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1991 Fiscal Year Final Research Report Summary

Diamond Growth by Atomic Vapor Deposition and CVD in low pressure ambient

Research Project

Project/Area Number 02805005
Research Category

Grant-in-Aid for General Scientific Research (C)

Allocation TypeSingle-year Grants
Research Field Applied materials
Research InstitutionAoyama Gakuin University

Principal Investigator

INUZUKA Tadao  Aoyama Gakuin University College of Sci. and Eng. Prof., 理工学部, 教授 (30082788)

Co-Investigator(Kenkyū-buntansha) SAWABE Atsuhito  Toshiba Co., R & D Center, 金属セラミックス研究所 (70187300)
Project Period (FY) 1990 – 1991
KeywordsDiamond / CVD method / Atomic vapor deposition / Carbon cluster / Low temperature process
Research Abstract

Two kinds of experiments have been performed to reveal the fundamental process of diamond formation from the vapor phase and also to know the physical meaning of growing temperature such as 800-900C.
For the first experiment, carbon atoms prepared by removing carbon clusters are used as the source gas for diamond deposition in a hydrogen ambient of 10 Torr. In this system, diamond particles are found by high resolution TEM. If carbon vapor containing carbon clusters is used as the source gas, amorphous carbon films grow even at the elevated substrate temperature of about 850C.
For the second experiment, the hot-filament CVD method is used with the mixture gas of methane and hydrogen at the lower gas pressure of 0.01-1 Torr. The growth rate of diamond is remarkably reduced as the ambient gas pressure is lowered to about 0.01Torr. Below this pressure, diamond growth cannot be found by TEM observation.
Assuming the gas temperature of 2000C around the hotfilament, the concentration of active species such as hydrog en molecules, H, C, CH etc. is calculated. The mean free path of H and C at the gas temperature of about 2000C is also calculated. From these results, it is found that atomic carbon and atomic hydrogen arrive to the substrate surface without collision to the other species.
Considering these two experiments, it is shown that diamond can be grown preparing atomic carbon and hydrogen. The heating of growing surfaces is not required for the crystallization of diamond but for the dissociation of hydrogen from the surface. The remained important task is to perform the CVD process using the reaction of hydrogen extraction by atomic hydrogen. This will realize the low temperature process of diamond formation from the vapor phase.

  • Research Products

    (11 results)

All Other

All Publications (11 results)

  • [Publications] S.Koizumi: "Growth of Diamond by Atomic Vapor Deposition" J.of Cryst.Growth. 99. 1188-1191 (1990)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Koizumi: "Epitaxial Growth of Diamond Thin Films on c-BN{111} Surtaces by dc Plasma CVD" Appl.Phys.Lett.57. 563-565 (1990)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Yoshikawa: "Study of Crystallographie Orientations in the Diamond Films on c-BN using Raman-microprobe" Appl.Phys.Lett.57. 428-430 (1990)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Inuzuka: "Epitaxial Growth of Diamond Thin Films on Foreign Substrate" Diamond and Related Materials.

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 犬塚 直夫: "低圧雰囲気でのCVD法によるダイヤモンドの成長"

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 犬塚 直夫: "薄膜成長の話" 早稲田大学出版部, 160 (1990)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K. Suzuki, A. Sawabe and T. Inuzuka: ""Growth of Diamond Thin Films by dc Plasma Chemical Vapayr Deposition and Characteristics of The Plasma"" Jpn. J. Appl. Phys.29. 153 (1990)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S. Koizum, A. Sawabe T. Inuzuka and K. Suzuki: ""Growth of Diamond by Atomic Vapor Deposition"" J. Cryst. Growth. 99. 1188 (1990)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S. Koizumi, T. Murakami, K. Suzuki and T. Inuzuka: ""Epitaxial Growth of Diamond Thin Films on Cubic Boron Nitride (111) Surfaces by DC Plasma Chenical Vapor Deposition"" Appl. Phys. Lett.57. 563 (1990)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T. Inuzuka and S. Koizumi: ""Epitaxial Growth of Diamond Thin Films on c-BN"" Proc. of SPIE-The Int.

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T. Inuzuka: ""Epitaxial Growth of Diamond Thin Films on Foreign Substrates"" Diamond and Related Materials, Elsevier.

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1993-03-16  

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