プロセス用プラズマのシース

1993 Fiscal Year Annual Research Report

• Project/Area Number: 03302025
• Research Institution: Niihama National College of Technology
• Principal Investigator: 板谷 良平 新居浜工業高等専門学校, 校長 (90025833)
• Co-Investigator(Kenkyū-buntansha): 堀池 靖浩 広島大学, 工学部, 教授 (20209274) ; 後藤 俊夫 名古屋大学, 工学部, 教授 (50023255) ; 籏野 嘉彦 東京工業大学, 工学部, 教授 (90016121) ; 佐藤 徳芳 東北大学, 工学部, 教授 (40005252) ; 田頭 博昭 北海道大学, 工学部, 教授 (10001174)
• Keywords: 反応性プラズマ / シース / プラズマ・固体相互作用 / プラズマ・表面相互作用

Research Abstract

本研究課題は半導体プロセスに不可欠の技術であるプラズマプロセシングに関して最も重要な働きをしているプラズマのシース,すなわち,プラズマと固体表面との間に存在するインターフェースについて組織的な研究を開始したものである。
本年度は3か年計画の最終年度であり,2回の研究会を開き,研究成果のまとめを行った。
本研究における成果の主なものは次の通りである。
1.シースの構造について
条件の異なるプラズマすなわち、RFプラズマ,電子ビームプラズマ,マグネトロンプラズマ,微粒子プラズマ、ならびに特性の異なる固体壁すなわち電子放出電極,導体壁、および絶縁体壁前面におけるシースやプリシースの構造,特性について知見を得た。
2.シースのモデリングについて
固体表面に構造を持つ場合を含むシースについての各種シミュレーション技法が開発され,その結果として,RFプラズマの場合にボーム条件が従来のものと異なること,微粒子を含む場合にはシースの構造が2段になること,壁が絶縁物の場合には,壁への熱流束はイオンによるものよりも電子によるものの方が遥かに大きくなること等が明らかになった。
3.ラジカル、微粒子の生成と流束
プラズマ中の各種ラジカルの振舞いに関する計測が進み、各種ラジカル,特にCH系ならびにCF系の電子衝突生成断面積、密度分布,シースを横切るラジカル束,固体表面に入射するイオンによるラジカル生成等が定量的に明らかにされた。
シランプラズマ内の微粒子発生の時間的,空間的振舞が明らかになった。
プラズマに関するパラメタ制御によるエッチング特性やCVDの膜特性の改善が得られ、プロセス用プラズマ改良の有効性が示された。

Research Products

• [Publications] T.Namura、I.Arikata O.Fukumasa、M.Kubo and R.Itatani: "Effects of permanent magnet arrangements and antenna locations on the generation of multicusp electron cyclotron resonance plasma" Review of Scientific Instruments. 63. 21-30 (1992)
• [Publications] Ryohei Itatani: "Control of reactive plasmas:adventure to improve and to expand plasma processing" Pure & Appl.Chem.64. 697-702 (1992)
• [Publications] A.Hatta、M.Kubo、Y.Yasaka and R.Itatani: "Performance of Electron Cycrotron Resonance Plasma Produced by a New Microwave Launching System in a Multicusp Magnetic Field with Permanent Magnets" Jpn.J.Appl.Phys.31. 1473-1479 (1992)
• [Publications] Yasuyoshi Yasaka Atsushi Fukuyama Akimitsu Hatta and Ryohei Itatani: "Two-dimensional modeling of electron cyclotron resonance plasma production" Journal of Applied Physics. 72. 2652-2658 (1992)
• [Publications] Ryohei Itatani: "A Simple and efficient microwave launchcr for plasma production" Plasma Sources Science and Technology. 1. 13-17 (1992)
• [Publications] Ryohei Itatani: "Plasma application:plasma chenustry and material science back ground for plasma physicists" Industrial Application of plasma physics (分担). 81-94 (1993)
• [Publications] 板谷良平: "「プラズマプロセスの課題と将来の展望」" 核融合研究. 65. 489-507(5) (1991)
• [Publications] Takashi Nomura Ichiro Arikata Osamu Fukumasa Makoto Kubo Ryohei Itatani: "Effects of pemanent magnet arrangements and antema locations on the generation of multicusp electron cyclotron resonance plasma" Review of Scientific Instruments. 63. 21-30 (1992)
• [Publications] Akimitsu Hatta Makoto Kubo Yasuyosi Yasaka Ryohei Itatani: "Performance of Electron Cyclotron Resonance Plasma Produced by a New Microwave Launching System in a Multicusp Mgnetic Field with Permanent Magnets" Jpn.J.Appl.Phys.31. 1473-1479 (1992)
