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1996 Fiscal Year Final Research Report Summary

Study on effect of discharge frequency on particle growth in high frequency plasma.

Research Project

Project/Area Number 07458093
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field プラズマ理工学
Research InstitutionKYUSHU UNIVERSITY

Principal Investigator

WATANABE Yukio  KYUSHU UNIVERSITY,GRADUATE SCHOOL OF INFORMATION SCIENCE AND ELECTRICAL ENGINEERING,PROFESSOR, 大学院・システム情報科学研究科, 教授 (80037902)

Co-Investigator(Kenkyū-buntansha) FUKUZAWA Tsuyoshi  KYUSHU UNIVERSITY,GRADUATE SCHOOL OF INFORMATION SCIENCE AND ELECTRICAL ENGINEER, 大学院・システム情報科学研究科, 助手 (70243904)
KAWASAKI Hiroharu  KYUSHU UNIVERSITY,GRADUATE SCHOOL OF INFORMATION SCIENCE AND ELECTRICAL ENGINEER, 大学院・システム情報科学研究科, 助手 (10253494)
Project Period (FY) 1995 – 1996
Keywordsparticles / dust / discharge frequency dependence / silane plasma / high frequency plasma / coagulation / plasma CVD
Research Abstract

Discharge frequency dependence of growth processes of particles in silane rf discharges have been studied in a size range above a few nanometers as parameters of discharge frequency. A seies of experiments have given the following results : particles nucleate and grow around the plasma/sheath boundary by the rf electrode for all discharge frequencies ; increasing the discharge frequency under a constant power, a growth rate of particles in the rapid growth phase decreases, while they begin to be observed earlier after the discharge initiation due to the increase in their density ; a density of particles of -10nm in size is comparable to or even higher than that of ions, and hence almost of them are neutral. These results can not be explained by the conventional thermal coagulation model, suggesting that high energy electrons above several 10's eV play an important role to ionize a part of neutral particles in their rapid growth. In order to explain properly most of these exprimental features, a particle coagulation model is proposed.

  • Research Products

    (11 results)

All Other

All Publications (11 results)

  • [Publications] Yukio Watanabe: "Growth processes of particles in high frequency silane plasmas" J.Vac.Sci.Technol.A. 14,2. 540-545 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Masaharu Shiratani: "In-situ polarization-sensitive laser-light scattering method for simultanious measurements of two dimensional spatial size and density distributions of particles in plasmas" J.Vac.Sci.Technol.A. 14,2. 603-607 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 渡辺征夫: "プラズマ化学気相堆積技術における微粒子発生メカニズムとその応用" 応用物理. 65,6. 594-600 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Yukio Watanabe: "Contribution of short lifetime radicals to growth of particles in SiH_4 HF discharges and effects of particles on deposited films" J.Vac.Sci.& Technol.A. 14,3. 995-1001 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Masaharu Shiratani: "Simultaneous in-situ measurements of properties in rf silane plasmas using a polarization-sensitive laser-light-scattering method" L.Appl.Phys.79,1. 104-109 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Hiroharu Kawasaki: "Study on Growth Processes of Particles in rf SiH_4 Plasmas" Proc.3rd Int.Conf.Reactive Plasma/14th Symp.Plasma Processes. 3. 351-352 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Kawasaki, Y.Ueda, T.Yoshioka, T.Fukuzawa, M.Shiratani and Y.Watanabe: "Discharge frequency dependences of particulate growth in high frequency silane plasmas" Appl. Phys. Lett.Vol.67. 3880-3882 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Shiratani, H.Kawasaki, T.Fukuzawa, T.Yoshioka, Y.Ueda, S.Singh and Y.Watanabe: "Simultaneous in-situ measurements of properties in rf silane plasmas using a polarization-sensitive laser-light-scattering method" J.Appl. Phys.Vol.79. 104-109 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Watanabe, M.Shiratani, H.Kawasaki, S.Singh, T.Fukuzawa, Y.Ueda and H.Ohkura: "Growth processes of particles in high frequency silane plasmas" J.Vac. Sci. & Technol. A. Vol.14. 540-545 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Watanabe, M.Shiratani, T.Fukuzawa, H.Kawasaki, Y.Ueda, S.Singh and H.Ohkura: "Contribution of short lifetime radicals to growth of particles in SiH_4 HF discharges and effects of particles on deposited films" J.Vac. Sci. & Technol. A. Vol.14. 995-1001 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Watanabe: "Generation mechanism of particles in plasma chemical vapor deposition and its application" Oyo Butsuri. Vol.65. 594-600 (1996)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1999-03-09  

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