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1994 Fiscal Year Final Research Report Summary

Development of Diamond Film Synthesis at Room Temperature

Research Project

Project/Area Number 05555087
Research Category

Grant-in-Aid for Developmental Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field Electronic materials/Electric materials
Research InstitutionOsaka University

Principal Investigator

HIRAKI Akio  Department of Electrical Engineering, Osaka University, Professor, 工学部, 教授 (50029013)

Co-Investigator(Kenkyū-buntansha) OKADA Shigenobu  R/D & Engineering Department, Aircraft Equipment Division, SHIMADZU CORPORATION,, 航空機器事業部, 主任研究員
HATTA Akimitsu  Department of Electrical Engineering, Faculty of Engineering, Osaka University,, 工学部, 助手 (50243184)
ITO Toshimichi  Department of Electrical Engineering, Faculty of Engineering, Osaka University,, 工学部, 助教授 (00183004)
Project Period (FY) 1993 – 1994
KeywordsDiamond / Semiconductor / Polycrystal / ECR discharge / Plasma CVD / Pulse modulation / Optical Emission / IRLAS
Research Abstract

In this fiscal year, diamond films were synthesized by pulse modulated ECR plasma chemical vapor (CVD) deposition method using a magneto-active microwave plasma CVD system equipped with a microwave power source of 5 kW in maximum power and a infrared laser absorption spectroscopy (IRLAS) system. Optical emission spectroscopy and IRLAS measurement were also carried out in the magneto-active microwave plasma CVD.The growth rate of the diamond films by the pulse modulated plasma CVD with a maximum microwave power of 5 kW was three times as large as one of the continuous plasma of time averaged microwave power (2.5 kW) .
The pulse modulated plasma was investigated by spectroscopic measurements to reveal the enhancing mechanism. The growth rate showd a drastic peaking at 500 Hz in frequency. It was observed that the time averaged CH_3 density was increased by the pulse operation. However, the methyl (CH_3) radical density did not show such a drastic change as changed the freqency was. The enhancement of diamond growth must be explained not only by the CH_3 density but also the other species enhanced by the pulse operation.
It was observed in the optical emission spectroscopy that the life time of the Hydrogen radical (H) was about 1 ms in the after glow. The period of 1 ms agree with the most suitable modulation frequency, i.e., 500Hz. These result imply the importance of H radical in the diamond growth.
The goal of this research, i.e., low temperature fabrication of diamond films, was almost achieved by using nanocrystal seeding for diamond nuclei. Well faceted diamond films were successfully fabricated on the Si substrates below 200゚C.It was concluded that the prevention of polymerization on the substrates was a key point to decrease the growth temperature.

  • Research Products

    (10 results)

All Other

All Publications (10 results)

  • [Publications] Takuya Yara他: "Fabrication of Diamond Films at Low Pressure and Low Temperature by Magneto-Active Microwave Plasma Chemical Vapor Deposition" Jpn. J. Appl. Phys.33. 4404-4408 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Nobuhiro Eimori 他: "Electron Affinity of Single-Crystalline Chemical-Vapor Deposited Diamond Studied by Vltraviolet Synchrotron Rediation" Jpn. J. Appl. Phys.33. 6312-6315 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Akimitsu Hatta 他: "Diamond Film Growth on Low-Temperature Substrate by Magneto-Active Microwave Plasma CVD" Diamond Films and Technology. 5. 29-39 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Takuya Yara 他: "Low Temperature Fabrication of Diamond Films with Nanocrystal Seeding" Jpn.J.Appl.Phys.34. L312-L315 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] A,Hatta他: "Pulse modulated electron cyclotron resonance plasma for chemical vapor deposition of diamond films" Appl.Phys.Lett.66(印刷中). (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Takuya Yara, Motokazu Yuasa, Manabu Shimizu, Hiroshi Makita, Akimitsu Hatta, Jun-ichi Suzuki, Toshimichi Ito and Akio Hiraki: ""Fabrication of Diamond Films at Low-Pressure and Low-Temperature by Magneto-Active Microwave Plasma Chemical Vapor Deposition"" Jpn.J.Appl.Phys.vol.33. 4404-4408 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Nubuhiro Eimori, Yusuke Mori, Akimitsu Hatta, Toshimichi Ito and Akio Hiraki: ""Electron Affinity of Single-Crystalline Chemical-Vapor-Deposited Diamond Studied by Ultraviolet Synchrotron Radiation"" Jpn.J.Appl.Phys.vol.33. 6312-6315 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Akimitsu Hatta, Takuya Yara, Hiroshi Makita, Motokazu Yuasa, Jun-ichi Suzuki, Yusuke Mori, Toshimichi Ito, Takatomo Sasaki and Akio Hiraki: ""Diamond Film Growth on Low-Temperature Substrate by Magneto-Active Microwave Plasma CVD"" Diamond Films and Technology. vol.5. 29-39 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Takuya Yara, Hiroshi Makita, Akimitsu Hatta, Toshimichi Ito and Akio Hiraki: ""Low Temperature Fabrication of Diamond Films with Nanocrystal Seeding"" Jpn.J.Appl.Phys.vol.34. L312-315 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] A.Hatta, K.Kadota, Y.Mori, T.Ito, T.Sasaki and A.Hiraki: ""Pulse modulated electron cyclotron resonance plasma for chemical vapor deposition of diamond films"" Appl.Phys.Lett.vol.66. (1995)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1996-04-15  

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