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1994 Fiscal Year Final Research Report Summary

Analysis of the Local Bonding Structure in Silicon Nitride (Oxide) Films Deposited by Plasma-Enhanced CVD in Terms of a Charge-Transfer Model

Research Project

Project/Area Number 05650009
Research Category

Grant-in-Aid for General Scientific Research (C)

Allocation TypeSingle-year Grants
Research Field Applied materials science/Crystal engineering
Research InstitutionKanazawa University

Principal Investigator

HASEGAWA Seiichi  KANAZAWA UNIV.FAC.OF ENG.POSITION PROFESSOR, 工学部, 教授 (10019755)

Co-Investigator(Kenkyū-buntansha) INOKUMA Takao  KANAZAWA UNIV.FAC.OF ENG.POSITION ASSISTANT, 自然科学研究料, 助手 (50221784)
Project Period (FY) 1993 – 1994
KeywordsSilicon nitride / Silicon oxide / Plasma CVD / Bonding Structure / Charge-transfer model / Random bonding model / Vibrational properties / Stress
Research Abstract

Silicon nitride (SiN_x : H) and Si oxide (SiO_x : H) films are deposited using a plasma-enhanced CVD method, and the vibrational properties, the film stress, and the structure of defects are investigated as a function of the deposition conditions. The results might be summarized as :
1) In Si nitride films with a near-stoichiometric composition, the films satisfying all of the low stress, the high break-down strength, and the low etching rate can be obtained as they were deposited under conditions of both high H dilution ratio and high rf power supply. An improvement in properties of the films as insulators can be connected with a change in the local bonding structure : when the density of Si-NH-Si bonds relative to that of N-Si_3 bonds decreases, high quality films can be obtained.
2) The oscillator strength for the SiH stretching absorption is a function of the effective charge of the SiH dipole, and the values of the effective charge can be calculated using a charge-transfer model combined with the random bonding model. The calculated values of the oscillator strength for SiN_x : H and SiO_x : H films were in excellent agreement with their experimental values. The frequencies of the SiN and SiO stretching absorption are mainly dominated by the bond length and the bond angle for these bonds. It has been shown that the values of these bond length and bond angle can also connected with the sum of the partial charge on the Si and the N or O atoms.
3) The frequency of the SiH bending absorption in SiO_x : H flms, which occur in the range of 500-900 cm^<-1>, was analyzed using a molecular-orbital calculation (MOC) method. Further, the dependence of the electron spin resonance spectra as a function of the film composition, arising from Si dangling bonds, was also analyzed on the basis of the MOC.

  • Research Products

    (6 results)

All Other

All Publications (6 results)

  • [Publications] Seiichi Hasegawa: "Effects of active H on the stress relaxation of A-SiN_x" Journal of Applied Physics. 75. 1493-1500 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Seiishi Hasegawa: "Structure and bonding properties of amorphous Si nitride" Journal of Non-Crystalline Solids. (in press). (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] L.He: "SiO and SiH vibrational properties in a-SiO_x:H films" Journal of Non-Crystalline Solids. (in press). (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Seiichi HASEGAWA: "Effects of active hydrogen on the stress relaxation of amorphous SiN_x : H films" Journal of Applied Physics. 75-3. 1493-1500 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Seiichi HASEGAWA: "Structural and bonding properties of amorphous silicon nitride films" Journal of Non-Crystalline Solids. (in press). (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] L.HE: "SiO and SiH vibrational properties in amorphous SiO_x : H films (0<x<2.0) prepared by plasma-enhanced chemical vapor deposition" Journal of Non-Crystalline Solids. (in press). (1995)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1996-04-15  

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