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1996 Fiscal Year Final Research Report Summary

Study of Film Growth Mechanism and Development of Coaxial Line Type MPCVD System with Longitudinal Magnetic Field

Research Project

Project/Area Number 07650383
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionWaseda University

Principal Investigator

KATO Isamu  Waseda Univ.School of Sci.and Eng.Professor, 理工学部, 教授 (80063775)

Project Period (FY) 1995 – 1996
Keywordsmicrowave plasma / D.C.magnetic field / electron density / a-Si : H / plasma stabilization / high speed deposition / spatial after-grow plasma / depression of charged particle diffusion
Research Abstract

The purposes of this study are [1] to plan discharge stabilization and high concentration of the electron density because of depressing diffusion of plasma toward the discharge tube wall by applying a D.C.magnetic field parallel to the electric field of microwave in the coaxial-line type microwave plasma fabrication system, moreover [2] to perform CVD in low temperature and stable plasma by connecting a film deposition chamber which is designed not to enter both D.C.magnetic field and microwave power in the film deposition chamber and to generate spatial after-grow plasma which is not supplied microwave power.
In the year of 1995, using Ar gas or N_2 gas which is relatively easy to discharge, mainly we have executed discharge experiments, and it was clarified that plasma which is stable under low gas pressure and high electron density is obtained though discharge is nustable and the electron density decreases in conventional no magnetic field system. Moreover, the same experiment for H_2 gas which is relatively difficult to discharge was executed, and the expectation that stable and high electron density plasma can be obtained for H_2 gas was cleared, then the initial purpose [1] was completed.
In the year 1996, the experiments were executed with notice for mainly film deposition, it was clarified that higher film deposition was performed without deterioration of films compared with the case of no magnetic field when Ar gas or N_2 gas was used. Moreover, when H_2 gas was used it was clarified that stable and high electron density plasma was obtained by application of the magnetic field of about 1400 Gauss and high speed film deposition was performed at 7 */s though a deposition the of a-Si : H film was very low for H_2 gas pressure because the electron density is in no magnetic field, then the purposes [1] and [2] were completed.

  • Research Products

    (34 results)

All Other

All Publications (34 results)

