• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to project page

1995 Fiscal Year Final Research Report Summary

Growth of rare earch iron garnet on semiconductor substrates for optical integrated circuits

Research Project

Project/Area Number 06452228
Research Category

Grant-in-Aid for General Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field 電子デバイス・機器工学
Research InstitutionTokyo Institute of Technology

Principal Investigator

NAITO Yoshiyuki  Tokyo Inst.of Tech., Faculty of Eng., Professor, 工学部, 教授 (70016335)

Co-Investigator(Kenkyū-buntansha) YOKOI Hideki  Tokyo Inst.of Tech., Faculty of Eng., Research Assoc., 工学部, 助手 (90251636)
ANZAI Hiroki  Tokyo Inst.of Tech., Faculty of Eng., Research Assoc., 工学部, 助手 (80212661)
MIZUMOTO Tetsuya  Tokyo Inst.of Tech., Faculty of Eng., Assoc.Professor, 工学部, 助教授 (00174045)
Project Period (FY) 1994 – 1995
Keywordshetero-epitaxy / rare-earth iron garnet / semiconductor laser / optical isolator / optical integrated circuit / Rutherford backscattering measurement / sputtering
Research Abstract

The purpose of this study is to make epitaxial growth of a magnetooptic crystal like a rare-earth iron garnet, (BiY)_3Fe_5O_<12>, on an InP substrate, which enables us to integrate an optical isolator with a semiconductor laser on a single substrate. The most important issue to be solved is large lattice mismatch between (BiY)_3Fe_5O_<12> and InP.To overcome this, we proposed to introduce a BaF_2buffer layr whose lattice constant is just a half of (BiY)_3Fe_5O_<12>.
The optimum growth condition of BaF_2 on a (111) InP substrate has been found for vacuum evaporation. A BaF_2 layr of high crystalline quality, i.e.the channeling minimum yield of 6% in the Rutherford backscattering and channeling measurement, was obtained at a low substrate temperature of 140゚C.Also, the dependence of BaF_2 lattice constant on the substrate temperature was investigated to find the optimum growth condition of (BiY)_3Fe_5O_<12> on it.
The growth condition of (BiY)_3Fe_5O_<12> was investigated to realize the lattice constant which is just twice of BaF_2. The optimum target composition was Bi_<0.25>Y_<2.75>Fe_<5.95>O_<12>. The lattice constant of grown layr can be adjusted by controlling the substrate temperature as well as a gas mixture ratio of Ar and O_2.
Although each elementary process mentioned above was successfully investigated, the final process of integrating (BiY)_3Fe_5O_<12> on a BaF_2 layr was unsuccessful. This can be mainly attributed to the difference of thermal expansion coefficient between (BiY)_3Fe_5O_<12> and BaF_2. The scheme to reduce this influence should be investigated to realize the epitaxial growth of (BiY)_3Fe_5O_<12> on an InP substrate.

  • Research Products

    (12 results)

All Other

All Publications (12 results)

  • [Publications] M.Totoki,et al.: "Direct bonding between InP and Gd_3Ga_5O_<12> for integrating semiconductor and magnetooptic devices" Japanese Journal of Applied Physics. 34. 510-514 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Totoki,et al.: "The effect of total reactor pressure on GaInSb grown on Gd_3Ga_5O_<12> substrate by metal organic chemical vapor deposition" Japanese Journal of Applied Physics. 34. 3491-3496 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Yokoi,et al.: "Optical propagation loss increase of (GdBi) _3Fe_5O_<12> films caused by sputter etching" Japanese Journal of Applied Physics. 34. 4817-4818 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Yokoi,et al.: "Direct bonding between InP and rare earth iron garnet grown on Gd_3Ga_5O_<12> substrate by liquid phase epitaxy" Electronics Letters. 31. 1612-1613 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Totoki,et al.: "Direct bonding for the integration of optical isolator with III-V semiconductors" CLEO 95 Technical Digest. 149-150 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Yokoi,et al.,: "Loss increase of (LuNdBi) _3 (FeAl) _5O_<12> films caused by sputter etching" Japanese Journal of Applied Physics. 33. 6355-6359 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Totoki, et al.: ""Direct bonding between InP and Gd_3Ga_5O_<12> for integrating semiconductor and magnetooptic devices"" Japanese Journal of Applied Physics. Vol.34. 510-514 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Totoki, et al.: ""The effect of total reactor pressure on GaInSb grown on Gd_3Ga_5O_<12> substrate by metal organic chemical vapor deposition"" Japanese journal of Applied Physics. vol.34. 3491-3496 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Yokoi, et al.: ""Optical propagation loss increase of (GdBi)_3Fe_5O_<12> films caused by sputter etching" Japanese Journal of Applied Physics. vol.34. 4817-4818 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Yokoi, et al.: ""Direct bonding between InP and rare earth iron garnet grown on Gd_3Ga_5O_<12> substrate by liquid phase epitaxy"" Electronics Letters. vol.31. 1612-1613 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Totoki, et al.: ""Direct bonding for the integration of optical isolatro with III-V semiconductors"" CLEO 95 Technicla Digest. 149-150 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Yokoi, et al.: ""Loss increase of (LuNdBi)_3 (FeAl)_5O_<12> films caused by sputter etching"" Japanese Journal of Applied Physics. vol.33. 6355-6359 (1994)

    • Description
      「研究成果報告書概要(欧文)」より

URL: 

Published: 1997-03-04  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi