1995 Fiscal Year Final Research Report Summary
Formation of Ceramic-Coated Materials by RF Sputtering Method and the Materials Evaluation using Molecule dynamics
| Project/Area Number |
06650107
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| Research Category |
Grant-in-Aid for General Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Research Field |
Materials/Mechanics of materials
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| Research Institution | KYOTO UNIVERSITY |
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Principal Investigator |
HOSHIDE Toshihiko Kyoto Univ., Graduate School, Assoc.Prof.of Engineering, 工学研究科, 助教授 (80135623)
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| Project Period (FY) |
1994 – 1995
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| Keywords | Ceramic thin film / Coated materials / Molecular dynamics / RF sputtering / Ultra-micro-hardness / Bending strength / Surface roughness / Coating condition |
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| Research Abstract |
Sputtering process of ceramics on glass substrate and its evaluation based on molecule dynamics were investigated in this project.
Thin films of alumina and silicon carbide were deposited on the substrate of borosilicate in an RF magnetron spattering apparatus. The hardness of the spattered films, as a tribological property, was evaluated by using an ultra-microscopic hardness testing machine. It was found that the hardness decreased with increasing RF output power in both ceramic films. Bending tests of coated materials, as a bulk strength property, was also carried out under 3-point bending. Some coated materials, especially under lower RF output power, showed lower strength than the glass substrate. In this situation, flaws which caused final fracture, were observed around the interface between coating film and substrate.
A molecular dynamics approach was tried to estimate the internal stress field in sputtered film. A hard-sphere 3D model was adopted in the molecular dynamics of sputtered particles. Based on empirical information, cluster of sputtered particles was assumed to be larger with increasing RF output power. The experimental result was explained qualitatively by using the proposed analytical method.
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Research Products
(2 results)