• [Publications] Akimitsu Hatta: "A Simple and efficient microwave Launcher for plasma production" Plasma Sources Sci.Technol. 1. 13-17 (1992)
• [Publications] Ryohei Itatani: "Control of reactive plasmas;adventure to improve and to expand plasma processing" Pure&Appl.chem.64. 697-702 (1992)
• [Publications] H.Takeno A.Fukuyama T.Toyoda M.Miyakita Ryohei Itatani: "Observation of ion-cycrotron heating due to mode conversion of fast waves in a simple mirror" Physics of Fluids B. 4. 1486-1491 (1992)
• [Publications] Ryohei Itatani: "Two-dimentional modeling of electron cyclotron resonance plasma production" J.Appl.Phys.72. 2652-2658 (1992)
• [Publications] 八坂保能 板谷良平: "高周波・マイクロ波放電" 核融合研究. 69. 336-342 (1993)
• [Publications] Ryohei Itatani: "Plasma application;plasma chemistry and material science background for plasma physcist" Industrial Applications of Plasma Physics(Societa Italiana di Fisica)23GE15:1993. 81-94
• [Publications] Ryohei Itatani: "Studies on topic waste destruction with plasma in Japan" Industrial Applications of Plasma Physics(Societa Italiana di Fisica)23GE16:1993. 271-280
• [Publications] 板谷良平: "プロセス用プラズマ-非平衡プラズマ" 核融合研究. 69. 769-771 (1993)
• [Publications] Masatoshi Ukai Kosei Kameta Noriyuki Kouchi Yoshihiko Hatano Kenichiro Tanaka: "Neutral decay of double-holed doubly excited resonances of Nz" Phys.Rev.A.46. 7019-7022 (1992)
• [Publications] Kosei Kameta Masatoshi Ukai Toshiyuki Numazawa Norihisa Terazawa Yuji Chikahiro Noriyuki Kouchi Yoshihiko Hatano: "Photoabsorption,photoionization,and neutral-dissociation cross sections of SiF_4,Sicl_4,and Si(CH_3)_4 in the extreme-ultraviolet range" J.Chem.Phys.99. 2487-2494 (1993)
• [Publications] Hiroaki Yoshida Masashi Kitajima Hideo Kawamura Koji Hidaka Masatoshi Ukai Noriyuki Kouchi Yoshihiko Hatano20GB20:Deexcitation cross sections of Ne(^3P_2,^3P_1, and ^3P_0)by molecules containing group-IV elements: J.Chem.Phys.98. 6190-6195 (1993)
• [Publications] Norihisa Terazawa Masatoshi Ukai Noriyuki Kouchi Kosei Kameta Yoshihiko Hatamo: "De-excitation of H(2p)in a collision with a Hz molecule" J.Chem.Phys.99. 1637-1643 (1993)
• [Publications] Shigeyasu Okigaki Kouji Hayashi Etuhito Suzuki Yoshihiko Hatano: "Electron thermalization Processes in gaseous mixtures" Prog.Astronaut Aeronaut.
• [Publications] Yoshihiko Hatano: "Dynamics of superexcited molecules" Dynamics of Excited Molecules Elsevier.
• [Publications] Yoshihiko Hatano: "Electron-ion recombination in dense molecular media" Linking the Caseous and Condensed Phases of Matter-The Behavior of Slow.
• [Publications] Tilmann Mark Yoshihiko Hatano Leon Sanche Franz Linder: "Electron-collision cross sections" Atomic and Molecular Data for Radiotherapy,LAEA.
• [Publications] Leon Sanche Tilmann Mark Yoshihiko Hatano: "Low-energy electron interactions with condensed matter" Atomic and Molecular Data for Radiotherapy,LAEA.
• [Publications] Yoshihiko Hatano Mitio Inokuti: "Photoabsorption,photoionization,and photodissociation cross sections" Atomic and Molecular Data for.
• [Publications] 籏野嘉彦: "高励起状態" 実験化学講座. 8. 175-186 (1993)
• [Publications] 籏野嘉彦: "電子付着過程" 実験化学講座. 8. 200-206 (1993)
• [Publications] Masatoshi Ukai Norihisa Terazawa Yuji Chikahiro Kosei Kameta Noriyuki Kouchi Yoshihiko Hatano Kenichiro Tanaka: "Optional Threshold Excitation Functions of Xe 5s,5p Photoionization Satellites near the 5s^<-1> Cooper Minimum" Phys.Rev.A.45. R15-R18 (1992)
• [Publications] Noriyuki Kouchi Norihisa Terazawa Yuji Chikahiro Masatoshi Ukai Kosei Kameta Yoshihiko Hatano Kenichiro Tanaka: "Angular Momentum Population of Excited H Atoms Produced by Photodissociation of Hz" Chem.Phys.Lett.190. 319-322 (1992)
• [Publications] Hiroaki Yoshida Hideo Hawamura Masatoshi Ukai Noriyuki Kouchi Yoshihiko Hatano: "Deexcitation Cross Sections of Ar(^3P_2,^3P_1,^3P_0 and ^1P_1)by CH_4,SiH_4 and GeH_4" J.Chem.Phys.96. 4373-4377 (1992)
• [Publications] Kosei Kameta Masatoshi Ukai Tetsu Kamosaki Kyoji Shinsaka Noriyuki Kouchi Yoshihiko Hatano Kenichiro Tanaka: "Photoaborption,Photoionization and Neutral Dissociation Cross Sections of Dimethyl Ether and Ethyl Methy1 Ether in the Extreme-Ultraviolet Range" J.Chem.Phys.96. 4911-4917 (1992)
• [Publications] Yasumasa Morishima Masatoshi Ukai Noriyuki Kouchi Yoshihiko Hatano: "Optical Model Calculation of Total Penning Ionization Cross Sections for He(2_1P)-Ar.Kr and Xe" J.Chem.Phys.96. 8187-8193 (992)
• [Publications] Shigeyasu Okigaki Etsuhiko Suzuki Koji Hayashi Kazuhisa Kurashige Yoshihiko Hatano: "Electron Thermalization Processes in the Bicomponent Systems of Kr and Some Simple Molecular Gases" J.Chem.Phys.96. 8324-8329 (1992)
• [Publications] Masatoshi Ukai Noriyuki Kouchi Kosei Kameta Norihisa Terazawa Yuji Chikahiro Yoshihiko Hatano Kenichiro Tanaka: "Extreme Ultraviolet Photodissociation of O_2 via the Free(c^4SIGMA^-_U)3ssigmag State as Probed by Dispersed Vacuum Ultraviolet Fluorescence" Chem.Phys.Lett.195. 298-302 (1992)
• [Publications] Kenji Honda Kentaro Endo Hitoshi Yamada Kyoji Shinsaka Masatoshi Ukai Noriyuki Kouchi Yoshihiko Hatano: "Electronion Recombination Rate Rate Constants in Gaseous and Liquid Krypton" J.Chem.Phys.97. 2386-2391 (1992)
• [Publications] Masatoshi Ukai Kosei Kameta Noriyuki Kouchi Kazunori Nagano Yoshihiko Hatano Kenichiro Tanaka: "Autoinizing-resonance Enhanced Preferential Photodissociation of CO_2 in Superexcited States" J.Chem.Phys.97. 2835-2842 (1992)
• [Publications] Yasumasa Morishima Hiroaki Yoshida Masatoshi Ukai Kyoji Shinsaka Noriyuki Kouchi Yoshihiko Hatano: "Deexciation of He(2^1P)in Collisions with Diatomic Molecules" J.Chem.Phys.97. 3180-3186 (1992)
• [Publications] Hiroaki Yoshida Masatoshi Ukai Hideo Kawamura Noriyuki Kouchi Yoshihiko Hatano: "Deexcitation Cross Sections of He(2^3S,2^1S and 2^1P)by Molecules Containing Group-IV Elements" J.Chem.Phys.97. 3289-3296 (1992)
• [Publications] Masatoshi Ukai Kosei Kameta Noriyuki Kouchi Yoshihiko Hatano Kenichiro Tanaka: "Neutral decay of Double-holed Doublely excited Resonances of N_221GC41:Phys.Rev" 46. 7019-7022 (1992)
• [Publications] Yasumasa Morishima Hiroaki Yoshida Masatoshi Ukai Kyoji Shinsaka Noriyuki Kouchi Yoshihiko Hatano: "Deexcitation of He(^<21>P)in a Hydrogen Molecule" J.Chem.Phys.94. 2564-2570 (1991)
