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2007 Fiscal Year Annual Research Report

InAlGaN窒化物4元混晶を用いた紫外高効率発光デバイスの研究

Planned Research

Project AreaOptoelectronics Frontier by Nitride Semiconductor -Ultimate Utilization of Nitride Semiconductor Material Potential-
Project/Area Number 18069014
Research InstitutionThe Institute of Physical and Chemical Research

Principal Investigator

平山 秀樹  The Institute of Physical and Chemical Research, テラヘルツ量子素子研究チーム, チームリーダー (70270593)

Keywords深紫外LED / AlGaN / InAlGaN / 内部量子効率 / 外部量子効率 / 貫通転位密度 / 結晶成長 / AlNテンプレート
Research Abstract

波長250nm-350nm帯の紫外高効率発光ダイオード(LED)は、半導体白色照明、浄水・殺菌、医療分野、生物分野等、幅広い分野での応用が期待されている。しかし、波長が360nmより短い紫外領域においては、高輝度紫外発光材料の欠如、ワイドバンドギャップp-型半導体の欠如、ならびに高品質AIN(窒化アルミニウム)基板の欠如等のため、未だ高効率LEDは実現していない。本研究では、発光層に高効率紫外発光可能なInAlGaN4元混晶を用い、さらにAINバッファーの高品質化と高濃度p型化を実現することにより、250-350nm帯高効率紫外LEDの実現を目指している。
本年度は、InAlGaN4元混晶を用いた紫外LEDの短波長化の準備として、すでに研究の進んでいるAlGaN系材料を用いて短波長LEDの実現を試みた。サファイア上に高品質AIN結晶を成長する方法として、「アンモニアパルス供給多層成長方」を新たに考案した。この方法を用いて、貫通転位密度が低く、原子層オーダーの平坦性をもち、さらにクラックが無く、安定なIII族極性を持つAIN層の成長に成功した。刃状転位密度:7×10^8cm^<-2>程度を実現し、現在得られている最高レベルの紫外LED用AINテンプレート作製に成功した。このテンプレート上にAlGaN量子井戸を作製した結果、発光波長250-280nm帯の量子井戸において、PL発光強度が従来の50倍以上増加した。さらに得られたAINテンプレート上にAlGaN量子井戸LEDを作製し、波長222-273nm深紫外LEDのシングルピーク動作を実現した。また、波長248-273nmでは室温CW動作において1mW以上の光出力を観測した。外部量子効率は、波長248nmにおいて0.32%、227.5nmにおいて0.2%が得られた。

  • Research Products

    (46 results)

All 2008 2007

All Journal Article (5 results) (of which Peer Reviewed: 1 results) Presentation (39 results) Patent(Industrial Property Rights) (2 results)

  • [Journal Article] "231-261nm AIGaN deep-ultraviolet light-emitting diodes fabri cated on AIN multilayer buffers grown by ammonia pulse-flow method on sapphire"2007

    • Author(s)
      H. Hirayama
    • Journal Title

      Appl. Phys. Lett. 91

      Pages: 071901 1-3

    • Peer Reviewed
  • [Journal Article] 「p-InALGaNと高品質AINを用いた340nm帯高出力LED」2007

    • Author(s)
      藤川 紗千恵、高野隆好、近藤行廣、平山秀樹
    • Journal Title

      電子情報通信学会技術研究報告 107

      Pages: 29-34

  • [Journal Article] 「深紫外半導体発光素子およびTHz量子カスケードレーザの開発」2007

    • Author(s)
      平山秀樹
    • Journal Title

      電気学会、光・量子デバイス研究会資料 OQD-07-60

      Pages: 1-10

  • [Journal Article] "230-350nm帯AIGaN系深紫外高輝度LEDの進展と応用"2007

    • Author(s)
      平山秀樹
    • Journal Title

      オプトロニクス(OPTROMICS) 200710月号

      Pages: 110-119

  • [Journal Article] "250-350nm帯AlGaN系深紫外高輝度LEDの開発"2007

    • Author(s)
      平山秀樹、高野隆義、藤川紗千恵、大橋智昭、谷田部透、鎌田憲彦、近藤行廣、
    • Journal Title

      O plus E Vol.29

      Pages: 572-581

  • [Presentation] "222-273 nm AIGaN deep ultraviolet light-emitting diodes fabricated on high-quality AIN buffer on sapphire"2008

    • Author(s)
      H. Hirayama, T. Yatabe, N. Noguchi and N. Kamata
    • Organizer
      International Symposium on Semiconductor Light emitting devices(ISSLED2008)
    • Place of Presentation
      Phoenix, USA
    • Year and Date
      20080427-0502
  • [Presentation] "280 nm-band quaternary InAIGaN quantum well deep-UV LEDs with p-lnAIGaN layers"2008

    • Author(s)
      S. Fujikawa, T, Takano, K. Tsubaki and H. Hirayama
    • Organizer
      International Symposium on Semiconductor Light emitting devices(ISSLED2008)
    • Place of Presentation
      Phoenix, USA
    • Year and Date
      20080427-0502
  • [Presentation] 「InAIGaN4元混晶を用いた280nm帯深紫外LED」2008

    • Author(s)
      藤川紗千恵、平山秀樹、高野隆好、椿健治
    • Organizer
      2008春応用物理学会(第65回)
    • Place of Presentation
      日本大学
    • Year and Date
      20080327-30
  • [Presentation] 「量産対応型MOCVDによる270nm帯高出力深紫外LEDの検討」2008

    • Author(s)
      高野隆好、藤川紗千恵、椿健治、平山秀樹
    • Organizer
      2008春応用物理学会(第65回)
    • Place of Presentation
      日本大学
    • Year and Date
      20080327-30
  • [Presentation] 「アンモニアパルス供給多層成長法を用いた深紫外LED用AINバッファーの進展」2008

    • Author(s)
      平山秀樹、谷田部透、野口憲路、乗松潤、鎌田憲彦
    • Organizer
      2008春応用物理学会(第65回)
    • Place of Presentation
      日本大学
    • Year and Date
      20080327-30
  • [Presentation] 「248nmAIGaN深紫外LEDの室温CWミリワット出力動作」2008

    • Author(s)
      谷田部透、平山秀樹、野口憲路、乗松潤、鎌田憲彦
    • Organizer
      2008春応用物理学会(第65回)
    • Place of Presentation
      日本大学
    • Year and Date
      20080327-30
  • [Presentation] 「222nmAIGaN深紫外LEDのシングルピーク発光動作」2008

    • Author(s)
      野口憲路、平山秀樹、谷田部透、鎌田憲彦
    • Organizer
      2008春応用物理学会(第65回)
    • Place of Presentation
      日本大学
    • Year and Date
      20080327-30
  • [Presentation] 「窒化物半導体による深紫外およびテラヘルツ発光素子開発の現状と展望」2008

    • Author(s)
      平山秀樹
    • Organizer
      ワイドギャップ半導体光・電子デバイス、日本学術振興会第162委員会、特別講演会(第56回研究会)
    • Place of Presentation
      主婦会館プラザエフ
    • Year and Date
      2008-01-25
  • [Presentation] "227-261 nm AIGaN-based ultraviolet light-emitting diodes fabricated on high-quality AIN buffer on sapphire"2007

    • Author(s)
      H. Hirayama, T. Yatabe, N. Noguchi and N. Kamata
    • Organizer
      International Conference on White LEDs and Solid State Lighting (White LEDs-07)
    • Place of Presentation
      Tokyo
    • Year and Date
      20071126-60
  • [Presentation] "High-quality AIN buffer fabricated on sapphire by NH3 pulsed-flow multi-layer growth method for application to deep-UV LEDs"2007

    • Author(s)
      N. Noguchi, T. Yatabe, T. Ohashi, N. Kamata and H. hirayama
    • Organizer
      International Conference on White LEDs and Solid State lighting (White LEDs-07)
    • Place of Presentation
      Tokyo
    • Year and Date
      20071126-60
  • [Presentation] "Remarkable enhancement of 254-288 nm deep UV emission from AIGaN quantum wells by using high-quality AlN buffer on sapphire"2007

