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1995 Fiscal Year Final Research Report Summary

Investigation on Resistance Oscillation Induced by Direct Current Electromigration

Research Project

Project/Area Number 06452221
Research Category

Grant-in-Aid for General Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field Electronic materials/Electric materials
Research InstitutionHIROSHIMA UNIVERSITY

Principal Investigator

SHINGUBARA Shoso  Hiroshima University.Engineering.Associate Professor, 工学部, 助教授 (10231367)

Co-Investigator(Kenkyū-buntansha) SAKAUE Hiroyuki  Hiroshima University.Engineering.Research Assistant, 工学部, 助手 (50221263)
HORIIKE Yasuhiro  Toyo University.Engineering.Professor, 工学部, 教授 (20209274)
Project Period (FY) 1994 – 1995
KeywordsElectromigration / Resistance Oscillation / Void / Hillock / Nonlinear / Al Interconnect / Dislocation / SEM
Research Abstract

Abrupt changes in resistance (ACRs) such as steps and oscillations are frequently observed during DC electromigration testing of Al interconnections. ACRs are observed in a interconnection which width is as large as the mean Al grain size. In vestigations are concectrated to these resistance oscillations, and it is revealed that there are two types in resistance oscillations : downward spikes and upward spikes. These spikes are further classified into quasi-periodic ones and random ones. Investigations on the current density dependence and locality and non-locality strongly suggest that origines of the upward spikes and the downward spikes are quite different. The downward spikes are local phenomena which occur within a range of several mu m, while the upward spikes are non-local phenomena which occurs in a range extending to more than several thousands mu m. A frequency of the downward spikes drastically increases with an increase in the current density, on the other hand, an amplitude increased drastically in the case of the upward spikes. It is most likely that the downward spikes correspond to the alternation of annihilation and formation of a single void, and a modeling based on the current detour effect around a high-resistance region such as a vacancy cluster well explains the current density dependence of the frequency. The mechanisms of the upward spikes are remained to be clarified, however, one possible mechanism may relate to pulsating of stress of the interconnection due to dislocation dynamics such as climb, generation and aninhilation.

  • Research Products

    (9 results)

All Other

All Publications (9 results)

  • [Publications] S.Shingubara,K.Fujiki,H.Sakaue,T.Takahagi,: "Resistance Oscillations Induced by DC Electronigration" American Institute of Physics Conference Procecdings,Stress-Induced Phenomena in Metallization-Third Workshop. 373. 248-262 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Shingubara,K.Fujiki,A.Sano,K.Inoue,H.Sakaue,M.Saitoh and Y.Horiike: "Resistance Oscillations Induced by Direct Current Electromigration" Jpn.J.Appl.Phys.34. 1030-1036 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Shingubara,I.Utsunomiya and T,Takahagi: "Interaction of a Void and a Grain Boundaty Under a High Electric Current Stress Fmploying Three-donersional Melecular Pynamcs Simnlatuio" Applied Surface Science. 91. 220-226 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 新宮原正三、宇都宮勇夫、藤井泰三: "アルミニウム配線中のボイドのエレクトロマイグレーション挙動の分子動力学シミュレーション" 電子情報通信学会論文誌. J78-C. 294-304 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Shingubara,I.Utsunomiya and T,Fujii: "Molecnlar Dynamics Simulation of Void Electronigration Under a High-Density Electric Current Stress in an Aluminium Intercounection" Electronics and Communications in Japan. vol78 Part2. 82-95 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Shingubara, K.Fujiki, H.Sakaue, T.Takahagi: ""Resistance Oscillations Induced by CD Electromigration"" Stress-Induced Phenomena in Metallization AIP Conf.Proc.Vol.373. 248-262 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Shingubara, K.Fujiki, A.Sano, K.Inoue, H.Sakaue, M.Saitoh, and Y.Horiike: ""Resistance Oscillation Induced by Direct Cuttent Electromigration"" Jpn.J.Apl.Phys.vol.34. 1030-1036 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Shingubara, I.Utsunomiya, and T.Takahagi: ""Interaction of a Void and a Grain Boundary Under a High Electric Current Stress Employing Three Dimensional Molecular Dynamics Simulation"" Applied Surface Scinece. vol.91. 220-226 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Shingubara, I.Utsunomiya, and T.Fujii: ""Molecular Dynamics Simulation of Void Electromigration Under a High Density Electric Current Stress in an Aluminum Interconnection"" Electronics and Communications in Japan. vol.78 part 2. 82-95 (1995)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1999-03-09  

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