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1991 Fiscal Year Final Research Report Summary

Experimental research of high transconductance MOS field effect transistors fabricated by SIMOX technology

Research Project

Project/Area Number 01850005
Research Category

Grant-in-Aid for Developmental Scientific Research

Allocation TypeSingle-year Grants
Research Field Applied materials
Research InstitutionUniversity of TOKYO

Principal Investigator

SUGANO Takuo  Univ. of Tokyo, Dept. Electronic Eng., Professor, 工学部, 教授 (50010707)

Co-Investigator(Kenkyū-buntansha) SAKAI Tetsusi  NTT, LSI Laboratory, Division Director, LSI研究所, 微細加工技術研究部長
ARAI Fusako  Univ. of Tokyo, Dept. Electronic Eng., Lecturer, 工学部, 講師 (10010927)
ASADA Kunihiro  Univ. of Tokyo, Dept. Electronic Eng., Associate Professor, 工学部, 助教授 (70142239)
Project Period (FY) 1989 – 1991
KeywordsSIMOX / SOI / MOSFET / IC / High-speed device / Low-power / Silicon / Thin film
Research Abstract

In this year, measurement of ring oscillators and frequency dividers, which have been designed and fabricated using SIMOX (Separation by IMplanted OXygen) technology during last two years, have been carried out for evaluating their electric characteristics and performance.
Main features of the SOI substrates are their thinness of the buried oxide layers of 80 nm, compared to the previous ones of 500 nm. As a result of thinned buried oxide layers, it has been verified that the short channel effects have been successfully suppressed because of the shielding effect of electric flux from drain electrode by the substrate. Measurement results of the ring oscillators showed that the decrease of the delay time of scaled ring oscillators saturates at the gate length of 0.2 um and less. Thissaturation is considered to take place, as the stray capacitance between gate electrode sides and drain/source electrode becomes dominant, compared with the intrinsic gate oxide capacitance. This implies that the vertical scaling of the gate electrode is first important for the small devices with gate length less than 0.2 um.
Measurement that also been carried out for four types of frequency dividers, witch showed that a new circuit out of four is best in performance. The new circuit with 0.15 um gate length operated as high as 1 GHz with power consumption of 50 uW at the supply voltage of 1 V. This is due to the low stray capacitance of witing, as well as reduction in the number of FETs used in the new divider.

  • Research Products

    (6 results)

All Other

All Publications (6 results)

  • [Publications] Hiroshi Miki: "Subfemtojoule Deep Submicrometer-Gate CMOS Built In Ultra-Thin Si Film on SIMOX Substrate" IEEE Transaction on Electron Derices. 38. 373-377 (1991)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Minoru Fujishima: "1GHz 50μW 1/2 Frequency Dirider Fabricated on Ultra-thin SIMOX Substrate" 1992 VLSI Circuit Symposium Technical Digest.

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Minoru Fujishima: "Semi-analytical Modeling of Dynamic Performance of Ultra-thin SIMOX CMOS Circuit Bascd on Equivalent Linear Resistance" 1992 VLSI Technical Symposium Technical Digest.

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Hiroshi Miki: "Subfemtojoule Deep Submicrometer-Gate CMOS Built In Ultra-Thin Si Film on SIMOX Substrate" IEEE Transaction on Electron Devices. 38. 373-377 (1991)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Minosu Fujishima: "1 GHz 50 muW 1/2 Frequency Divider Fabricated on Ultra-shin SIMOX Substrate" 1992 VLSI Circuit Symposium Technical Digest. (1992)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Minoru Fujishima: "Semi-analytical modeling of Dynamic Performance of Ultra-thin SIMOX CMOS Circuit Based on Equivalent Linerar Resistance" 1992 VLSI Technical Symposium Technical Digest. (1992)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1993-03-16  

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