    • Author(s)
      T. Yatabe, N. Noguchi and N. Kamata, and H. Hirayama
    • Organizer
      International Conference on White LEDs and Solid State Lighting (White LEDs-07)
    • Place of Presentation
      Tokyo
    • Year and Date
      20071126-60
  • [Presentation] "Realization of 340 nm band high-power UV-LED using p-type InAlGaN"2007

    • Author(s)
      S. Fujikawa, T. Takano, Y. Kondo and H. Hirayama
    • Organizer
      International Conference on White LEDs and Solid State Lighting (White LEDs-07)
    • Place of Presentation
      Tokyo
    • Year and Date
      20071126-60
  • [Presentation] "231-261 nm AlGaN quantum well deep ultraviolet light-emitting diodes fabricated on high-quality AlN buffer on sapphire"2007

    • Author(s)
      H. Hirayama, T. Yatabe, N. Noguchi, T. Ohashi and N. Kamata
    • Organizer
      International Symposium on Compound Semiconductors (ISCS2007)
    • Place of Presentation
      Kyoto
    • Year and Date
      20071015-18
  • [Presentation] "340 nm band high-power (>7mW) InAlGaN quantum well UV-LED using p-type InAlGaN layers"2007

    • Author(s)
      S. Fujikawa, T. Takano, Y. Kondo and H. Hirayama
    • Organizer
      International Symposium on Compound Semiconductors (ISCS2007)
    • Place of Presentation
      Kyoto
    • Year and Date
      20071015-18
  • [Presentation] 「p-InAIGaNと高品質AINを用いた340nm帯高出力LED」2007

    • Author(s)
      藤川紗千恵、高野隆好、近藤行廣、平山秀樹
    • Organizer
      電子情報通信学会、レーザ・量子エレクトロニクス研究会(LQE)「窒化物半導体光・電子デバイス・材料、及び関連技術」
    • Place of Presentation
      福井大学
    • Year and Date
      20071011-12
  • [Presentation] "Realization of 340 nm-band high-power (>7mW) InAlGaN quantum well UV-LED with p-type InAlGaN"2007

    • Author(s)
      S. Fujikawa, T. Takano, Y. Kondo and H. Hirayama
    • Organizer
      International Conference on Solid State Devices and Materials (SSDM2007)
    • Place of Presentation
      Tsukuba
    • Year and Date
      20070919-21
  • [Presentation] "Control of polarity and reduction of threading dislocation density (TDD) of AlN/AlGaN buffer on sapphire by using TMAl pulsed supply method"2007

    • Author(s)
      N. Noguchi, T. Ohashi N. Kamata and H. Hirayama
    • Organizer
      International Conference on Nitride Semiconductors (ICNS-7)
    • Place of Presentation
      Las Vegas, USA
    • Year and Date
      20070916-21
  • [Presentation] "340 nm-band high-power (>7mW) InAlGaN quantum well UV-LED using p-type InAlGaN layers"2007

    • Author(s)
      S. Fujikawa, T. Takano, Y. Kondo and H. Hirayama
    • Organizer
      International Conference on Nitride Semiconductors (ICNS-7)
    • Place of Presentation
      Las Vegas, USA
    • Year and Date
      20070916-21
  • [Presentation] "High-quality AlN buffer fabricated on sapphire by NH3 pulse-flow multi-layer growth method for application to deep UV LEDs"2007

    • Author(s)
      H. Hirayama, T. Ohashi and N. Kamata
    • Organizer
      International Conference on Nitride Semiconductors (ICNS-7)
    • Place of Presentation
      Las Vegas, USA
    • Year and Date
      20070916-21
  • [Presentation] "Remarkable enhancement of 254-280 nm deep UV emission from AlGaN quantum wells by using high-quality AlN buffer on sapphire"2007

    • Author(s)
      T. Yatabe, H. Hirayama, T. Ohashi and N. Kamata
    • Organizer
      International Conference on Nitride Semiconductors (ICNS-7)
    • Place of Presentation
      Las Vegas, USA
    • Year and Date
      20070916-21
  • [Presentation] "Quaternary InAlGaN quantum-dot UV-LED emitting at 335 nmfabricated by an anti-surfactant method"2007

    • Author(s)
      H. Hirayama, S. Fujikawa
    • Organizer
      International Conference on Nitride Semiconductors (ICNS-7)
    • Place of Presentation
      Las Vegas, USA
    • Year and Date
      20070916-21
  • [Presentation] "245-250 nm AlGaN-based deep ultraviolet light-emitting diodes fabricated on high-quality AlN buffer on sapphire"2007

    • Author(s)
      H. Hirayama, T. Ohashi, T. Yatabe and N. Kamata
    • Organizer
      International Conference on Nitride Semiconductors (ICNS-7)
    • Place of Presentation
      Las Vegas, USA
    • Year and Date
      20070916-21
  • [Presentation] "Realization of 340 nm-band high-power InAlGaN-based UV-LED by the suppression of electron overflow"2007

    • Author(s)
      S. Fujikawa, T. Takano, Y. Kondo ahd H. Hirayama
    • Organizer
      International Conference on Nitride Semiconductors (ICNS-7)
    • Place of Presentation
      Las Vegas, USA
    • Year and Date
      20070916-21
  • [Presentation] "Remarkable improvement of output power for InAlGaN based ultraviolet LED by improving the crystal quality of AlN/AlGaN templates"2007

    • Author(s)
      T.Takano, S. Fujikawa, Y. Kondo and H. Hirayama
    • Organizer
      International Conference on Nitride Semiconductors (ICNS-7)
    • Place of Presentation
      Las Vegas, USA
    • Year and Date
      20070916-21
  • [Presentation] 「深紫外発光InAIGaN4元混晶量子ドットの形成と電流注入発光」2007

    • Author(s)
      藤川紗千恵、平山秀樹
    • Organizer
      2007秋応用物理学会(第68回)
    • Place of Presentation
      北海道工業大学
    • Year and Date
      20070904-08
  • [Presentation] 「261nmAIGaN量子井戸深紫外LEDのCWミリワット動作」2007

    • Author(s)
      谷田部透、野口憲路、鎌田憲彦、平山秀樹
    • Organizer
      2007秋応用物理学会(第68回)
    • Place of Presentation
      北海道工業大学
    • Year and Date
      20070904-08
  • [Presentation] 「231nmAIGaN量子井戸深紫外LEDのシングルピーク発光動作」2007

    • Author(s)
      野口憲路、谷田部透、鎌田憲彦、平山秀樹
    • Organizer
      2007秋応用物理学会(第68回)
    • Place of Presentation
      北海道工業大学
    • Year and Date
      20070904-08
  • [Presentation] "Realization of 340 nm-band high-power UV-LED using p-type InAlGaN"2007

    • Author(s)
      S. Fujikawa, T. Takano, Y. Kondo and H. Hirayama
    • Organizer
      26th Electronic Materials Symposium (EMS-26)
    • Place of Presentation
      Laforet Biwako Shiga
    • Year and Date
      20070704-06
  • [Presentation] "Remarkable improvement of output power for InAIGaN based UV LED by improving crystal quality of AIN/AIGaN template"2007

    • Author(s)
      T. Takano, S. Fujikawa, Y. Kondo and H. Hirayama
    • Organizer
      26th Electronic Materials Symposium (EMS-26)
    • Place of Presentation
      Laforet Biwako, Shiga
    • Year and Date
      20070704-06
  • [Presentation] "High-quality AIN buffer fabricated on sapphire by ammonia pulse-flow multi-layer growth method for application to deep UV LEDs"2007

    • Author(s)
      H. Hirayama, T. Ohashi and N. Kamata
    • Organizer
      26th Electronic Materials Symposium (EMS-26)
    • Place of Presentation
      Laforet Biwako, Shiga
    • Year and Date
      20070704-06
  • [Presentation] "Control of polarity and reduction of threading dislocation density (TDD) of AIN/AIGaN template by using TMAl pulse supply growth"2007

    • Author(s)
      N. Noguchi, T. Ohashi N. Kamata and H. Hirayama
    • Organizer
      26th Electronic Materials Symposium (EMS-26)
    • Place of Presentation
      Laforet Biwako, Shiga
    • Year and Date
      20070704-06
  • [Presentation] "Remarkable enhancement of 254-280 nm deep UV emission from AIGaN quantum wells by using high-quality AIN buffer on sapphire"2007

