1991 Fiscal Year Final Research Report Summary
Development of new electron-beam resist
| Project/Area Number |
01850203
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| Research Category |
Grant-in-Aid for Developmental Scientific Research
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| Allocation Type | Single-year Grants |
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| Research Field |
高分子合成
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| Research Institution | Kumamoto University |
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Principal Investigator |
EGAWA Hiroaki Kumamoto University Faculty of Engineering, Professor, 工学部, 教授 (50040358)
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| Co-Investigator(Kenkyū-buntansha) |
江川 大海 チッソ(株), 開発室, 研究員
ONO Hiroshi Chisso Co. Yokohama Research Center, Chemicals Research and Development Group Te, 開発室, 主席研究員
HIGASHI Hiromi Chisso Co. Yokohama Research Center, Chemicals Research and Development Group Gr, 開発室, 室長
TAKAMASA Nonaka Kumamoto University, Faculty of Engineering Professor, 工学部, 教授 (50040423)
EGAWA Hiroaki Kumamoto University, Faculty of Engineering Professor (50040358)
EGAWA Hiromi Chisso Co. Yokohama Research Center, Chemicals Research and Development Group Re
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| Project Period (FY) |
1989 – 1991
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| Keywords | Electron-beam resist / 2, 3-Epithiopropyl methacrylate / Contrast / Dry etching resistance / Electron-beam sensitivity / Electron-beam exposure characteristics / 後硬化現象 |
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| Research Abstract |
Copolymers of 2, 3-epithiopropyl methacrylate (ETMA)-styrene derivatives were prepared by solution polymerization in benzene using azbisisobutyronitrile as an initiator and the electron-beam exposure characteristics of these copolymers were investigated. p-Chlorostyrene (pCS), m-chlorostyrene (mCS), and chloromethylstyrene (CMS) were used as styrene derivatives. The copolymers with lower molecular weight distribution were obtained by fractionation of bulk copolymers using dissolution-precipitation method. The following results on. electron-beam exposure charactreristics were obtained : Electron-beam sensitivity of these copolymers increased with increasing molecular weight and ETMA content. The copolymers with lower molecular weight and lower molecular weight distribution showed higher contrast. The sensitivity of ETMA-PCS copolymers was slightly lower than that of ETMA-MCS copolymers, and the order of contrast was reverse to that. of sensitivity. Although ETMA-CMS copolymers had higher sensitivity than ETMA-pCS and ETMA-MCS, the ETMA-CMS was unstable as electron beam resist. ETMA-pCS copolymers had higher dry etching resistance than ETMA homopolymers. ETMA-PCS and ETMA-MCS copolymers showed resolution capacity of 0.6 mum and 0.45 mum, respectively.
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