• [Publications] Hiroaki Yoshida Yasumasa Morishima Masatoshi Ukai Kyoji Shinsaka Noriyuki Kouchi: "Cross Sections for Deexcitation of He(2^3S,2^1S and 2^1P)by SiH_4 and GeH_4" Chem.Phys.Lett.176. 173-177 (1991)
• [Publications] Kosei Kameta Masatoshi Ukai Ryo Chiba Kazunori Nagano Noriyuki Kouchi Yoshihiko Hatano Kenichiro Tanaka: "Absolute Measurements of Photoabsorption Cross Sections.Photoionization Cross Sections and Photoionization Quantum Yields of Silane in the 13-40 eV Region" J.Chem.Phys.95. 1456-1460 (1991)
• [Publications] Masatoshi Ukai Kosei Kameta Ryo Chiba Kazunori Nagano Noriyuki Kouchi Yoshihiko Hatano Hironobu Uemoto Yoshiro Ito Kenichiro Tanaka: "Ionizing and Nonionizing Decays of Superexcited Acetylene Molecules in the Extreme-Ultraviolet Region" J.Chem.Phys.95. 4142-4153 (1991)
• [Publications] Kosei Kameta Masatoshi Ukai Norihisa Terazawa Kazunori Nagano Yuji Chikahiro Noriyuki Kouchi Yoshihiko Hatano Kenichiro Tanaka: "Absolute Measurements of Photoabsorption and Photoionization Cross Sections of Disilane in the 13-40 eV Region" J.Chem.Phys.95. 6188-6189 (1991)
• [Publications] Masatoshi Ukai Yoshihiko Hatano20GB48:Deexcitation of Excited Rare Gas Atoms in Metastable and Resonance States as Studied by the Pulse Radiolysis Method: Gaseous Electronics and Its Applications Kluwer Academic Publ. 51-72 (1991)
• [Publications] Yoshihiko Hatano: "Pulse Radiolysis in the Gas Phase" Pulse Radiolysis,CRC Press. 199-228 (1991)
• [Publications] Yoshihiko Hatano Shingo Matsuoka: "Fundamental Molecular Parameters in the Gas Phase" Handbook of Radiation Chemistry,CRC Press. 187-292 (1991)
• [Publications] Akira Hitachi Masatoshi Ukai Yoshihiko Hatano: "Penning Ionization and Related Processes" Handbook of Radiation Chemistry,CRC Press. 223-225 (1991)
• [Publications] 籏野嘉彦: プラズマ材料科学 ハンドブック(編). (1992)
• [Publications] 籏野嘉彦: "プラズマ中の反応分子種" プラズマ材料科学 ハンドブック(分担). 4 (1992)
• [Publications] 籏野嘉彦: "プラズマ中の反応素過程" プラズマ材料科学 ハンドブック(分担). 9-10 (1992)
• [Publications] 籏野嘉彦: "放射光の原理と特徴" 表面科学の基礎と応用. 532-535 (1991)
• [Publications] 籏野嘉彦: "分子の光学的振動子強度とその測定" シンクトロン放射光. 9-28 (1991)
• [Publications] 籏野嘉彦: "パルス励起による化学反応" 放射光時間構造とその利用. 119-126 (1991)
• [Publications] 籏野嘉彦: "単パンチ運転によるSRパルスの利用" KEK Proc. 91-1. (1991)
• [Publications] H.Shin S.Miyazaki M.Hirose: "A New Deposition Mode in Plasma-Enhanced Cryorenic CVD" J.Non-Cryst.Solids. 137-138. 713-716 (1991)
• [Publications] H.Shin S.Miyazaki M.Hirose: "High-Fluidity Chemical Vapor Deposition of Silicon Dioxide" Appl.Phys.Lett.60. 2616-2618 (1992)
• [Publications] H.Shin K.Okamoto S.Miyazaki M.Hirose: "Effect of Substrate Bias on Silicon Thin Film Growth in Plasma Enhanced CVD at Cryogenic Temperatures" Jpn.J.Appl.Phys. 31. 1953-1957 (1992)
• [Publications] H.Shin M.Hashimoto K.Okamoto S.Miyazaki M.Hirose: "High-Fluidity Deposition of Silicon by Plasma-Enhanced Chemical Vapor Deposition Using Si_2H_6 or SiH_4" Jpn.J.Appl.Phys. 32. 3081-3084 (1993)
• [Publications] S.Miyazaki H.Shin K.Okamoto M.Hirose: "Wide-Gap Polysilane Produced by Plasma-Enhanced CVD at Cryogenic Temperatures" Material Research Soc.Symp.Proc.242. 681-686 (1991)
• [Publications] S.Miyazaki H.Shin H.Ichihashi M.Hirose: "Silicon Thin Film Growth by Plasma-Enhanced Cryogenic CVD Processing" Proc.of the 8th Symp.on Plasma. 285-288 (1991)
