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1992 Fiscal Year Final Research Report Summary

Precise Fine-Pattern-Etching of Resist Using Supermagnetron Plasma

Research Project

Project/Area Number 03805025
Research Category

Grant-in-Aid for General Scientific Research (C)

Allocation TypeSingle-year Grants
Research Field 電子材料工学
Research InstitutionShizuoka University

Principal Investigator

KINOSHITA Haruhisa  Shizuoka University, Research Institute of Electronics, Associate Professor, 電子工学研究所, 助教授 (70204948)

Co-Investigator(Kenkyū-buntansha) KANAZAWA Motoichi  Kokusai Electric Co., Ltd., Semiconductor Equipment Division, Manager, 電子機械(事), 主任技師
MATSUMOTO Osamu  Kokusai Electric Co., Ltd., Semiconductor Equipment Division, Manager, 電子機械(事), 部長
Project Period (FY) 1991 – 1992
Keywordsmagnetron plasma / supermagnetron plasma / semiconductor process / low temperature etching / quarter-micron etching / plasma process / reactive ion etching / plasma etching
Research Abstract

With increase of the integration density of semiconductor integrated circuits, submicron pattern etchings were required. For the development of 256MbDRAM, 0.2mum fine pattern etchings would be necessary. After 2-5 years from now, the research of 1Gb-4GbDRAM and the study of O. 15-0.2mum fine pattern etchings will be started. In this two-years study of high-rate etching of 1mum thick resist, a supermagnetron plasma etcher developed about five years ago by the head investigator was used for its application to the industry use. The etch shape was controlled by chilling the lower cathode and substrates down to -30゚C using a low temperature circulator. The upper cathode was covered with a graphite plate to prevent from the contamination of the substrate surface by the deposition of sputtered metals. The graphite etched by oxigen plasma changes to CO gas and never contaminate the substrate.
For the preparation of fine pattern etching, many kinds of etching characteristics were investigated at the lower cathode temperature of about -20゚C. The highest etch-rate and etch-uniformity were obtained at the rf phase difference of about 180゚ between the rf powers supplied to the upper and lower cathodes. The high etch rates of 0.5-1mum/min were obtained at the O_2 gas flow rate of 30-50 sccm. The resist layers on Si wafers, patterned with Si containing photoresist by using eximer laser exposure equipment, were etched. 0.25mum lines with vertical side walls were etched within a small side wall etching of 0.02mum by chilling the wafer down to -20゚C at the self-bias voltage of -140V. From this study, it was found that the 0.1mum fine pattern etching technology investigated for for the future ULSI process could be realized using the supermagnetron plasma.

  • Research Products

    (18 results)

All Other

All Publications (18 results)

  • [Publications] 木下 治久: "Spectroscopic Study of Optical Emissive Species in O_2 Supermagnetron Plasms" Proceedings of Japanese Symposium on Plasma Chemistry. 4. 273-278 (1992)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 木下 治久: "Investigation of O_2 Supermagnetron Plasma Character-istics vs RF Phase Difference for Resist Etching" Proceedings of 9th Symposium on Plasma Processing. 9. 273-276 (1992)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 木下 治久: "Generation of High-Density O_2 Supermagnetron Plasma for Highly Uniform Plasma Etching" Journal of Vacuum Science & Technology. A10. 1092-1095 (1992)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 木下 治久: "高均一・高密度0_2スーパーマグネトロンプラズマの発生とレジストの超微細エッチング" 静岡大学電子工学研究所報告. 27. 47-59 (1992)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 木下 治久: "Etching Unifornity Control and Fine Pattern Etching Using O_2 Supermagnetron Plasma" Proceedings of Japanese Symposium on Plasma Chemistry. 5. 71-76 (1992)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 木下 治久: "Low Temperature Etching of Resist Using O_2 Supermagnetron Plasma" Proceedings of 10th Symposium on Plasma Processing. 10. 61-64 (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 木下 治久: "スーパーマグネトロンプラズマを用いた低温でのレジスト微細エッチング" 電子情報通信学会技術研究報告. 92. 15-20 (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 木下 治久: "Optical Emission Measurement of High-Uniformity and High-Density O_2 Supermagnetron Plasma" Journal of Nuclear Materials. (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 木下 治久: "Generation of High-Density O_2 Supermagnetron Plasma on Lower Cathode by power Supply to Upper Cathode" Journal of Vacuum Science & Technology. (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Kinoshita, H.Ikegawa and M.Yamauchi: "Spectroscopic Study of Optical Emissive Species in O_2 Supermagnetron Plasma" Proceedings of Japanese Symposium on Plasma Chemistry. Vol.4. 273-278 (1992)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kinoshita, K.Nomoto, H.Ikegawa and M.Kanazawa: "Investigation of O_2 Supermagnetron Plasma Characteristics vs RF Phase Difference for Resist Etching" Proceedings of 9th Symposium on Plasma Processing. 273-276 (1992)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kinoshita and K.Nomoto: "Generation of High-Density O_2 Super-magnetron Plasma for Highly Uniform Plasma Etching" J.Vac.Sci.Technol.Vol. A10. 1092-1095 (1992)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kinoshita: "Generation of High-Density and High-Uniformity O_2 Supermagnetron Plasma and Its Application to Photoresist Fine Pattern Etching" Bulletin of the Research Institute of Electronics Shizuoka University. Vol. 27. 47-59 (1992)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kinoshita and Y.Kimura: "Etching Uniformity Control and Fine Pattern Etching Using O_2 Supermagnetron Plasma" Proceedings of Japanese Symposium on Plasma Chemistry. Vol.5. 71-76 (1992)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kinoshita, M.Honda and M.Kanazawa: "Low Temperature Etching of Resist Using O_2 Supermagnetron Plasma" Proceedings of 10th Symposium on Plasma Processing. 61-64 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kinoshita, H.Maeda and M.Honda: "Fine Pattern Etching of Resist at Low Temperature Using O_2 Supermagnetron Plasma" Technical Report of IEICE. Vol.92 SDM92-158. 15-20 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kinoshita and H.Ikegawa: "Optical Emission Measurement of High-Uniformity and High-Density O_2 Supermagnetron Plasma" Journal of Nuclear Materials. (1993)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kinoshita: "Generation of High-Density O_2 Supermagnetron Plasma on Lower Cathode by RF Power Supply to Upper Cathode" J.Vac.Sci.Technol. Vol.all. (1993)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1994-03-24  

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