Development of the appratus for making the ultra-fine particles for EEM utilizing atmospheric plasma CVD

1995 Fiscal Year Final Research Report Summary

• Project/Area Number: 06555038
• Research Category: Grant-in-Aid for Developmental Scientific Research (B)
• Allocation Type: Single-year Grants
• Research Field: 機械工作・生産工学
• Research Institution: Osaka University
• Principal Investigator: MORI Yuzo Osaka Univ.Faculty of Eng.Prof., 工学部, 教授 (00029125)
• Co-Investigator(Kenkyū-buntansha): SANO Yasuhisa Osaka Univ.Faculty of Eng.Research Asst, 工学部, 助手 (40252598) ; YAMAMURA Kazuya Osaka Univ.Faculty of Eng.Research Asst, 工学部, 助手 (60240074) ; YAMAUCHI Kazuto Osaka Univ.Facutly of Eng.Assoc.Prof., 工学部, 助教授 (10174575)
• Project Period (FY): 1994 – 1995
• Keywords: EEM / atmospheric plasma / ultra-fine particle / SiH_4 / plasma CVD

Research Abstract

This study aims at making ultra-fine particles for EEM (Elastic Emission Machining). EEM is one of the most precision machining method, utilizing chemical reaction in solid phase between the particle surface and the work surface. So that chemical properties and reactivities of each surface atoms is very important. And it is neccesary to select the optimum combination of the particle and the work to achieve efficient machining properties.
To protect atmospheric plasma from arc discharge, the electrode surface was coated with ceramics. And the appratus for making the ultra-fine particles for EEM utilizing atmospheric plasma CVD was realized. Using the appratus, it was found that ultra-fine particles (about 50nm in diameter) of Si was made from SiH_4, and that SiH_4 was decomposed more efficiently by using He than Ar as carrier gas. It was also found that to collect the ultra-fine particles just after the plasma region dispersively directly to the pure water (the atmospheric pressure's merit), the collection efficency of the ultra-fine particles was up to nearly 100%.