1990 Fiscal Year Final Research Report Summary
Metal Electrodeposition from Metal Trifluoromethanesulphonate Non-Aqueous Solution
Project/Area Number |
01550617
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Research Category |
Grant-in-Aid for General Scientific Research (C)
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Allocation Type | Single-year Grants |
Research Field |
工業物理化学
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Research Institution | Shinshu University |
Principal Investigator |
TAKEI Tatsuko Shinshu University Faculty of Engineering Associate Professor, 工学部, 助手 (90020990)
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Project Period (FY) |
1989 – 1990
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Keywords | Nickel electrodeposition / Copper electrodeposition / Copper trifluoromethanesulphonate / Tangsten electrodeposit / Molybden electrodeposit / Nickel trifluoromethanesulphonate / Non-aqueous solution / XPS analysis |
Research Abstract |
It was synthesized copper-and nickel trifluoromethanesulphonate. The solubilities of these salts in organic solvents and the electric conductivities were high. The bright and smooth copper- and nickel electrodeposits were obtained from the CH_3OH baths containing these salts. The electrodeposition of metals from these baths was not easier than that from the baths containing metal trifluoroacetate. In the CH_3CN, the electrodeposition occured from Cu^+, with the result that preelectrolysis was required to reduce the Cu^<2+> to Cu^+. It was found with XPS analysis that WO_3 and MoO_3 were detected on the uppermost surface of the tangsten- and molybden electrodeposits and the lower valency metallic oxides on the surface of the closed substrate of the electrodeposits obtained from the HCONH_2 baths, respectively.
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