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2020 Fiscal Year Annual Research Report

Bottom up creation of singularities by utilization of equilibrium and non-equilibrium crystal growth from vapor phase

Planned Research

Project AreaMaterials Science and Advanced Elecronics created by singularity
Project/Area Number 16H06417
Research InstitutionTokyo University of Agriculture and Technology

Principal Investigator

熊谷 義直  東京農工大学, 工学(系)研究科(研究院), 卓越教授 (20313306)

Co-Investigator(Kenkyū-buntansha) 村上 尚  東京農工大学, 工学(系)研究科(研究院), 准教授 (90401455)
山口 智広  工学院大学, 先進工学部, 准教授 (50454517)
富樫 理恵  上智大学, 理工学部, 助教 (50444112)
後藤 健  東京農工大学, 工学(系)研究科(研究院), 助教 (50572856)
Project Period (FY) 2016-06-30 – 2021-03-31
KeywordsⅢ族セスキ酸化物半導体 / 安定相 / 準安定相 / 熱平衡 / 非熱平衡 / ハライド気相成長法 / ミスト化学気相堆積法
Outline of Annual Research Achievements

有機金属気相成長(MOVPE)法とトリハライド気相成長(THVPE)法による安定相β酸化ガリウム(β-Ga2O3)成長技術を開拓した。MOVPE成長では、トリエチルガリウムと酸素を原料ガスとした場合の熱力学解析結果に基づき成長実験を行った。結果、800~1000℃でβ-Ga2O3の成長が確認され、十分な酸素供給により成長膜の炭素汚染が抑制されることも分かった。THVPE成長では、GaClを原料とするハライド気相成長(HVPE)法に代わり、新規原料分子GaCl3を用いる成長を試みた。GaCl3を用いることで気相反応によるGa2O3粉体生成が抑制され、大きな成長速度でも均一かつ高純度なβ-Ga2O3層が成長可能となった。
酸化インジウム(In2O3)の成長では、ミスト化学気相堆積(mist-CVD)法およびHVPE法を用い成長を実施した。c面サファイア基板上にmist-CVD成長した準安定相α-In2O3層の極微構造解析により、コラム構造のα-In2O3成長、コラム成長による転位フィルタリング効果でコラム内が無転位になることを解明した。また、原料を再選定し、移動度200 cm^2/Vs以上、キャリア密度10^18 /cm^3未満に電気的特性を向上させることができた。HVPE成長では、c面サファイアのオフ基板上で安定相c-In2O3単結晶層が得られるようになったので、デバイス作製を目指して水素雰囲気異方性エッチング(HEATE)法による加工を試み、ドロップレットフリーかつナノオーダーの加工を達成した。熱力学解析の併用で、Ⅲ族セスキ酸化物結晶のエッチング挙動の統一的知見も得られた。最終的に、c-In2O3層上にTi/Auオーミックコンタクト、Pt/Ti/Auショットキー電極を形成してショットキーバリアダイオードを試作し、整流性を確認した。

Research Progress Status

令和2年度が最終年度であるため、記入しない。

Strategy for Future Research Activity

令和2年度が最終年度であるため、記入しない。

  • Research Products

    (25 results)

All 2021 2020 Other

All Int'l Joint Research (3 results) Journal Article (8 results) (of which Int'l Joint Research: 2 results,  Peer Reviewed: 8 results,  Open Access: 1 results) Presentation (14 results) (of which Int'l Joint Research: 7 results,  Invited: 3 results)

  • [Int'l Joint Research] PDI/Otto-von-Guericke University Magdeburg(ドイツ)

    • Country Name
      GERMANY
    • Counterpart Institution
      PDI/Otto-von-Guericke University Magdeburg
  • [Int'l Joint Research] The Spanish National Research Council(スペイン)

    • Country Name
      SPAIN
    • Counterpart Institution
      The Spanish National Research Council
  • [Int'l Joint Research] Linkoping University(スウェーデン)

    • Country Name
      SWEDEN
    • Counterpart Institution
      Linkoping University
  • [Journal Article] Facet stability of GaN during tri-halide vapor phase epitaxy: an ab initio-based approach2021

    • Author(s)
      Daichi Yosho, Yuriko Matsuo, Akira Kusaba, Pawel Kempisty, Yoshihiro Kangawa, Hisashi Murakami, Akinori Koukitu
    • Journal Title

      CrystEngComm

      Volume: 23 Pages: 1423-1428

    • DOI

      10.1039/D0CE01683G

    • Peer Reviewed / Int'l Joint Research
  • [Journal Article] Investigation of halide vapor phase epitaxy of In2O3 on sapphire (0001) substrates2021

    • Author(s)
      Hidetoshi Nakahata, Rie Togashi, Ken Goto, Bo Monemar, Yoshinao Kumagai
    • Journal Title

      Journal of Crystal Growth

      Volume: 563 Pages: 126111 1-6

    • DOI

      10.1016/j.jcrysgro.2021.126111

    • Peer Reviewed / Int'l Joint Research
  • [Journal Article] Homo- and hetero-epitaxial growth of β-gallium oxide via GaCl3-O2-N2 system2021

    • Author(s)
      K. Ema, K. Sasaki, A. Kuramata, H. Murakami
    • Journal Title

      Journal of Crystal Growth

      Volume: 564 Pages: 126129 1-5

    • DOI

      10.1016/j.jcrysgro.2021.126129

    • Peer Reviewed
  • [Journal Article] Thermodynamic and experimental studies of β-Ga2O3 growth by metalorganic vapor phase epitaxy2021

    • Author(s)
      Ken Goto, Kazutada Ikenaga, Nami Tanaka, Masato Ishikawa, Hideaki Machida, and Yoshinao Kumagai
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 60 Pages: 045505 1-8

    • DOI

      10.35848/1347-4065/abec9d

    • Peer Reviewed / Open Access
  • [Journal Article] Impact of hydrochloric acid on the epitaxial growth of In2O3 films on (0001)α-Al2O3 substrates by mist CVD2020

    • Author(s)
      T. Yamaguchi, S. Takahashi, T. Kiguchi, A. Sekiguchi, K. Kaneko, S. Fujita, H. Nagai, M. Sato, T. Onuma, and T. Honda
    • Journal Title

      Applied Physics Express

      Volume: 13 Pages: 075504 1-4

    • DOI

      10.35848/1882-0786/ab9a90

    • Peer Reviewed
  • [Journal Article] Photoelectron spectroscopic study on electronic state of corundum In2O3 epitaxial thin film grown by mist-CVD2020

    • Author(s)
      T. Nagata, T. Yamaguchi, S. Ueda, W. Yi, J. Chen, T. Kobayashi, H. Yokoo, T. Honda, Y. Yamashita, and T. Chikyow
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 59 Pages: SIIG12 1-6

    • DOI

      10.35848/1347-4065/ab84b2

    • Peer Reviewed
  • [Journal Article] Epitaxial mist chemical vapor deposition growth and characterization of Cu3N films on (0001) α-Al2O3 substrates2020

    • Author(s)
      T. Yamaguchi, H. Nagai, T. Kiguchi, N. Wakabayashi, T. Igawa, T. Hitora, T. Onuma, T. Honda, and M. Sato
    • Journal Title

      Applied Physics Express

      Volume: 13 Pages: 075505 1-5

    • DOI

      10.35848/1882-0786/ab9a8f

    • Peer Reviewed
  • [Journal Article] Temperature dependence of Ga2O3 growth by halide vapor phase epitaxy on sapphire and β-Ga2O3 substrates2020

    • Author(s)
      Ken Goto, Hidetoshi Nakahata, Hisashi Murakami, and Yoshinao Kumagai
    • Journal Title

      Applied Physics Letters

      Volume: 117 Pages: 222101 1-5

    • DOI

      10.1063/5.0031267

    • Peer Reviewed
  • [Presentation] Growth of stable and/or metastable phases of Ga2O3 and In2O3 by halide vapor phase epitaxy and mist chemical vapor deposition2021

    • Author(s)
      Yoshinao Kumagai, Ken Goto, Rie Togashi, Tomohiro Yamaguchi, Hisashi Murakami
    • Organizer
      The 8th Asian Conference on Crystal Growth and Crystal Technology (CGCT-8)
    • Int'l Joint Research
  • [Presentation] Epitaxial mist chemical vapor deposition growth and characterization of α-In2O3 films on α-Al2O3 substrates2021

    • Author(s)
      Tomohiro Yamaguchi, Takahiro Nagata, Subaru Takahashi, Takanori Kiguchi, Atsushi Sekiguchi, Takeyoshi Onuma, Tohru Honda, Ken Goto, Yoshinao Kumagai, Kentaro Kaneko, Shizuo Fujita
    • Organizer
      The 8th Asian Conference on Crystal Growth and Crystal Technology (CGCT-8)
    • Int'l Joint Research
  • [Presentation] Thermodynamic study of etching characteristics of HVPE-grown In2O3 layers by hydrogen-environment anisotropic thermal etching2021

