1996 Fiscal Year Final Research Report Summary
Improved Gas Barrier Properties of PET Fillms by SiOx deposition
| Project/Area Number |
06555192
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| Research Category |
Grant-in-Aid for Scientific Research (A)
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| Allocation Type | Single-year Grants |
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| Section | 試験 |
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| Research Field |
Composite materials/Physical properties
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| Research Institution | Shizuoka University |
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Principal Investigator |
INAGAKI Norihiro Shizuoka University, Faculty of Engineering.Professor, 工学部, 教授 (30022015)
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| Co-Investigator(Kenkyū-buntansha) |
HASEGAWA Tetsu Fujimori Kogyo Co., Researcher, 包装研究所, 研究員
TASAKA Shigeru Shizuoka University, Faculty of Engineering.Assciate Professor, 工学部, 助教授 (10134793)
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| Project Period (FY) |
1994 – 1996
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| Keywords | SiOx / Gas barrier / PET film / Packaging material / Plasma Polymerization / Oxygen permeability / Tetramethylsilane / Tetramethoxysilane |
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| Research Abstract |
The project named "Improved Gas Barrier Properties of PET Films by SiOx Deposition" was conducted to improve gas barrier properties of PET film used for food packing materials. The SiOx deposition by plasma polymerization of organic silicone compounds was applied for the improvement. Main results are summerized as follows,
1.SiOx films could be formed by the plasma polymerization of mixtures of tetramethylsilane (TMS) or tetramethoxysilane (TMOS) and oxygen.
2.Mixing of oxygen, when TMS and TMOS were polymerized, contributed the formation of SiOx films.
3.Remote oxygen plasma accelerated the degradation of alkyl groups in TMS and TMOS effectively to deposite SiOx.
4.The mixture of TMOS and oxygen of 60 mol% was a preferable raw material for preparation of SiOx film by plasma polymerization.
The SiOx deposition on PET film showed powerful improvement of gas barrier properties. Oxygen pearmeation rate from the PET film (80nm SiOx thickness) was 14cm^3/m^2-day-atm, which is four times lower than the original PET film without SiOx deposition.
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