1994 Fiscal Year Final Research Report Summary
Development of large-diameter RF plasmas under surface magnetic field
| Project/Area Number |
04558002
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| Research Category |
Grant-in-Aid for Developmental Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
プラズマ理工学
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| Research Institution | Nagoya University |
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Principal Investigator |
SUGAI Hideo Nagoya University, Faculty of Engineering, Professor, 工学部, 教授 (40005517)
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| Co-Investigator(Kenkyū-buntansha) |
NAKAMURA Keiji Nagoya University, Faculty of Eng., Assistant Prof., 工学部, 助手 (20227888)
TOYODA Hirotaka Nagoya University, Faculty of Eng., Associate Prof., 工学部, 講師 (70207653)
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| Project Period (FY) |
1992 – 1994
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| Keywords | plasma process / high density plasma / inductively coupled plasma / helicon plasma / plasma etching / surface magnetic field / Faraday shield / indium-tin-oxide film |
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| Research Abstract |
The research and development on plasma production, diagnostics and control have been extentsively performed in order to produce a high-density, large-diameter and low-pressure plasma for materials processing. The results obtained in this study are summarized below :
1.High-Density Plasma Production
A large-diameter high-density plasma at low pressures was generated by inserting an inductive RF antenna into a vacuum vessel which is covered with surface magnetic fields. Electrostatic coupling of the antenna from plasma was shown to be suppressed by a Faraday shield. On the other hand, mechanisms of RF power absorption in a helicon plasm were investigated. Under the conditions of low magnetic fields (<100 G) and low power (<1 kW) , the RF power turned out to be deposited into a plasma via antenna nearfields rather than helicon wave fields.
2.Diagnosticcs, Control and Applications of High-Density Plasmas
The detaild dignostics showed that a high electron density considerably modifies the radical composition, thus degrading an etch selectivity. Two methods to solve this problem were developed : one is a vessel wall heating (100-200ﾟC) and the other is a pulsed discharge (duration -10mus) .In addition, we developed new techniques for measuring electron density by a plasma oscillation method, electron energy distribution functi on by a biased optical probe method, and SiH_3 radical and particulates by ultravioret absorption spectroscopy.
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