• [Publications] M.Hirose H.Shin S.Miyazaki Y.Horiike: "New Trends in Plasma Etching and CVD Intern,Colloquium on Plasma Processes" Proc.of the 8th. 105-112 (1991)
• [Publications] H.Shin S.Miyazaki H.Ichihashi M.Hirose: "Silicon Film Growth at Cryogenic Temperatures from Silane Plasma" Proc.of the Intern,Seminar on Reactive Plasmas. 201-204 (1991)
• [Publications] H.Shin H.Ichihashi S.Miyazaki M.Hirose: "High-Fluidity CVD of Silicon Oxide from SiH_4+O_2 Plasma" Extended Abstracts of the 1991 Intern.Conference on Solid State Devices and Materials. 201-203 (1991)
• [Publications] H.Shin K.Okamoto S.Miyazaki M.Hirose: "Effect of Substrate Bias on Silicon Thin Film Growth in Plasma Enhanced CVD at Cryogenic Temperatures" Proc.of Symp,on Dry Process. 151-155 (1991)
• [Publications] M.Hirose H.Shin S.Miyazaki: "A New Horizon of plasma Enhanced CVD for Future Electron Devices" Extended Abstracts of the 1992 Intern.Conference on Solid Stste Devices and Materials. 13-16 (1992)
• [Publications] H.Shin M.Hashimoto K.Okamoto S.Miyazaki M.Hirose: "High-Fluidity Deposition of Si by Plasma Enhanced CVD of Si_2H_6" Proc.of Symp.on Dry Process. 181-185 (1992)
• [Publications] G.Ganguly S.Yamasaki A.Matsuda: "Control of photo degradation in amorphous silicon The effect of deuterium" Philos.Mag.B. 63. 281-292 (1991)
• [Publications] J.L.Guizot K.Nomoto A.Matsuda: "Surface reactions during the a-Si H growth in the diode and triode glow-discharge reactors" Surf.Sci. 224. 22-38 (1991)
• [Publications] T.Makabe: "Electron Swarm transport in an RF field and related RF plasma properties" The Physics of Ionized Gases (Nove Scientific.
• [Publications] F.Tochikubo T.Makabe: "Absolute measurement of the excitation rate and density of the excited species in an RF discharge from the optical emission spectroscopy" Measurement Sci & Technol.2. 1133-1137 (1991)
• [Publications] T.Makabe N.Nakano Y.Ymaguchi: "Modeling and diagnostics of structure in RF glow discharges in Ar at 13.56 MHz" Phys.Rev. A45. 2520-2531 (1992)
• [Publications] F.Tochikubo T.Makabe S.Kakuta A.Suzuki: "Study of the structure in RF glow discharges in CH4 AND H2 by spatiotemporal optical emission spectroscopy" J.Appl.Phys.71. 2143-2150 (1992)
• [Publications] N.Shimura T.Makabe: "Structure of velocity distribution functions and transport swarm in CH_4 in a DC electric field" J.Phys.D25. 751-760 (1992)
• [Publications] S.Miyake A.Itoh N.Shimura T.Makabe: "Diagnostics of DC-magnetron discharges by emission-selected CT technique" J.Vac.Sci.Technol.A. 1135-1139 (1992)
• [Publications] Y.Yamaguchi T.Makabe: "Phase transition in DC Discharges in SiH_4" Jpn.J Appl.Phys.31(9A). L1291-L1294 (1992)
• [Publications] T.Tokonami T.Makabe: "Modeling of physical etching based on a two-dimensional velocity distibutions of ions and fast neutrals by the Bol tzmann equation" J.Appl.Phys.72(8). 3323-3329 (1992)
• [Publications] T.Kitamura N.Nakano T.Makabe Y.Yamaguchi: "RF plasma structures and its production efficiency in the frequency range from HF to VHF.-Computational investigation-" Plasma Sources Sci.Technol. 2(1). 40-45 (1993)
