by atmospheric-pressure plasmas for arranging neuronal cells on silicon substrates (2011)
  • Author(s): Ayumi Ando
  • Organizer: Plasma Conference 2011
  • Place of Presentation: Kanazawa, Japan(招待講演)
  • Year and Date: 2011-11-22
• [Presentation] Study of plasma-surface reactions by a multi beam system (2011)
  • Author(s): Kazuhiro Karahashi
  • Organizer: Plasma Conference 2011
  • Place of Presentation: Kanazawa, Japan(招待講演)
  • Year and Date: 2011-11-22
• [Presentation] Etching reactions of magnetic thin films by ion irradiation Etching reactions of magnetic thin films by ion irradiation (2011)
  • Author(s): Tomoko Ito
  • Organizer: Plasma Conference 2011
  • Place of Presentation: Kanazawa, Japan
  • Year and Date: 2011-11-22
• [Presentation] 新しいプラズマ科学技術:ライフイノベーションへの挑戦:イントロダクション (2011)
  • Author(s): 浜口智志
  • Organizer: Plasma Conference 2011
  • Place of Presentation: 石川県立音楽堂(金沢市)
  • Year and Date: 2011-11-22
• [Presentation] Enhancement of hydrogen trapping by heavier ion bombardment in silicon (111) surfaces (2011)
  • Author(s): C.Thomas
  • Organizer: 64th Annual Gaseous Electronics Conference
  • Place of Presentation: Salt Lake City, Utah, USA
  • Year and Date: 2011-11-14
• [Presentation] Laser electric field measurement in open-air dielectric barrier discharges (2011)
  • Author(s): Tsuyohito Ito
  • Organizer: 64th Annual Gaseous Electronics Conference
  • Place of Presentation: Salt Lake City, Utah, USA
  • Year and Date: 2011-11-14
• [Presentation] Low energy mass-selected metal ion beam production with a modified Freeman-type ion source for the development of novel catalysts (2011)
  • Author(s): S.Yoshimura
  • Organizer: 6^<th> International Symposium on Surface Science and Nanotechnology
  • Place of Presentation: Tokyo Japan
  • Year and Date: 2011-11-11
• [Presentation] Etching reactions of Ni and Ta films by CO^+, C^+, O^+ and OH^+ ion irradiation (2011)
  • Author(s): Kazuhiro Karahashi
  • Organizer: The 33nd International Symposium on Dry Process
  • Place of Presentation: Kyoto, Japan
  • Year and Date: 2011-11-10
• [Presentation] Si damage due to oblique-a gle ion impact relevant for vertical gate etching processes (2011)
  • Author(s): Tomoko Ito
  • Organizer: The 33nd International Symposium on Dry Process
  • Place of Presentation: Kyoto, Japan
  • Year and Date: 2011-11-10
• [Presentation] Enhancement of Si_3N_4/SiO_2 etching selectivity by incorporation of hydrogen in fluorocarbon-based plasmas : comparison of numerical simulation with beam experiments (2011)
  • Author(s): Ryota Shigekawa
  • Organizer: The 33nd International Symposium on Dry Process
  • Place of Presentation: Kyoto, Japan
  • Year and Date: 2011-11-10
• [Presentation] Measurement of MgO, CaO, SrO, and BaO sputtering yields by noble gas ions for plasma display panel cells (2011)
  • Author(s): S.Yoshimura
  • Organizer: The 33nd International Symposium on Dry Process
  • Place of Presentation: Kyoto, Japan
  • Year and Date: 2011-11-10
• [Presentation] Optimization and characterization of surface properties of interconnected porous hydroxyapatite via plasma treatment (2011)
  • Author(s): D.-S.Lee
  • Organizer: The 33nd International Symposium on Dry Process