    • Author(s)
      Rie Togashi, Ryo Kasaba, Yuki Ooe, Ken Goto, Yoshinao Kumagai, Akihiko Kikuchi
    • Organizer
      The 8th Asian Conference on Crystal Growth and Crystal Technology (CGCT-8)
    • Int'l Joint Research
  • [Presentation] 酸化物半導体結晶Ga2O3およびIn2O3の準安定相発現機構の検討2021

    • Author(s)
      熊谷義直,後藤健,富樫理恵,山口智広,村上尚
    • Organizer
      第68回応用物理学会春季学術講演会
    • Invited
  • [Presentation] GaCl3気体原料を用いたβ-Ga2O3ホモエピタキシャル成長2021

    • Author(s)
      長野 理紗、江間 研太郎、佐々木 公平、倉又 朗人、村上 尚
    • Organizer
      第68回応用物理学会春季学術講演会
  • [Presentation] Thermodynamic analysis of metalorganic vapor phase epitaxy of group-III sesquioxides2020

    • Author(s)
      Saori Matsugai, Nami Tanaka, Sakiko Yamanobe, Nao Takekawa, Ken Goto, Yoshinao Kumagai
    • Organizer
      The 8th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA 2020)
    • Int'l Joint Research
  • [Presentation] Thermodynamic study of (AlxGa1-x)2O3 ternary alloy growth by metalorganic vapor phase epitaxy2020

    • Author(s)
      Nami Tanaka, Saori Matsugai, Sakiko Yamanobe, Nao Takekawa, Ken Goto, Yoshinao Kumagai
    • Organizer
      The 8th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA 2020)
    • Int'l Joint Research
  • [Presentation] Structural analyses of α-In2O3 grown on α-Al2O3 substrates by mist CVD2020

    • Author(s)
      Y. Hayakawa, S. Ohno, T. Yamaguchi, T. Kiguchi, H. Yokoo, T. Onuma, T. Honda
    • Organizer
      The 8th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA 2020)
    • Int'l Joint Research
  • [Presentation] GaCl3-O2-N2系を用いたβ-酸化ガリウム成長2020

    • Author(s)
      江間研太郎,小川直紀,佐々木公平,倉又朗人,村上尚
    • Organizer
      日本結晶成長学会ナノエピ分科会「第12回ナノ構造・エピタキシャル成長講演会」
  • [Presentation] 水素雰囲気異方性熱エッチング(HEATE)法によるHVPE-In2O3成長層のエッチング特性の熱力学的検討2020

    • Author(s)
      富樫理恵,笠羽遼,大江優輝,後藤健,熊谷義直,菊池昭彦
    • Organizer
      第81回応用物理学会秋季学術講演会
  • [Presentation] Comparison of Microstructures in α-Ga2O3 and α-In2O3 Films Grown on α-Al2O3 Substrates by Mist CVD2020

    • Author(s)
      Y. Hayakawa, S. Ohno, T. Yamaguchi, T. Kiguchi, S. Takahashi, H. Yokoo, T. Onuma, T. Honda
    • Organizer
      9th Electronic Materials Symposium (EMS-39)
  • [Presentation] 水素雰囲気異方性熱エッチング (HEATE)法による HVPE-In2O3成長層のエッチング特性評価2020

    • Author(s)
      富樫 理恵,笠羽 遼,大江 優輝,後藤 健,熊谷 義直,菊池 昭彦
    • Organizer
      Sophia Open Research Weeks 2020半導体ナノフォトニクス研究会
    • Invited
  • [Presentation] Halide Vapor Phase Epitaxy of Group-III Sesquioxides2020

    • Author(s)
      Yoshinao Kumagai, Ken Goto, Rie Togashi, Hisashi Murakami, Akito Kuramata, Shigenobu Yamakoshi, Masataka Higashiwaki
    • Organizer
      2020 Virtual MRS Spring Meeting & Exhibit
    • Int'l Joint Research / Invited
  • [Presentation] GaCl3を原料に用いたβ-Ga2O3成長におけるⅥ/Ⅲ比依存性2020

    • Author(s)
      長野理紗、江間研太郎、佐々木公平、倉又朗人、村上尚
    • Organizer
      第3回結晶工学×ISYSE合同研究会

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Published: 2021-12-27  

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