    • Author(s)
      T. Yatabe, H. Hirayama, T. Ohashi and N. Kamata
    • Organizer
      26th Electronic Materials Symposium (EMS-26)
    • Place of Presentation
      Laforet Biwako, Shiga
    • Year and Date
      20070704-06
  • [Presentation] "245-250nm AIGaN-based deep ultraviolet light-emitting diodes fabricated on high-quality AIN buffer on sapphire"2007

    • Author(s)
      H. Hirayama, T. Ohashi, T. Yatabe and N. Kamata
    • Organizer
      26th Electronic Materials Symposium (EMS-26)
    • Place of Presentation
      Laforet Biwako, Shiga
    • Year and Date
      20070704-06
  • [Presentation] 「InAlGaN窒化物4元混晶を用いた紫外LEDの高出力化」2007

    • Author(s)
      平山秀樹
    • Organizer
      文部省科研費、特定領域研究、「窒化物光半導体のフロンティア-材料潜在能力の極限発現-」、平成18年度研究成果報告会
    • Place of Presentation
      熱海後楽園ホテル(静岡)
    • Year and Date
      20070305-06
  • [Presentation] 「深紫外半導体発光素子およびTHz量子カスケードレーザの開発」2007

    • Author(s)
      平山秀樹
    • Organizer
      電気学会、光・量子デバイス研究会
    • Place of Presentation
      九州大学
    • Year and Date
      2007-12-14
  • [Presentation] 「p-InAIGaNと高品質AINを用いた340nm帯紫外高出力LED」2007

    • Author(s)
      藤川紗千恵、高野隆好、椿健治、平山秀樹
    • Organizer
      応用物理学会・結晶工学分科会研究会
    • Place of Presentation
      学習院創立百周年記念会館
    • Year and Date
      2007-12-14
  • [Presentation] 「230-350nm帯InAlGaN系深紫外高効率発光デバイスの研究」2007

    • Author(s)
      平山秀樹
    • Organizer
      CREST「新機能創成に向けた光・光量子科学技術」領域、平成19年度新規採択課題キックオフミーデイング
    • Place of Presentation
      日本科学未来館
    • Year and Date
      2007-10-27
  • [Presentation] "230-350nm窒化物深紫外LEDの進展と今後の展望"2007

    • Author(s)
      平山秀樹、谷田部 透, 野口憲路, 藤川紗千恵, 高野隆好, 鎌田憲彦, 近藤行廣
    • Organizer
      第68回応用物理学会学術講演回、「窒化物の新展開」特定領域研究企画「窒化物光半導体のフロンティア」-材料潜在能力の極限発現一
    • Place of Presentation
      北海道工業大学
    • Year and Date
      2007-09-05
  • [Presentation] "Development of Deep-UV and Terahertz Semiconductor Emitting Devices and their Applications"2007

    • Author(s)
      H. Hirayama
    • Organizer
      The 13Th International Micromachine/Nanotech Symposium, -MEMS Frontier: Innovative Devices by Micro and Nano-Bio Fusion Create New Lifestyles-,
    • Place of Presentation
      Tokyo
    • Year and Date
      2007-07-26
  • [Patent(Industrial Property Rights)] 1.「光半導体素子及びその製造方法」2007

    • Inventor(s)
      平山秀樹、大橋智昭、鎌田憲彦
    • Industrial Property Rights Holder
      平山秀樹、大橋智昭、鎌田憲彦
    • Industrial Property Number
      特願2007-219890
    • Filing Date
      2007-08-27
  • [Patent(Industrial Property Rights)] 2.「半導体発光素子及びその製造方法」2007

    • Inventor(s)
      平山秀樹、大橋智昭、鎌田憲彦
    • Industrial Property Rights Holder
      平山秀樹、大橋智昭、鎌田憲彦
    • Industrial Property Number
      特願2007-219910
    • Filing Date
      2007-08-27

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Published: 2010-02-04   Modified: 2016-04-21  

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