• [Publications] N.Shimura T.Makabe: "Theoretical analysis of electron velocity distributions and transport conefficients in HCI in a DC electric field" Jpn.J.App.Phys.32(2). 949-954 (1993)
• [Publications] N.Shimura T.Makabe: "Electron velocity distribution function in a gas in ExB fields." Appl.Phys.Lett.62(7). 678-680 (1993)
• [Publications] Z.Petrovic F.Tochikubo S.Kakuta T.Makabe: "Spatiotemporal optical emission spectroscopy of RF discharges in SF_5" J.Appl.Phys.73(5). 2163-2172 (1993)
• [Publications] S.Kakuta T.Makabe F.Tochikubo: "Frequency dependence on the structure of RF glow discharges in Ar." J.Appl.Phys.74(8). 4907-4914 (1993)
• [Publications] S.Kakuta Z.Lj.Petrovic.T.Makabe20GB85:Influence of frequency,pressure and mixture ratio of electronegative gas on electrical characteristics of rf discharges in N_2-SF_6 mixtures.: J.Appl.Phys.74(8). 4923-4931 (1993)
• [Publications] Y.Nakayama T.Makabe: "Lnvestigation of the ion ejection mechanisms of galliun liquid metal ion sources." J.Phys.D26. 1769-1775 (1993)
• [Publications] A.Matsuda S.Mashima K.Hasezaki A.Suzuki S.Yamasaki P.J.McElheny: "Preparation of stable and photoconductive hydrogenated amorphous silicon from a Xe-diluted silane plasma" Appl.Phys.Lett,. 58. 2494-2496 (1991)
• [Publications] A.Suzuki Y.Toyoshima P.J.McElheny A.Matsuda: "In-situ ultravioletlaser treatment during plasma deposition for the improvement of film qualities in hydrogenated amorphous silicon" Jpn.J.Appl.Phys. 30. L790-L792 (1991)
• [Publications] S.Mashima K.Hasezaki A.Suzuki P.J.McElheny A.Matsuda: "Control of photo-induced degradation in a-Si H prepared from Xe-diluted silane" Mater.Res.Soc.Proc.219. 3-13 (1991)
• [Publications] J.Dutta K.Hasezaki S.Msashima P.J.McElheny A.Suzuki G.Ganguly A.Matsuda: "Effect of ion bombardment on the properities of hydrogenated amorphous silicon prepared from undiluted and xenon-diluted silane" Jpn.J.Appl.Phys. 31. L299-L302 (1992)
• [Publications] G.Ganguly A.Matsuda: "Defect formation process during growth of hydrogenated amorphous silicon at high temperatures" Jpn.J.Appl.Phys. 31. L1269-L1271 (1992)
• [Publications] G.Ganguly A.Matsuda: "A defect density of〜1014 cm-3 in hydrogenated amorphous silicon deposited at high substrate tenperatures" Mater.Res.Soc.Proc.258. 39-44 (1992)
• [Publications] G.Ganguly A.Matsuda: "Defect formation during growth of hydrogenated amorphous silicon" Phys.Rev.B.47. 3661-3670 (1993)
• [Publications] S.Mashima A.Suzuki G.Ganguly A.Matsuda: "Trial to control hydrogen content in a-Si H deposited using rate-gas-diluted silane plasmas" Plasma Sources Sci.Technol.2. 23-25 (1993)
• [Publications] A.Suzuki G.Ganguly A.Matsuda: "Ultraviolet photon induced stimulation of surface reaction during growth of hydrogenated amorphous silicon:Estimation of the lifetime of film precursors" Appl.Phys.Lett.63. 2806-2808 (1993)
• [Publications] H.Nishio G.Ganguly A.Matsuda: "Reduction of the defect density in a-Si H deposited at < 250C" Mater.Res.Soc.Symp.Proc.297. 91-96 (1993)
• [Publications] 八坂保能: "パルスプラズマプロセスによる成膜" 日本真空協会関西支部研究例会資料. 5-1. 5- (1993)
• [Publications] 八坂保能: "高密度プラズマのモデリング" 応用物理学会プラズマエレクトロニクス講習会テキスト. 51- (1993)
• [Publications] Y.Ushigusa: "Large Diameter BOR Plasma Produced by using Multi-Annular Antenna" Proc.2nd Int'l Conf on Reactive Plasmas. 537- (1994)