2013 Fiscal Year Final Research Report
Bond Engineering at Nano-Interfaces using Nanoparticle Plasmas
| Project Area | Creation of Science of Plasma Nano-Interface Interactions |
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| Project/Area Number |
21110005
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| Research Category |
Grant-in-Aid for Scientific Research on Innovative Areas (Research in a proposed research area)
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| Allocation Type | Single-year Grants |
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| Review Section |
Science and Engineering
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| Research Institution | Kyushu University |
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Principal Investigator |
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| Co-Investigator(Kenkyū-buntansha) |
KOGA Kazunori 九州大学, 大学院システム情報科学研究院, 准教授 (90315127)
UCHIDA Giichiro 大阪大学, 接合科学研究所, 准教授 (90422435)
KAMATAKI Kunihiro 九州大学, 基幹教育院, 助教 (60582658)
SEO Hyunwoong 九州大学, 大学院システム情報科学研究院, 助教 (00618499)
ITAGAKI Naho 九州大学, 大学院システム情報科学研究院, 准教授 (60579100)
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| Project Period (FY) |
2009-07-23 – 2014-03-31
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| Keywords | プラズマ局所反応場 / ナノ粒子 / ナノ界面制御 / 相互作用 / ボンドエンジニアリング / コンビナトリアル摂動解析 |
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| Research Abstract |
To reveal fluctuation of interaction between plasmas and nanointerface, we have studied effects of radical density fluctuation on growth of nano-particles in amplitude modulated pulse rf discharges, using a two-dimensional in-situ laser-light scattering method.
We have found that growth of nanoparticles are suppressed by the amplitude modulation. The results of the spectral analysis suggest that growth of nanoparticles is nonlinearly coupled with radicals. Based on the results, we have discussed a growth model of nanoparticles. Using the model, we have found that a diagram of the particle growth modes having three modes and that the model describes suppression of size dispersion of nanoparticles. We have realized the particle trapping in plasmas using an IR laser. Using the trapping, we have succeeded an in-situ measurement of the interaction between a trapped particle and radicals.
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[Journal Article] the LHD Experimental Group, Flux Control of Carbon Nanoparticles Generated due to Interactions between Hydrogen Plasmas and Graphite Using DC-Biased Substrates2013
Author(s)
K.Koga, M.Tateishi, K.Nishiyama, G.Uchida, K.Kamataki, D.Yamashita, H.Seo, N.Itagaki, M.Shiratani, N.Ashikawa, S.Muzaki, K.Nishimura, Akiko Sagara
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Journal Title
Jpn. J. Appl. Phys.
Volume: Vol.52
Pages: 11NA08
Peer Reviewed
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