  • Place of Presentation: Kyoto, Japan
  • Year and Date: 2011-11-10
• [Presentation] Plasma Surface Treatment of Artificial Bones and its Application to Regenerative Medicine (2011)
  • Author(s): S.Hamaguchi
  • Organizer: 8th International Conference on Flow Dynamics
  • Place of Presentation: Sendai, Japan(招待講演)
  • Year and Date: 2011-11-09
• [Presentation] Ion beam studies on plasma-surface interactions (2011)
  • Author(s): S.Hamaguchi
  • Organizer: Semiconductor Research Corporation (SRC) CEMPI Back End Processes Review
  • Place of Presentation: Denton, TX, USA
  • Year and Date: 2011-11-07
• [Presentation] Mechanisms of selective etching for magnetic materials : Ni, Co and Ta etching by carbon monoxide/methyl alcohol based plasmas (2011)
  • Author(s): Kazuhiro Karahashi
  • Organizer: American Vacuum Society 58th International Symposium & Exhibition
  • Place of Presentation: Nashville, USA
  • Year and Date: 2011-10-30
• [Presentation] Characteristics of silicon nitride etching by reactive plasmas containing CHxFy ions (2011)
  • Author(s): Tomoko Ito
  • Organizer: American Vacuum Society 58th International Symposium & Exhibition
  • Place of Presentation: Nashville, USA
  • Year and Date: 2011-10-30
• [Presentation] Numerical Simulation of Enhanced Oxygen Diffusion in Silicon as a Cause of Si Recess (2011)
  • Author(s): Kohei Mizotani
  • Organizer: American Vacuum Society 58th International Symposium & Exhibition
  • Place of Presentation: Nashville, USA
  • Year and Date: 2011-10-30
• [Presentation] Molecular dynamic simulation for selective etching of silicon nitride and silicon oxide by hydrofluorocarbon ions (2011)
  • Author(s): Ryota Shigekawa
  • Organizer: American Vacuum Society 58th International Symposium & Exhibition
  • Place of Presentation: Nashville, USA
  • Year and Date: 2011-10-30
• [Presentation] Recent development of plasma medicine (2011)
  • Author(s): S.Hamaguchi
  • Organizer: 2011 Northeastern Asian Symposium on Plasma Fusion
  • Place of Presentation: Daejeon, Korea(招待講演)
  • Year and Date: 2011-09-25
• [Presentation] Molecular dynamics (MD) simulation for semiconductor nanotechnology (2011)
  • Author(s): S.Hamaguchi
  • Organizer: Intemational Symposium on Renewable Energy & Materials Tailoring
  • Place of Presentation: Kyoto, Japan(招待講演)
  • Year and Date: 2011-09-18
• [Presentation] Ionization-front propagation in nano-second pulsed plasmas near atmospheric pressure : analyses by particle-in-cell (PIC) simulation (2011)
  • Author(s): S.Hamaguchi
  • Organizer: the 22nd International Conference on Numerical Simulation of Plasmas
  • Place of Presentation: Long Branch, NJ.USA(招待講演)
  • Year and Date: 2011-09-07
• [Presentation] プラズマ医療の現状と課題 (2011)
  • Author(s): 浜口智志
  • Organizer: 第885回Technical Seminar
  • Place of Presentation: 総評会館(東京)(招待講演)
  • Year and Date: 2011-08-31
• [Presentation] HCl^+,HB^+およびSiCl_x^+イオン照射によるSiエッチング反応の評価 (2011)
  • Author(s): 伊藤智子
  • Organizer: 第72回応用物理学術講演会
  • Place of Presentation: 山形大学
  • Year and Date: 2011-08-29
• [Presentation] メタノールプラズマエッチングプロセス中のイオン照射によるNi薄膜酸化過程の解析 (2011)
  • Author(s): 唐橋一浩
  • Organizer: 第72回応用物理学術講演会
  • Place of Presentation: 山形大学
  • Year and Date: 2011-08-29
