• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to project page

1990 Fiscal Year Final Research Report Summary

Development of Low-Energy Particle-Beam Sources for Super-fine Plasma Processing

Research Project

Project/Area Number 01880002
Research Category

Grant-in-Aid for Developmental Scientific Research (B).

Allocation TypeSingle-year Grants
Research Field プラズマ理工学
Research InstitutionNagoya University

Principal Investigator

SUGAI Hideo  Nagoya University Dept. of Electrical Engineering Professor, 工学部, 教授 (40005517)

Co-Investigator(Kenkyū-buntansha) TOYODA Hirotaka  Nagoya University Dept. of Electrical Engineering Assistant Professor, 工学部, 助手 (70207653)
Project Period (FY) 1989 – 1990
Keywordsplasma processing / plasma etching / surface magnetic field / plasma CVD / multi-dipole field / radio frequency discharge / fragmentation / plasma-surface interaction
Research Abstract

In order to realize super-fine plasma processings, several requirements should be satisfied : Ions incident on a substrate should have a monochromatic parallel velocity and a low energy not to give rise to damage, and also a high-flux, uniform, and large beam is necessary. These requirements will be met by developing a low-pressure, large-area, high-density plasma with the low plasma potential. To do this, we have developed a novel plasma production by an inductively coupled rf discharge under a surface magnetic field.
Multi-dipole surface magnetic fields produce following effects ; good confinement of high energy electrons, enhancement of plasma production, reduction of bulk-electron diffusion loss, and the resultant increase in plasma density as well as the uniformity. The decrease in the plasma potential is also expected.
Promising results were obtained in our prototype device with surface magnetic confinement as follows :
1. The discharge plasma was sustained at low pressures such as Torr.
2. A uniform, large-diameter (-40cm), high-density plasma with low plasma potential (-20 V) was obtained.
3. The plasma potential was controllable with an externally biased small electrode.
On the other hand, we have studied ion-induced radical production on surfaces ; fragmentation of high-energy poly-atomic ions at their impact on surfaces. This type of plasma-surface interactions is of interest since it can be applied to a new source of radical beams.

  • Research Products

    (6 results)

All Other

All Publications (6 results)

  • [Publications] Y.Yamashita 他: "Formation of CH Radical by Surface Bombardment in a Methane/Argon DC Discharge" Japanese Journal of Applied Physics. 28. 1647-1650 (1989)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Shirakawa 他: "RF Plasma Production at Ultralow Pressures with Surface Magnetic Confinement" Japanese Journal of Applied Physics. 29. 1015-1018 (1990)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Yamashita 他: "IonーInduced Radical Production on Surfaces during Deposition of Hydrogenated Amorphous Carbon" Journal of Applied Physics. 68. 3735-3737 (1990)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y. Yamashita, et al.: "Formation of CH Radical by Surface Bombardment in a Methane/Argon DC Discharge" Japan. J. Appl. Phys.Vol. 28, No. 9. 1647-1650 (1989)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T. Shirakawa, et al.: "RF Plasma Production at Ultra-low Pressures with Surface Magnetic Confinement" Japan. J. Appl. Phys. Vol. 29, No. 6. 1015-1018 (1990)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y. Yamashita, et al.: "Ion-induced Radical Production on Surfaces during Deposition of Hydrogenated Amorphous Carbon" Journal of Applied Physics. Vol. 68, No. 7. 3735-3737 (1990)

    • Description
      「研究成果報告書概要(欧文)」より

URL: 

Published: 1993-08-12  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi