• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to project page

1994 Fiscal Year Final Research Report Summary

Ultra thin contact formation using soft X-ray emission spectroscopy

Research Project

Project/Area Number 05555191
Research Category

Grant-in-Aid for Developmental Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field Material processing/treatments
Research InstitutionOKAYAMA UNIVERSITY

Principal Investigator

IWAMI Motohiro  FACULTY OF SCIENCE,Okayama University, PROFESSOR, 理学部, 教授 (80029123)

Co-Investigator(Kenkyū-buntansha) WATABE Hirokuni  MATSUSHITA RESEARCH INSTITUTE,TOKYO Inc.DEVLOPMENT OF INTERNATIONAL TECHNOLOGY,D, 国際技術開発部, 部長
HIRAI Masaaki  FACULTY OF SCIENCE,Okayama University, RESEARCH ASSOCIATE, 理学部, 助手 (80093681)
Project Period (FY) 1993 – 1994
KeywordsULTRA-THIN CONTACT / TRANSITION METAL SILICIDE / NON-DESTRUCTIVE ANALYSIS / SOFT X-RAY EMISSION SPECTROSCOPY / SXES-IAV / SXES-IEV
Research Abstract

At the first year, a desk plan was established for the soft X-ray emission spectroscopy equipment, using a multi-channel detector. Then it was constructed using MCD,etc., which enabled to measure energy spectrum of photons emitted from a specimen in a certain energy range, e.g., hnu_1-hnu_2, simultaneously, although the one equipped already could measure such spectrum only point by point. The new method was acertained to have an expected performance with even higher energy resolution than the old one. Then, the system was also ascertained to be used as a non-destructive analysis tool of a thin film contact system using either IAV (incident angle variation) or IEV (incident energy variation) method.
As for the research on the ultra-thin contact formation, low temperature contact formation processes were investigated, e.g., for a Fe (thin film) -Si (substrate) contact system. Then, we found that, for the Fe-Si system, Fe-rich silicides were formed at low temperatures, and Si became rich a … More t higher temperatures to have final phase of FeSi_2 at the highest temperature (-800゚C which was much less than the melting point of the compound) . Mixed phases were observed at some moderate annealing temperatures. The correlation between the heating temperature and the silicide phase formed which was found in the present study will help the formation of a ultra-thin contact.
Also, MnP-type transition metal monosilicides, i.e., PdSi, NiSi and PtSi, were studied in view of finding the correlation between the structure and the electronic property, where metal (M) atoms, i.e., Pd, Ni and Pt, have the same number of valence electrons, i.e., 10 electrons. Soft X-ray emission spectroscopy analysis of the silicide have shown that there is a meaningful correlation between atomic distances of M-Si, or Si-Si, and the valence band electronic structures of the silicides. This result indicates that the band structure manipulation will be possible by modifying atomic distances in a silicide, which means the electronic property, e.g., the conductivity, could possibly be manipulated. Less

  • Research Products

    (21 results)

All Other

All Publications (21 results)

  • [Publications] 岩見基弘: "光子・電子分光法による界面電子状態評価" 日本金属学会会報. (印刷中). (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H. Watabe, M. Iwami, M. Hirai, M. Kusaka,H.Nakamura and H. Miyashita: "Nondestructive Study of Metal-Silicon Interfaces Using Soft X-ray Emission Spectroscopy" Mat. Res. Soc. Sympo. Proc,. 320. 255-260 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M. Kasaya, S. Yamauchi, M. Hirai, M. Kusaka, M. Iwami, H. Nakamura and H. Watabe: "Study of Iron Silicide Formation on Si(111)by Soft X-ray Emission Spectroscopy" Appl.Surf.Sci.75. 110-114 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S. Yamauchi, S. Kawamoto, M. Hirai, M. Kusaka, M. Iwami, H. Nakamura, H. Ohshima and T. Hattori: "Valenc-Band Density of States of Near-Noble-Metal (Ni, Pd, Pt) Monosilicides by Using Soft-X-ray-Emission Spectroscopy" Phys. Rev. B. 50. 11564-11569 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M. Kasaya, S. Yamauchi, M. Hirai,M. Kusaka, M. Iwami, H. Nakamura and H. Watabe: "Valence Band Density of States of the Iron Silicides Studied by soft X-ray Emisssion Spectroscopy" J. Phys. Soc. Jpn.63. 4097-4101 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S. Kawamoto, M. Hirai, M. Kusaka, M. Iwami and H. Watabe: "Valence Band Density of States of Paradium Silicides Studied by X-ray Emission Spectroscopy (XES)" Jpn. J. Appl. Phys.32 Pt. 2. L597-L600 (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M. Iwami: "Metal-Semiconductor Interfaces 11.Soft X-ray Emission Spectroscopy:Valence Band Electronic Structures of Silicides and Non-destructive Depth Profiling" OHM-SHA. Ed. by A. Hiraki (印刷中), (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] C.Heck, M.Kusaka, M.Hirai, M.Iwami and H.Nakamura: "Study of Cr Silicide Formation on Si (100) Due to Solid-Phase Reaction Using Soft X-ray Emission Spectroscopy" Jpn.J.Appl.Phys.33, Pt.1. 6667-6670 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Watabe, M.Iwami, M.Hirai, M.Kusaka, H.Nakamura and H.Miyashita: "Nondestructive Study of Metal-Silicon Interfaces Using Soft X-ray Emission Spectroscopy" Mat.Res.Soc.Sympo.Proc. 320. 255-260 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Kasaya, S.Yamauchi, M.Hirai, M.Kusaka, M.Iwami, H.Nakamura and H.Watabe: "Study of Iron Silicide Formation on Si (111) by Soft X-ray Emission Spectroscopy" Appl.Surf.Sci.75. 110-114 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Yamauchi, S.Kawamoto, M.Hirai, M.Kusaka, M.Iwami, H.Nakamura, H.Ohshima and T.Hattori: "Valenc-Band Density of States of Near-Noble-Metal (Ni, Pd, Pt) Monosilicides by Using Soft-X-ray-Emission Spectroscopy" Phys.Rev.B. 50. 11564-11569 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Yamauchi, M.Kasaya, M.Hirai, M.Kusaka, M.Iwami, H.Ohshima, T.Hattori, Y.Kamiura and F.Hashimoto: "Preparation and Electronic Properties of Epitaxial beta-FeSi_2 on Si (111) Substrate" Control.of Semiconductor Interfaces, eds.I.Ohdomari, M.Oshima and A.Hiraki (Elsevier Science B.V., Amsterdam, 1994). 377-382

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Yamauchi, H.Ohshima, T.Hattori, S.Kawamoto, M.Hirai, M.Kusaka, M.Iwami and H.Nakamura: "Growth and Electronic Structure of Near-Noble Metal Mono-Silicides (NiSi, PdSi, PtSi) on Si Substrates : SXES" Proc.22nd Int.Conf.Phys.Semicond.(1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Yamamoto, T.Ohyama, E.Otsuka, S.Yamauchi and M.Iwami: "Influence of Interface Barrier on Lateral Transport Properties for Metal/Semiconductor Systems" Jpn.J.Appl.Phys.33, Pt.1. 3971-3978 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Kasaya, S.Yamauchi, M.Hirai, M.Kusaka, M.Iwami, H.Nakamura and H.Watabe: "Valence Band Density of States of the Iron Silicides Studied by Soft X-ray Emission Spectroscopy" J.Phys.Soc.Jpn.63. 4097-4101 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Yamauchi, M.Hirai, M.Kusaka, M.Iwami, H.Nakamura, Y.Yokota and H.Watabe: "Effect of Crystallographic Orientation of Si Substrates on SPE NiSi_2 Formation" Appl.Surf.Sci.70/71. 461-465 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Kawamoto, K.Saitoh, M.Hirai, M.Kusaka and M.Iwami: "Study of the Pd/Si (100) 2*1 System Using Soft X-rays" Surf.Sci.287/288. 151-154 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Kawamoto, M.Hirai, M.Kusaka, M.Iwami, and H.Watabe: "Valence Band Density of States of Paradium Silicides Studied by X-ray Emission Spectroscopy (XES)" Jpn.J.Appl.phys.32, Pt.2. L597-L600 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Yamauchi, M.Hirai, M.Kusaka, M.Iwami, H.Nakamura, Y.Yokota, A.Akiyama and H.Watabe: "Ni-Silicide Formation : Dependence on Crystallographic Orientation of Si Substrates" Jpn.J.Appl.Phys.32, Pt.1. 3237-3246 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Kusaka, S.Kawamoto, K.Hashio, M.Hirai and M.Iwami: "Characterization of Nickel Clusters on an Amorphous Carbon Substrate by Electron Energy Loss Spectroscopy" Rep.Res.Lab.for Surf.Sci., Okayama University. 7. 101-106 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Iwami: Metal-Semiconductor Interfaces 11.Soft X-ray Emission Spectroscopy : Valence Band Electronic Structures of Silicides and Non-destructive Depth Profiling. OHM-SHA,Ed.by A.Hiraki, 1995

    • Description
      「研究成果報告書概要(欧文)」より

URL: 

Published: 1996-04-15  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi