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1990 Fiscal Year Final Research Report Summary

Toxicity of Chemicals Used in Semiconductor Manufacturing Factories

Research Project

Project/Area Number 01570298
Research Category

Grant-in-Aid for General Scientific Research (C)

Allocation TypeSingle-year Grants
Research Field Hygiene
Research InstitutionKeio University, School of Medicine

Principal Investigator

OME Kazuyuki  Keio Univ. School of Med., Assis. Prof., 医学部, 講師 (60118924)

Co-Investigator(Kenkyū-buntansha) SAKAI Tohru  Keio Univ. School of Med., Instructor, 医学部, 助手 (50153846)
SAKAI Tohru  Keio Univ. School of Med., Instructor (50153846)
SAKAI Tohru  Keio Univ. School of Med., Instructor (50153846)
SAKAI Tohru  Keio Univ. School of Med., Instructor (50153846)
SAKAI Tohru  Keio Univ. School of Med., Instructor (50153846)
Project Period (FY) 1989 – 1990
KeywordsSemiconductor / Silane / Gas / Toxicity / Animal experiment
Research Abstract

1. An exposure experiment system was remodeled in order to carry out the animal exposure experiments to special gases used in semiconductor industries.
2. The chemical stability of silane in the exposure chamber was confirmed on condition of actual exposure concentration and duration in this experiments.
3. No pathological and serological changes except for weak irritation was found by exposure to 1,000 ppm silane for 1, 2, 4, and 8 hours to ICR male mice (SPF).
4. High prevalence of exudation and inflammatory and/or necrotic cells on the nasal mucous membrane was observed by exposure to 1,000 ppm silane for 4 weeks, but not for 2 weeks, to ICR male mice (SPF).
5. Exposure to 7,500 and 10,000 ppm silane for 30 minutes to ICR male mice (SPF) induced scar in the kidney cortex, serological changes of liver function indices, and slight lymphocytemia.
6. The series of this exposure experiments suggested the following ;
(1) LC_<LO>'s of exposure to silane for 30 minutes of 4 hours are more than 10,000 ppm or 1,000 ppm.
(2) Target organs of silane toxicity may be the kidney, the liver, and the spleen.
(3) Irritability of silane on mucous membrane may not be so strong as some literatures suggest.

  • Research Products

    (12 results)

All Other

All Publications (12 results)

  • [Publications] 酒井 徹、大前 和幸、中島 宏、山崎 一人、桜井 治彦: "マウスにおけるシランの吸入毒性 I 1,000ppmシラン1、2、4、8時間曝露" 第64回日本産業衛生学会総会講演集. 213 (1991)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 中島 宏、大前 和幸、酒井 徹、山崎 一人、桜井 治彦、等: "マウスにおけるシランの吸入毒性 II 1,000ppmシラン2週間及び4週間曝露" 第64回日本産業衛生学会総会講演集. 214 (1991)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 大前 和幸、酒井 徹、酒井 徹、山崎 一人、桜井 治彦: "マウスにおけるシランの吸入毒性 III 1,000〜10,000ppmシラン30分間曝露" 第64回日本産業衛生学会総会講演集. 215 (1991)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 瀬戸口 徹、稲葉 栄美、富本 昭雄、中島 宏、酒井 徹、大前 和幸等: "モノシランとテトラエトキシシランのマウスによる毒性実験" 日本酸素技報. 9. 68-72 (1990)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 酒井 徹、大前 和幸、武藤 孝司、佐藤 敏彦、武林 亨、中島 宏等: "半導体特殊材料ガス吸入曝露実験装置の開発と応用" 日本衛生学雑誌. 45. 540 (1990)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 大前 和幸: "半導体産業における微量元素の使用実態" 労働の科学. 44. 4-8 (1989)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T Sakai, K Omae, H Nakashima, K Yamasaki, H Sakurai: "Toxicity of silane on ICR mice I : 1-, 2-, 4-, and 8-hour exposure to 1, 000ppm silane." Jpn J Indust Health, Abstract for 64th annual Meeting. 213 (1991)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H Nakashima, K Omae, T Sakai, K Yamasaki, H Sakurai, et al.: "Toxicity of silane on ICR mice II : 2- and 4-week exposure to 1, 000 ppm silane." Jpn J Indust Health, Abstract for 64th annual Meeting. 213 (1991)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K Omae, T Sakai, H Nakashima, K Yamasaki, H Sakurai: "Toxicity of silane on ICR mice III : 30-minute exposure to 2, 500-10, 000ppm silane." Jpn J Indust Health, Abstract for 64th annual Meeting. 215 (1991)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T Setohuchi, E Inaba, A Tomimoto, H Nakashima, T Sakai, K Omae, H Sakurai: "Toxicity of silane and tetraethoxysilane on mice." Nippon Sanso Engineering Report. 9. 68-72 (1990)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T Sakai, K Omae, T Mutoh, T Satoh, T Takebayashi, H Nakashima, H Sakurai: "A design of exposure system to the specificity gases used in the semiconductor industry and its application." Jpn J Hyg. 45. 540 (1990)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K Omae: "Current trend of trace element consumption in semiconductor manufacturing industries." Rodo no Kagaku. 44. 4-8 (1988)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1993-08-12  

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