• [Presentation] 水素イオン入射によるシリコン中の増速酸化プロセスの数値解析 (2011)
  • Author(s): 溝谷浩平
  • Organizer: 第72回応用物理学術講演会
  • Place of Presentation: 山形大学
  • Year and Date: 2011-08-29
• [Presentation] 低圧誘電体バリア放電プラズマ処理による連通多孔体ハイドロキシアパタイトの効果的表面改質 (2011)
  • Author(s): Daesung Lee
  • Organizer: 第72回応用物理学術講演会
  • Place of Presentation: 山形大学
  • Year and Date: 2011-08-29
• [Presentation] 大気圧プラズマによる培養液中の長寿命ラジカル生成と細胞増殖効果 (2011)
  • Author(s): 増田一仁
  • Organizer: 第72回応用物理学術講演会
  • Place of Presentation: 山形大学
  • Year and Date: 2011-08-29
• [Presentation] SiNエッチングにおける水素反応:分子動力学シミュレーション解析 (2011)
  • Author(s): 重川遼太
  • Organizer: 第72回応用物理学術講演会
  • Place of Presentation: 山形大学
  • Year and Date: 2011-08-29
• [Presentation] インジウム照射SiO2基板の触媒効果の入射エネルギー依存性 (2011)
  • Author(s): 吉村智
  • Organizer: 第72回応用物理学術講演会
  • Place of Presentation: 山形大学
  • Year and Date: 2011-08-29
• [Presentation] Plasma medicine in orthopaedics (2011)
  • Author(s): S.Hamaguchi
  • Organizer: the 1st International Symposium for Plasma Biosciences
  • Place of Presentation: Seul, Korea(招待講演)
  • Year and Date: 2011-08-14
• [Presentation] Dielectric barrier discharge plasma treatment of biomaterial surfaces for orthopaedic applications (2011)
  • Author(s): D.-S.Lee
  • Organizer: the 1st International Symposium for Plasma Biosciences
  • Place of Presentation: Seul, Korea
  • Year and Date: 2011-08-14
• [Presentation] Patterning of an extracellular matrix (ECM) layer on silicon by atmospheric-pressure plasmas for living neuron network chip fabrication (2011)
  • Author(s): Ayumi Ando
  • Organizer: The 20th International Symposium on Plasma Chemistry
  • Place of Presentation: Philadelphia, USA
  • Year and Date: 2011-07-24
• [Presentation] Plasma Irradiation Effects on Cells, Tissues, and Biomaterials in Orthopaedic Applications (2011)
  • Author(s): Kazuto Masuda
  • Organizer: The 20th International Symposium on Plasma Chemistry
  • Place of Presentation: Philadelphia, USA
  • Year and Date: 2011-07-24
• [Presentation] Particle-in-cell (PIC) simulation analysis of the ionization-front propagation in the formation phase of a nano-second pulsed atmospheric-pressure hydrogen plasma (2011)
  • Author(s): Satoshi Hamaguchi
  • Organizer: The 20th International Symposium on Plasma Chemistry
  • Place of Presentation: Philadelphia, USA
  • Year and Date: 2011-07-24
• [Presentation] Helium-Oxygen Plasma Treatment of Interconnected Porous Hydroxyapatite as a Material for Artificial Bones (2011)
  • Author(s): Dae-Sung Lee
  • Organizer: the 24th Symposium on Plasma Science for Materials
  • Place of Presentation: Osaka, Japan
  • Year and Date: 2011-07-19
• [Presentation] Hydrogen trapping enhanced by ion induced damages in silicon (2011)
  • Author(s): C.Thomas
  • Organizer: the 3rd International Conference on Microelectronics and Plasma Technology
  • Place of Presentation: Dalian, China
  • Year and Date: 2011-07-04
• [Presentation] Discharge Formation Mechanisms of Nano-Second High-Pressure Hydrogen Discharges (2011)
  • Author(s): S.Hamaguchi
  • Organizer: the 3rd International Conference on Microelectronics and Plasma Technology
  • Place of Presentation: Dalian, China
  • Year and Date: 2011-07-04
• [Presentation] カーボン堆積膜の密着性解析 (2011)
