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1992 Fiscal Year Final Research Report Summary

Change of plasma basic phenomena accompanied by electron temperature decrease

Research Project

Project/Area Number 03680002
Research Category

Grant-in-Aid for General Scientific Research (C)

Allocation TypeSingle-year Grants
Research Field プラズマ理工学
Research InstitutionTohoku University

Principal Investigator

IIZUKA Satoru  Tohoku University, Electro. Eng. Assis. Prof., 工学部, 助教授 (20151227)

Co-Investigator(Kenkyū-buntansha) HATAKEYAMA Rikizo  Tohoku University, Electro. Eng. Assis. Prof., 工学部, 助教授 (00108474)
Project Period (FY) 1991 – 1992
Keywordslow energy electron / processing plasma / RF discharge / room temperature plasma / Hollow cathode / electron temperature control / plasma chemistry / reactive plasma
Research Abstract

A novel method for a control of electron temperature of low pressure discharge plasmas, without changing pressure and discharge power, is developed and the physical mechanism is investigated. The electron temperature is controlled continuously from 5 eV to 0.04 eV. The results are summarized as follows:
1) The energy control is performed by changing a construction of hollow cathode or biasing a grid in a discharge plasma.
2) Cold electrons are generated by an ionization due to high energy electrons passing through a negatively biased grid.
3) From the electron energy distribution, cumulative ionization due to the electrons of -5eV is an important mechanism for producing cold electrons.
4) Radial profile has a good uniformity within 5 % over 30 cm in diameter.
5) The energy control is possible to occur in a DC discharge, a microwave discharge, and an RF discharge as well.
6) The gas species (argon, helium, hydrogen) are not intrinsical factor for the energy control.
7) In reactive plasmas with methane we observe enhanced productions of negative hydrogen ion and methyl radical with a decrease in the electron temperature.
The phenomena investigated here are applicable to the energy control of the processing plasma as well as the basic plasma experiments.

  • Research Products

    (12 results)

All Other

All Publications (12 results)

  • [Publications] N.SATO,S.IIZUKA: "Effects of electoron temperature control on an Ar-CH_4 plasma" Proc.of the Inter.Seminor on Reactive Plasmas.1. 371-376 (1991)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.KATO,T.TANAKA,S.IIZUKA,N.SATO: "Electron temperature decrease in an rf discharge plasma" Proc.of 10th Symposium on Plasma Processings,. 10. 353-356 (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N.SATO,S.IIZUKA,T.KOIZUMI,N.SATO: "Electron temperature control by movable pins installed in a hollow cathode for discharge plasma" Applied Physics Letters,. 62. 567-569 (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.IIZUKA,T.KOIZUMI,T.TAKADA,and N.SATO: "An effect of electron temperature on negative hydrogen ion production in a low-pressure Ar discharge plasma with methane" Applied Physics Letters. (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.KATO,S.IIZUKA,N.SATO: "A low-pressure discharge plasma with electron temperature controllable from 〜5eV to 〜0.04eV by a grid" Applied Physics Letters. (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.IIZUKA,T.TAKADA,N.SATO: "An enhanced methyl radical production by control of local plasma structures in an Ar-CH_4 pin-hollow cathode discharge" Applied Physics Letters. (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N. Sato, S. Iizuka,: "Effects of electron temperature control on an Ar-CH_4 plasma" Proc. of the Inter. Seminar on Reactive Plasmas. Vol. 1. 371-376 (1991)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K. Kato, T. Tanaka, S. Iizuka, N. Sato,: "Electron temperature decrease in an rf discharge plasma" Proc. of 10th Symposium on Plasma Processings. Vol.10. 353-356 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N. Sato, S. Iizuka, T. Koizumi, N. Sato: "Electron temperature control by movable pins installed in a hollow cathode for discharge plasma" Applied Physics Letters. Vol.62. 567-569 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S. Iizuka, T. Koizumi, T. Takada, N. Sato: "An effect of electron temperature on negative hydrogen ion production in a low-pressure Ar discharge plasma with methane" Applied Physics Letters.

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K. Kato, S. Iizuka, N. Sato: "A low-pressure discharge plasma with electron temperature controllable from -5 eV to -0.04 eV by a grid" Applied Physics Letters.

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S. Iizuka, T. Takada, N. Sato: "An enhanced methyl radical production by control of local plasma structures in an Ar-CH_4 pin-hollow cathode discharge" Applied Physics Letters.

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1994-03-24  

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