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1997 Fiscal Year Final Research Report Summary

MELT GROWTH OF SEMICONDUCTORS IN WEIGHTLESS ENVIRONMENT

Research Project

Project/Area Number 07044125
Research Category

Grant-in-Aid for international Scientific Research

Allocation TypeSingle-year Grants
SectionJoint Research
Research Field Electronic materials/Electric materials
Research InstitutionThe University of Tokyo

Principal Investigator

NISHINAGA Tatau  University of Tokyo, Graduate School of Engineering, Professor, 大学院・工学系研究科, 教授 (10023128)

Co-Investigator(Kenkyū-buntansha) HUO C.  中国科学院, 物理研究所, 準教授
GE P.  中国科学院, 物理研究所, 準教授
NIE Y.  中国科学院, 物理研究所, 副所長準教授
NARITSUKA Shigeya  University of Tokyo, Graduate School of Engineering, Assistant, 大学院・工学系研究科, 助手 (80282680)
TANAKA Masaaki  University of Tokyo, Graduate School of Engineering, Associate Professor, 大学院・工学系研究科, 助教授 (30192636)
NIE Yuxin  Institute of Physics, Chinese Academy of Sciences, Vice President, Associate Pro
GE Peiwen  Institute of Physics, Chinese Academy of Sciences, Associate Professor
HUO Chongru  Institute of Physics, Chinese Academy of Sciences, Associate Professor
Project Period (FY) 1995 – 1997
Keywordsmicrogravity / space experiment / Space Shuttle / GAS program / GaSb / melt growth / Te impurity / Bridgman growth
Research Abstract

The present project has been conducted from April 1995 to March of 1998. During this period, two major works have been carried out.
1) Characterization of Te-doped GaSb grown in space by Chinese recoverable satellite No.14
By the joint work between Institute of Physics, Chinese Academy of Sciences and The Graduate School of Engineering, The University of Tokyo, GaSb was grown in space in 1992. The grown crystal was characterized by chemical etching and by spatially resolved photoluminescence. The chemical etching showed that dislocation increase just after the growth starts but then decreases finally to zero. This means the crystal was grown under the condition of very small stress during and after the growth. This is because both the melt and the grown crystal was floating in the quartz ampoule.
Te concentration was determined by spatially resolved photoluminescence. It was shown that the concentration drops sharply at the interface between unmelted and regrown parts due to the segregation effect. However, it recovers very quickly suggesting the impurity transport in the melt is governed by pure diffusion. This means that although free surface was present during the growth in space, no Marangoni flow was induced. The reason for this observation is not clear but probably there was very thin oxide layr on the melt which might prevent the onset of Marangoni flow.
2) Preparatory works for the melt growth of GaSb in space by NASA GAS program
In this joint work, China group designed and fabricated electric furnace for the melt growth of GaSb. The furnace was consisted of windings and a temperature profile of a constant gradient was realized. Japanese side made evacuated quartz ampoules in which GaSb single crystal of 10 mm in diameter and 10 cm in length was put. The experiment was finally conducted in the end of January 1998 by Space Shuttle STS 89. After the flight, the GAS container was sent to China and now under the evaluation of the flight experiment.

  • Research Products

    (22 results)

All Other

All Publications (22 results)