  • [Publications] Naganori Takezawa,Isawa Kato: "Refractive Index Measurement of Silicon Thin Films Using Slab Optical Waveguides" JJAP. Vol. 36 No. 2. 920-925 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Taro Kamiko,Toshinori Morita,Tadahiko Ando,Isamu Kato: "Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type Microwave Plasma (IV)" Proceedings of ICRP-3/SPP-14. P3-12. 403-404 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Naganori Takezawa,Nobuyuki Koshiji,Isamu Kato: "In situ Measurement of Change of Ultra Thin Films In Elapsed Time Using Optical Fiber Sensor" Proceedings of ICRP-3/SPP-14. P1-33. 148-149 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Hirotaka Ogihara,Hidetaka Iizuka,Nobuyuki Koshiji,Isamu Kato: "Separation of Film, Surface Heating Effect and lon Implanting Effect" Proceedings of ICRP-3/SPP-14. IVa-6. 57-58 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Xuantong Ying,Yoshinori Morita,Taro Kamiko,Isamu Kato: "Fabrication of SiN Films by Using Coaxial Line Type MPCVD System with Longitudinal Magnetic Field" Proceedings of ICRP-3/SPP-14. P1-31. 144-145 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Naganri Takezawa,Isamu Kato: "In Situ Measurement of the Optical Constant of Ultra Thin Films Using Optical Fiber Sensor" SPIE Proceedings. Vol.2997. (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Isamu Kato,Toru Matsushita,Makoto Yamashita: "Dependence of Plasma Parameters on Parameters on Electric Potential of Electrode in Microwave in Plasma" Electronics and Communications in Japan. Vol.79No.5. 58-65 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 加藤勇、下田毅、山岸俊浩: "二重管式同軸線路形マイクロ波プラズマCVDにおけるN_2/SiH_4プラズマのパラメーターの空間分布" 電気学会論文誌A. Vol.116-A No.7. 617-622 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 森田義則、加藤勇、中島達治: "RPバイアス印加同軸線路形マイクロ波プラズマCVDにおけるSiN膜の低温作製" 電子情報通信学会論文誌. VolJ79-C-II. 303-310 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 山下真、萩原博隆、加藤勇: "MPCVDにおける膜前面のシース電圧の制御と膜質" 第13回「プラズマプロセシング研究会」プロシ-ディングス. 1B3-3. 109-112 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 山岸俊浩、神子太郎、森田義則、加藤勇: "同軸線路形マイクロ波プラズマにおける印加磁界の影響(III)" 第13回「プラズマプロセシング研究会」プロシ-ディングス. 2C-2. 175-178 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 神子太郎、山岸俊浩、森田義則、加藤勇: "同軸線路形マイクロ波プラズマにおける印加磁界の影響(II)" 第13回「プラズマプロセシング研究会」プロシ-ディングス. 1A1-4. 13-16 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Naganori Takezawa,Isamu Kato: "Optical Energy Gap Measurement of Semiconductor Ultrathin Films Using Optical Waveguides" JJAP. Vol. 35 No5A. 2826-2832 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 加藤勇、松下亨、山下真: "マイクロ波プラズマ中に設置した電極の電位がプラズマパラメータに与える影響" 電子情報通信学会論文誌. J79-C-II No1. 1-7 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Isamu Kato,Toshiyuki Yoneda,Toru Matsushita,Makoto Yamashita: "Control of Radical Species in Microwave Plasma Chemical Vapor Deposition" Electronics and Communications in Japan. Vol. 78 No. 10. 97-104 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Isamu Kato,Toshiyuki Yoneda,Toru Matsushita: "Influence of lon Bombardment on a-Si : II Films Fabricated by Plasma Chemical Vapor Deposition" Electronics and Communications in Japan. Vol. 78 No. 2. 70-78 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 加藤勇、米田俊之、松下亨、山下真: "マイクロ波プラズマCVDにおけるラジカル種の制御" 電子情報通信学会論文誌. J78-C-II No. 4. 142-148 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Naganori Takezawa, Isamu Kato: "In situ Measurement of Optical Constant of Ultra Thin Films Using Optical Fiber Sensor" SPIE Proceedings. Vol.2997. (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Naganori Takezawa, Isamu Kato: "Refractive Index Measurement of Silicon Thin Films Using Optical Waveguides" JJAP. Vol.36. 920-925 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Xuantong Ying, Yoshinori Morita, Taro Kamiko, Isamu Kato: "Fabrication of SiN Film by Using Coaxial Line Type MPCVD System with Longitudinal Magnetic Field" Proceedings of ICRP-3/SPP-14. P1-31. 144-145 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Taro Kamiko, Yoshinori Morita, Tadahiko Ando, Isamu Kato: "Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type of Micro Wave Plasma (IV)" Proceedings of ICRP-3/SPP-14. P3-12. 403-404 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Hirotaka Ogihara, Hidetaka Iizuka, Nobuyuki Koshiji, Isamu Kato: "Separation of Film Surface Heating Effect and Ion Implanting Effect" Proceedings of ICRP-3/SPP-14. IV a-6. 57-58 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Naganori Takezawa, Nobuyuki Koshiji: "In situ Measurement of Change of Ultra Thin Films In Elapsed Time Using Optical Fiber Sensors" Proceedings of ICRP-3/SPP-14. P1-33. 148-149 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Isamu Kato, Tsuyoshi Shimoda, Toshihiro Yamagishi: "Spatial Distribution of Plasma Parameter in N2/SiH4 Plasma in Double Tubed Coaxial Line Type Microwave Plasma CVD System" Trans IFF of Japan. Vol.116-A,No.7. (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Yoshinori Morita, Isamu Kato: "Fabrication of SiN Films at Low Temperature Using RF Biased Coaxial-Line Type Microwave Plasma" Trans.of EIC of Japan. Vol.J79-C-II. 303-310 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Isamu Kato, Toru Matsushita, Makoto Yamashita: "Dependence of Plasma Parameters on Electric Potential of Electrode in Microwave Plasma" Electronics and Communications in Japan. Vol.79 No.5. 58-65 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Naganori Takezawa, Isamu Kato: "Optical Energy Gap Measurement of Semiconductor Ultrathim Films Using Optical Waveguides" JJAP. Vol.35 No.5A. 2826-2832 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Taro Kamiko, Toshihiro Yamagishi, Yoshinori Morita: "Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type Microwave Plasma (II)" Proceedings of SPP-14. 1A-4. 13-16 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Toshihiro Yamagishi, Yaro Kamiko, Yoshinori Morita, Isamu Kato: "Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type Microwave Plasma (III)" Proceedngs of SPP-14. 2C-2. 175-178 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Makoto Yamashita, Hirotaka Ogihara, Isamu Kato: "Film Deposition under Control of Sheath Voltage on the Film Surface" Proceedings of SPP-14. IB3-3. 109-112 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Isamu Kato, Toru Matsushita, Makoto Yamashita: "Dependence of Plasma Parameters on Electric Potential of Electrode in Microwave Plasma" Trans.of EIC of Japan. J79-C-II・No.1. 1-7 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Isamu Kato, Toshiyuki Yoneda, Toru Matsushita, Makoto Yamashita: "Control of Radical Species in Microwave Plasma Chemical Vapor Deposition" Electronics and Communications in Japan. Vol.78 No.10. 97-104 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Isamu Kato, Toshiyuki Yoneda, Toru Matsushita, Makoto Yamashita: "Control of Radical Species in Microwave Plasma CVD" Trans.of EIC of Japan. J78-C-II,No.1. 142-148 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Isamu Kato, Toshiyuki Yoneda, Toru Matsushita: "Influence of Ion Bombardment of a-Si : H Film Fabricated by Plasma Chemical Vapor Deposition" Electronics and Communications in Japan. Vol.78 No.2. 70-78 (1995)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1999-03-09  

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