1995 Fiscal Year Final Research Report Summary
Fabrication of Nanometer Structure and Its Application
| Project/Area Number |
06044139
|
|---|
| Research Category |
Grant-in-Aid for Overseas Scientific Survey.
|
| Allocation Type | Single-year Grants |
|---|
| Section | Joint Research |
|---|
| Research Institution | OSAKA UNIVERSITY (1995)
Tokyo National Museum (1994) |
|---|
Principal Investigator |
TAKAI Mikio Faculty of Engineering Science, Osaka University Associate Professor, 基礎工学部, 助教授 (90142306)
|
|---|
| Co-Investigator(Kenkyū-buntansha) |
SEIDL Albert Fachnochschule Magdeburg Professor, 電子工学科, 教授
LANG Walter Fraunhofer Institut fuer Festkoerpertechnologie Researcher, 研究員
BOLLMANN Dieter Fraunhofer Institut fuer Festkoerpertechnologie Researcher, 研究員
BUCHNER Reinhold Fraunhofer Institut fuer Festkoerpertechnologie Researcher, 研究員
HEBERGER Karl Fraunhofer Institut fuer Festkoerpertechnologie Director, 部長
RUGE Ingolf Fraunhofer Institut fuer Festkoerpertechnologie Director, 所長
YANAGISAWA Junichi Faculty of Engineering Science, Osaka University Assistant, 基礎工学部, 助手 (60239803)
YUBA Yoshihiko Faculty of Engineering Science, Osaka University Assistant, 基礎工学部, 助手 (30144447)
|
|---|
| Project Period (FY) |
1994 – 1995
|
| Keywords | Localized electrytic reaction / Nanometer process / STM tip / Ion scattering / Porous Si emitter / Nano-structure / Beam process / Field evaporation |
|---|
| Research Abstract |
Fabrication of nanometer structure and its application have been investigated by a joint research between Osaka University and Fraunhofer Institut fuer Feskoerpertechnologie under the International Scientific Research Program of the Ministry of Education, Science, Sport and Culture.
Localized electrolytic reaction by a scanning tunneling microscope (STM) tip, dipped in a solution, induced a localized metal deposition with a size of several hundred nanometers, while a metal-covered STM tip could realize a controlled deposition with a size of nanometer by field evaporation. Metal species could be controlled by a precise adjustment of applied pulsed-bias between the tip and a target sample, which would determine the electric field for field evaporation on the STM tip. This technique would facilitate to fabricate metal electrode structures of quantum electron devices such as single electron transistors. Nano-scale interdigital metal structures would also provide a new sensing application.
Medium energy ion scattering with and without focused ion beams has been applied to modified surface nano-structures in order to characterize the atomic positions of ad-atoms. The results were compared with those investigated by STM to exactly locate ad-atoms on crystalline surface.
A silicon (Si) nanometer structure by anodization, porous Si, has been applied to electron emitter tips of field emission arrays (FEAs). FEAs with nano-structure emission tips showed enhanced emission by an order of magnitude over FEAs with conventional single crystalline Si emitter tips. Further application of nano-structures fabricated by the technique developed in this study is in progress.
|