  • Author(s): 松隈正明
  • Organizer: 第1回マルチスケールマテリアルモデリングシンポジウム・第16回分子動力学シンポジウム
  • Place of Presentation: 大阪大学
  • Year and Date: 2011-05-23
• [Presentation] 水素希釈炭化水素プラズマによるDLC薄膜堆積プロセスの分子動力学シミュレーション解析 (2011)
  • Author(s): 村上泰夫
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学、神奈川県厚木市
  • Year and Date: 2011-03-24
• [Presentation] Si酸化反応における水素イオン照射効果 (2011)
  • Author(s): 伊藤智子
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学、神奈川県厚木市
  • Year and Date: 2011-03-24
• [Presentation] CO+イオンによるCo,NiおよびTaエッチング反応 (2011)
  • Author(s): 唐橋一浩
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学、神奈川県厚木市
  • Year and Date: 2011-03-24
• [Presentation] フロロカーボンプラズマからのイオン照射によるPMMAのエッチングイールド (2011)
  • Author(s): 塚崎泰裕
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学、神奈川県厚木市
  • Year and Date: 2011-03-24
• [Presentation] PMMA(ポリメチルメタクリレート)のビームエッチング分子動力学シミュレーション (2011)
  • Author(s): 森田泰光
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学、神奈川県厚木市
  • Year and Date: 2011-03-24
• [Presentation] 分子動力学法を用いたシリコン窒化膜のエッチングシミュレーション (2011)
  • Author(s): 重川遼太
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学、神奈川県厚木市
  • Year and Date: 2011-03-24
• [Presentation] 整形外科分野におけるプラズマ技術応用の可能性 (2011)
  • Author(s): 浜口智志
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学、神奈川県厚木市
  • Year and Date: 2011-03-24
• [Presentation] Surface modification of interconnected porous hydroxyapatite by dielectric barrier discharge (DBD) plasma treatment (2011)
  • Author(s): Dae-Sung Lee
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学、神奈川県厚木市
  • Year and Date: 2011-03-24
• [Presentation] 大気圧プラズマ照射による細胞増殖促進プロセス (2011)
  • Author(s): 増田一仁
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学、神奈川県厚木市
  • Year and Date: 2011-03-24
• [Presentation] 大気圧低温プラズマによる神経細胞ネットワーク用細胞外マトリックスパターニング技術の開発 (2011)
  • Author(s): 安藤あゆみ
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学、神奈川県厚木市
  • Year and Date: 2011-03-24
• [Presentation] 最近のプラズマ医療研究の動向 (2011)
  • Author(s): 浜口智志
  • Organizer: 第1回プラズマ医療・健康産業シンポジウム/第5回光・プラズマプロセスのバイオ応用ワークショップ
  • Place of Presentation: 大阪大学中之島センター、大阪市
  • Year and Date: 2011-03-22
• [Presentation] Molecular Dynamics Simulation of enhanced oxygen diffusion in silic on by energetic hydrogen ion injections (2011)
  • Author(s): Kouhei Mizotani
  • Organizer: 2011 Japan-Taiwan Symposium on Polyscale Technologies for Biomedical Engineering and Environmental Sciences/The 5th Polyscale Technology Workshop (PT-BMES 2011/PTW-5)
  • Place of Presentation: Noda, Chiba, Japan
  • Year and Date: 2011-03-07
• [Presentation] Effects of Low-Temperature Atmospheric-Pressure Plasmas Application on Cell Proliferation and Biomaterial Surface Modification (2011)
  • Author(s): Satoshi Hamaguchi
  • Organizer: 2011 Japan-Taiwan Symposium on Polyscale Technologies for Biomedical Engineering and Environmental Sciences/The 5th Polyscale Technology Workshop (PT-BMES 2011/PTW-5)
  • Place of Presentation: Noda, Chiba, Japan
  • Year and Date: 2011-03-07
• [Presentation] 磁性体およびSi系材料反応性イオンエッチングの表面反応解析 (2011)
  • Author(s): 浜口智志
  • Organizer: 応用物理学会シリコンテクノロジー分科会第133会研究会「最先端プラズマプロセスにおけるダメージ/バラつき/異物制御」
  • Place of Presentation: 東京大学弥生キャンパス、東京都文京区(招待講演)
  • Year and Date: 2011-02-18
• [Presentation] Interactions of Low-Temperature Atmospheric-Pressure Plasmas with Cells, Tissues, and Biomaterials for Orthopaedic Applications (2011)
  • Author(s): Satoshi Hamaguchi
  • Organizer: The 40th Winter Annual Conference of the Korean Vacuum Society
  • Place of Presentation: Gangwon-d, Korea(invited)
  • Year and Date: 2011-02-09
• [Presentation] イオン・ラジカルビームによる表面反応解析 (2010)
  • Author(s): 唐橋一浩
  • Organizer: 第10回インテリジェント・ナノプロセス研究会
  • Place of Presentation: 東北大学流体科学研究所、仙台市(招待講演)
  • Year and Date: 2010-12-22
• [Presentation] 大気圧プラズマによる神経細胞ネットワークチップ用細胞外マトリックスパターニング (2010)
  • Author(s): 安藤あゆみ
  • Organizer: 第27回プラズマ・核融合学会年会
  • Place of Presentation: 北海道大学,札幌市
  • Year and Date: 2010-11-30
• [Presentation] Si recess of poly-Si gate etching : damage enhanced by ion assisted oxygen diffusion (2010)
  • Author(s): Tomoko Ito
  • Organizer: The 32nd International Symposium on Dry Process (DPS)
  • Place of Presentation: Tokyo, Japan
  • Year and Date: 2010-11-11
• [Presentation] Mechanisms of selective etching for magnetic thin films by reactive plasmas for MRAM applications (2010)
  • Author(s): Kazuhiro Karahashi
  • Organizer: The 32nd International Symposium on Dry Process (DPS)
  • Place of Presentation: Tokyo, Japan
  • Year and Date: 2010-11-11
• [Presentation] Propagation of an Ionization Front of Hydrogen Plasma Driven by Pulsed High Voltage under High Pressure (2010)
  • Author(s): Chieh-Wen Lo
  • Organizer: The 52nd Annual Meeting of the Division of Plasma Physics, American Physical Society
  • Place of Presentation: Chicago, IL, USA
  • Year and Date: 2010-11-08
• [Presentation] Etching mechanisms of Pt, Co and PtCo magnetic films by chemically reactive energetic ion injections (2010)
  • Author(s): Kazuhiro Karahashi
  • Organizer: American Vacuum Society 57th International Symposium & Exhibition
  • Place of Presentation: Albuquerque, New Mexico, USA
  • Year and Date: 2010-10-17
• [Presentation] Characteristics of silicon nitride etching by reactive plasmas containing CHxFy ions (2010)
  • Author(s): Tomoko Ito
  • Organizer: American Vacuum Society 57th International Symposium & Exhibition
  • Place of Presentation: Albuquerque, New Mexico, USA
  • Year and Date: 2010-10-17
• [Presentation] Molecular dynamics simulation of fluorocarbon/hydrogen ion beam interaction with a PMMA (polymethyl methacrylate) surface (2010)
  • Author(s): Yasumitsu Morita
  • Organizer: American Vacuum Society 57th International Symposium & Exhibition
  • Place of Presentation: Albuquerque, New Mexico, USA
  • Year and Date: 2010-10-17
• [Presentation] Extracellular matrix patterning by atmospheric pressure plasma jets (2010)
  • Author(s): Ayumi Ando
  • Organizer: the 7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference (ICRP-7/SPP-28/GEC-63)
  • Place of Presentation: Paris, France
  • Year and Date: 2010-10-04
• [Presentation] Plasma Stimulation for Cell Proliferation and Their Possible Applications in Orthopedics (2010)
  • Author(s): Satoshi Hamaguchi
  • Organizer: The 3rd International Conference on Plasma Medicine (ICPM-3)
  • Place of Presentation: Greifswald, Germany
  • Year and Date: 2010-09-19
• [Presentation] CHxFy+イオンエッチングにおける水素の効果 (2010)
  • Author(s): 伊藤智子
  • Organizer: 第71回応用物理学術講演会
  • Place of Presentation: 長崎大学文教キャンパス、長崎市
  • Year and Date: 2010-09-14
• [Presentation] CO+イオンによるPt,CoおよびPtCoエッチング反応 (2010)
  • Author(s): 唐橋一浩
  • Organizer: 第71回応用物理学術講演会
  • Place of Presentation: 長崎大学文教キャンパス、長崎市
  • Year and Date: 2010-09-14
• [Presentation] フロロカーボンおよび水素イオン入射によるPMMA(ポリメチルメタクリレート)表面の改質に関する分子動力学シミュレーション (2010)
  • Author(s): 森田泰光
  • Organizer: 第71回応用物理学術講演会
  • Place of Presentation: 長崎大学文教キャンパス、長崎市
  • Year and Date: 2010-09-14
• [Presentation] Diagnosis of Atmospheric Pressure Plasmas by using Terahertz Time-Domain Spectroscopy (2010)
  • Author(s): Hideaki Kitahara
  • Organizer: The 35th International Conference on Infrared, Millimeter and THz Waves (IRMMW-THz 2010)
  • Place of Presentation: Rome, Italy
  • Year and Date: 2010-09-05
• [Presentation] PLASMA SURFACE INTERACTIONS IN MATERIAL PROCESSING (2010)
  • Author(s): Satoshi Hamaguchi
  • Organizer: The 25th Summer School and International Symposium on the Physics of Ionized Gases (SPIG2010)
  • Place of Presentation: Donji Milanovac, Serbia(invited)
  • Year and Date: 2010-08-30
• [Presentation] 次世代磁性体デバイス高精度超微細加工プロセスの開発 (2010)
  • Author(s): 伊藤智子
  • Organizer: STARCフォーラム/シンポジウム2010「アプリを拡大する設計技術と半導体の未来」
  • Place of Presentation: 新横浜国際ホテル、横浜市
  • Year and Date: 2010-08-26
• [Presentation] 低エネルギーイオンビームを用いたポリマーのエッチングとその表面分析 (2010)
  • Author(s): 塚崎泰裕
  • Organizer: 第5回三大学(東京理科大・筑波大・大阪大)連携学生研究会「アトミック/ポリスケールテクノロジー連携研究会」
  • Place of Presentation: 東京理科大学・長万部キャンパス,北海道長万部
  • Year and Date: 2010-08-26
• [Presentation] 質量分離イオンビームを用いた反応性イオンによる磁性体膜エッチング反応の評価 (2010)
  • Author(s): 唐橋一浩
  • Organizer: 第30回スピンエレクトロニクス専門研究会:スピントロニクスデバイスを支えるプラズマ技術
  • Place of Presentation: 東京都千代田区化学会館(招待講演)
  • Year and Date: 2010-07-09
• [Presentation] 低温大気圧プラズマを用いる汎用高分子基板上へのバイオ界面の構築 (2010)
  • Author(s): 金山直樹
  • Organizer: 27th International Conference of Photopolymer Science and Technology (ICPST-27)
  • Place of Presentation: 千葉大学、千葉市
  • Year and Date: 2010-06-22
• [Presentation] Molecular dynamics simulation study on sputtering of graphite or amorphous carbon by low-energy hydrogen or its isotope ion beams (2010)
  • Author(s): S.Hamaguchi
  • Organizer: the 37th IEEE International Conference on Plasma Science (ICOPS2010)
  • Place of Presentation: Norfolk, Virginia, USA
  • Year and Date: 2010-06-20
• [Presentation] Dynamics of near-atmospheric-pressure hydrogen plasmas driven by pulsed high voltages (2010)
  • Author(s): Satoshi Hamaguchi
  • Organizer: The 37th IEEE International Conference on Plasma Science (ICOPS2010)
  • Place of Presentation: Norfolk, Virginia, USA
  • Year and Date: 2010-06-20
• [Book] プラズマ原子分子過程ハンドブック (2011)
  • Author(s): 浜口智志、村上泉、加藤太治
  • Total Pages: 394
  • Publisher: 大阪大学出版会
• [Remarks]
  • URL: http://www.camt.eng.osaka-u.ac.jp/hamaguchi/
• [Patent(Industrial Property Rights)] 人工骨、人工骨製造装置及び人工骨製造方法 (2011)
  • Inventor(s): 浜口智志、森口悠、増田一仁、岡田潔、名井陽、吉川秀樹、李大成
  • Industrial Property Rights Holder: 国立大学法人大阪大学
  • Filing Date: 2011-09-16
  • Overseas
• [Patent(Industrial Property Rights)] 人工骨、人工骨製造装置及び人工骨製造方法 (2010)
  • Inventor(s): 浜口智志、森口悠、増田一仁、岡田潔、名井陽、吉川秀樹
  • Industrial Property Rights Holder: 国立大学法人大阪大学
  • Industrial Property Number: 2010-207645
  • Filing Date: 2010-09-16