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1994 Fiscal Year Final Research Report Summary

Ion beam analysis of bond electron distributions in solids

Research Project

Project/Area Number 05452065
Research Category

Grant-in-Aid for General Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field 物理学一般
Research InstitutionUniversity of Tsukuba

Principal Investigator

KUDO Hiroshi  Inst.of Appl.Phys., Univ.of Tsukuba, Associate Professor, 物理工学系, 助教授 (40111364)

Co-Investigator(Kenkyū-buntansha) NARAMOTO Hiroshi  Japan Atomic Energy Institute, Head Researcher, 材料開発部, 主任研究員
Project Period (FY) 1993 – 1994
Keywordsion beam analysis / bond electron / ion beam shadowing / channeling
Research Abstract

The aim of this research is to establish a new field of ion beam applications in solid state physics and material analyzes. Since the use of ion-induced secondary electrons for structure analysis is essentially an original approach, we have modified the whole system for electron measurements, including the electron spectrometer, in the first phase of the research.
The electron yield at energies between the loss-peak energy and the binary-peak energy, E_<B'> is contributed from all the target electorons (inner-shell, outer-shell, and valence electrons). Since under channeling incidence conditions the inner-shell electrons are completely shadowed except near the surface, valence and a few outershell electrons preferentially contribute to the observed yield. The reduced contrbution from inner-shell electrons should allow a sensitive analysis of the distribution of valence electrons in the crystal lattice.
With the shadowing analysis, the number of unshadowed electrons per target atom, N,has been determined from a comparison of the electron yields for H^+ and for He^<2+> of equal velocity. As the first trial of the shadowing analysis of bond electrons, measurements have been made for Si and Ge, of which the distribution of bond electrons is well known. The results indicate that for Si the value of N surely corresponds to the four bond electrons, while for Ge there is a considerable contribution from the outer-shell (3d) electrons. Furthermore, the value of N depends on the ion-flux distribution in the crystal channel. For precise analysis of bond electrons, a computer simulation approach in which the ion flux can be taken into account is now under way.

  • Research Products

    (12 results)

All Other

All Publications (12 results)

  • [Publications] H.Kudo et al: "Surface Layer Analysis of Sputter-Etched Si Using Secondary Electrons Induced by Fast Ions" JPn.J.Appl.Phys.32. L650-L653 (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Kudo et al: "High-energy shadowing effect and its application to atomic and solid state physics" Nucl.Instrum.& Methods. B90. 533-536 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Inoue et al: "Characterization of Epitaxially Grown CeO2(110)Layers on Si by Means of Shadowing Pattern Imaging with Fast Ion beams" Jpn.J.Appl.Phys.33. L139-L142 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Kudo et al: "Charge states of fast ions in glancing collisions with aligned atoms in Si crystals" Phys.Rev.A50. 4049-4056 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Kudo et al: "High-Sensitivity Channeling Analysis of Lattice Disorder Near Surfaces Using Secondary Electrons Induced by Fast Ions" Jpn.J.Appl.Phys.34. 615-619 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Fukusho et al: "Shadowing Pattern Imaging of Si and Ge Crystals Bombarded with 5 ke V Ar^+" Jpn.J.Appl.Phys.,. (to be published.).

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Kudo, E.Yoshida and T.Ishihara: "Surface Layr Analysis of Sputter-Etched Si Using Secondary Electrons Induced by Fast Ions" Jpn.J.Appl.Phys.32. L650-L653 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Inoue, H.Kudo, T.Fukusho, T.Ishihara and T.Ohsuna: "Characterization of Epitaxially Grown CeO_2 (110) Layrs on Si by Means of Shadowing Pattern Imaging with Fast Ion beams" Jpn.J.Appl.Phys.33. L139-L142 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kudo, K.Shima, T.Ishihara, H.Takeshita, Y.Aoki, S.Yamamoto, and H.Naramoto: "High-energy shadowing effect and its application to atomic and solid state physics" Nucl.Instrum.& Methods. B90. 533-536 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kudo, T.Fukusho, T.Ishihara, H.Takeshita, Y.Aoki, S.Yamamoto, and H.Naramoto: "Charge states of fast ions in glancing collisions with aligned atoms in Si crystals" Phys.Rev.A50. 4049-4056 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kudo, T.Fukusho, A.Tanabe, T.Ishihara, T.Inoue, M.Satoh, Y.Yamamoto and S.Seki: "High-Sensitivity Channeling Analysis of Lattice Disorder Near Surfaces Using Secondary Electrons Induced by Fast Ions" Jpn.J.Appl.Phys.34. 615-619 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Fukusho, A.Tanabe, H.Kudo, T.Ishihara, and S.Seki: "Shadowing Pattern Imaging of Si and Ge Crystals Bombarded with 5 keV Ar^+" Jpn.J.Appl.Phys.(to be published.).

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1996-04-15  

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