1991 Fiscal Year Final Research Report Summary
Synthesis of Functional Ceramics Thin Films by Dual Ion Beam Sputtering Method
| Project/Area Number |
02453071
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| Research Category |
Grant-in-Aid for General Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
無機工業化学・無機材料工学
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| Research Institution | Ryukoku University |
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Principal Investigator |
KAMIJO Eiji Ryukoku University, Faculty of Science and Technology, Professor, 理工学部, 教授 (30214521)
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| Co-Investigator(Kenkyū-buntansha) |
KOIZUMI Mitsue Ryukoku University, Faculty of Science and Technology, Professor, 理工学部, 教授 (80029826)
URABE Kazuyori Ryukoku University, Faculty of Science and Technology, Professor, 理工学部, 教授 (50016383)
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| Project Period (FY) |
1990 – 1991
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| Keywords | Ion Beam Sputtring / Ion Beam Assisted Deposition / Ceramics Thin Film / TiN Thin Film / TiO_2 Thin Film / AIN Thin Film / Crystal Orientation |
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| Research Abstract |
Dual ion beam sputtering method for deposition of functional ceramics thin films is described. The metal atom flux was supplied on substrate by sputtering a metal target wi th an Ar ion beam, while the reactive gas ion flux was supplied directly on the growing film surface by a reactive ion beam. The present research aims at elucidating the effects and the mechanisms of ion beam bombardment to the growing film surface. In this research, it is clear that the ton beam bombardment is useful for controlling the crystallization and the crystal orientation of ceramics thin film formed on low temperature substrate. On basis of the experimental results, we have suggested a simple theoretical model which can predict a synthesis, growth and etching behavior on growing film surface by ion beam bombardment. This model must be verified by the further study. We have also reported on the properties and the crystal orientation of ion beam synthesized TIOL, TiN, (TiAIV) N, AIN ceramics thin films.
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