  • [Publications] 西永 頌, P.Ge, C.Huo, J.He, 中村 卓義, 河村 茂雄: "微小重力下で成長させたGaSb:Teの評価" 東京大学工学部総合研究所年報. 54. 79-84 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 西永 頌, 中村 卓義, 河村 茂雄, P.Ge, C.Huo: "空間分解フォトルミネッセンス法による微小重力下で成長させたGaSb:Teの濃度分布測定" 第12回宇宙利用シンポジウム会議録. 12. 235-239 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 西永 頌, P.Ge, C.Huo, W.Huang, 中村 卓義, Y.Yu: "NASAのGASプログラムによるGaSbのブリッジマン成長" 日本マイクログラビディ応用学会誌. 12. 265-266 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] P.Ge, T.Nishinaga, C.Huo, W.Huang, T.Nakamura, J.He, and Y.Yu:"Bridgman growth of GaSb crystal:Plan and ground based research" Proc.46th International Astronautical Congress,Oct.2-6/Oslo,Norway,. 46. 1-7 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 中村 卓義, 西永 頌, P.Ge, C.Huo: "中国の回収型衛星によるGaSbのブリッジマン成長" 日本結晶成長学会誌. 23. 138 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 中村 卓義, 西永 頌, P.Ge, C.Huo: "微小重力下で成長させたGaSbにおけるTeの濃度分布とその解析" 日本マイクログラビディ応用学会誌. 13. 330-331 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Nakamura, T.Nishinaga, P.Ge, and C.Huo,: "Concentration Profile of Te in Space Grown GaSb Measured by Spatially Resolved PL" Record of 15th Electronic Materials Symposium,1996,Nagaoka,. 15. 233-236 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Nishinaga: "Utilization of of Microgravity for Melt Growth of Semiconductor" Proc.2nd Int.Symp.on Advanced Seience and Technology of Silicon Materials,Kona,Hawaii. 2. 505-511 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Nishinaga, P.Ge, C.Huo, J.He and T.Nakamura: "Melt Growth of striation and etch pit free GaSb under microgravity" J.Crystal Growth. 174. 96-100 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 中村 卓義, 西永 頌: "微小重力下で成長させたGaSbにおけるTeの横断面濃度分布" 第14回宇宙利用シンポジウム会議録. 14. 118-121 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Nishinaga and P.Ge: "Strain free Bridgman growth of GaSb under microgravity" ITIT International Symposium on Materials Synthethis under Microgrvity Circumstances for Industrial Application,. 1. 10-15 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Nishinaga, Peiwen Ge, Chongru Huo, Jinping He, T.Nakamura, S.Kawamura: "Characterization of Te doped GaSb grown under microgravity" Annual Report of Engineering Research Institute, faculty of Engineering, The University of Tokyo. 54. 79-84 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Nishinaga, T.Nakamura, S.Kawamura, P.Ge, C.Huo: "Te concentration profile in space grown GaSb measured by spatially resolved photoluminescence" 12th ISAS Space Utilization Symposium. 12. 235-239 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Nishinaga, P.Ge, C.Huo, W.Huang, T.Nakamura, Y.Yu: "Bridgman Growth of GaSb by NASA GAS Program-Planning and Ground Experiments" J.Japan.Soc.Microgravity Appl.12. 265-266 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] P.Ge, T.Nishinaga, C.Huo, W.Huang, T.Nakamura, J.He and Y.Yu: "Bridgman growth of GaSb crystal : Plan and ground based research" Proc.46th International Astronautica' Congress, Oct.2-6/Osio, Norway. 46. 1-7 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Nakamura, T.Nishinaga, P.Ge, C.Huo: "Bridgeman Growth of GaSb by Chinese Recoverable Satellite" J.Japan.Assoc.Crystal Growth. 23. 138 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Nakamura, T.Nishinaga, P.Ge, C.Huo: "Concentration Profile of Te in Space-Grown GaSb and Theoretical Analysis" J.Japan.Soc.Microgravity Appl.13. 330-331 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Nakamura, T.Nishinaga, P.Ge, and C.Huo: "Concentration Profile of Te in Space Grown GaSb Measured by Spatially Resolved PL" Record of 15th Electronic Materials Symposium, 1996, Nagaoka. 15. 233-236 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Nishinaga: "Utilization of of Microgravity for the Melt Growth of Semiconductor" Proc.2nd Int.Symp.on Advanced Science and Technology of Silicon Materials, Kona, Hawaii. 2. 505-511 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Nishinaga, P.Ge, C.Huo, J.He and T.Nakamura: "Melt Growth of striation and etch pit free GaSb under microgravity" J.Crystal Growth. 174. 96-100 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Nakamura, T.Nishinaga, P.Ge, C.Huo: "Te distribution in transverse cross sections of GaSb grown under microgravity" 14th ISAS Space Utilization Symposium. 14. 118-121 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Nishinaga and P.W.Ge: "Strain free Bridgman growth of GaSb under microgravity" ITIT International Symposium on Materials Synthethis under Microgrvity Circumstances for Industrial Application. 1. 10-15 (1998)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1999-03-16  

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