1997 Fiscal Year Annual Research Report

半導体プロセス用低温高周波プラズマの理論体系の確立

Research Project

Project/Area Number	08044169
Research Institution	Keio University
Principal Investigator	真壁利明慶應義塾大学, 理工学部, 教授 (60095651)
Co-Investigator(Kenkyū-buntansha)	中野誠彦慶應義塾大学, 理工学部, 助手 (40286638) PETROVIC Zor Univ. of Belgrade, Institute of Phys., Research P NESS Kevin F James Cook Univ. Physics Department, Lecturer ROBSON Rober James Cook Univ. Physics Department, Reader
Keywords	rf電子輸送論 / rf電子異常拡散 / ボルツマン方程式 / ICPプラズマ / ICP熱機構 / E×B電子輸送 / トモグラフィー診断 / プラズマモデリング
Research Abstract	低温RF(MW)プラズマを用いた半導体ドライプロセス技術が実用化されて以来、10余年を経て、この技術がマイクロ(ナノ)エレクトロニクスの加工技術として基盤技術の位置を獲得している。先端技術を競う我が国と米国では、低温プラズマとそこで繰り広げられる諸機能のモデリングを通したプラズマプロセスデサインの時代に入ろうとしている。しかし既存の知識理論体系内での技術展開には限界がある。この現実打開のために本学術研究(3カ国共同研究)を企画した。その結果、成果として (1).Boltzmann方程式によるrf電子輸送理論体系の確立。(Makabe,Petrovic;Phys.Rev.E55,5901,1997), (2).マグネトロンプラズマやICPで要となるE×B電子輸送を具体的に算出するコードを構築し重要なAr中の輸送を解明。(Ness,Makabe;to be published), (3).緩和連続(RCT)モデルの理論的再検証(Robson,Makabe;Annals of Physics261,74 1997)と、RCT/Boltzmann方程式モデルを提案し、電子/イオンの位相空間輸送の具体的算出コードを構築。(Makabe,Nakano;J.Vac.Sci. Technol.A16,294,1998), (4).ICPの補助励起機構、{E_r×B_Z(t)}・E_θ電子加熱の存在を時間分解、2次元CT診断から実証し(2)の重要性を確認。(Makabe,Ptrovic;Phys.Rev.E57,R43,1998), (5).プラズマエッチングで表面から放出される高速分子の2次元輸送論を構築し、具体的な輸送例をA1エッチングで例示し、再付着効果の定量化手法を確立。(Makabe,Nakano;to be published),を得た。理論体系の基幹となる各項目の詳細は各公刊論文を参照のこと。各成果(1〜5)を統合する形で、2次元プラズマリアクターのデザインとウェハ-エッチングプロセスのモデリングに具体的に応用したいと考えている。

Research Products
(18 results)

All Other

All Publications (18 results)

[Publications] Jun Matsui: "Electon transport to a substrate ina radio frequency capacitively coupled plasma by the Boltzmann equation" J.Vac.Sci.Technol.A. 16・1. 294-299 (1998)
[Publications] M.Tadokoro: "Time resolved optical emission spectroscopy of an inductively couplec plasma in argon and oxygen" Phys.Rev.E(Rapid Communication). 57・1. R43-R46 (1998)
[Publications] R.E.Robson: "Charged particle transport in harmonically varying electric fields: Foundations and Phenomenology" Annals of Physics. 261・1. 74-113 (1997)
[Publications] A.Okigawa: "Three dimensional optical emission tomography of an inductively coupled plasma" Jpn.J.Appl.Phys.36・7B. 4605-4616 (1997)
[Publications] R.Hashido: "Two-dimensional transport of submicton particles in capacitively coupled plasma reactor" Jpn.J.Appl.Phys.36・6A. 3707-3713 (1997)
[Publications] K.Maeda: "Diffusion tensorin electron transport in gases in a radio-frequency field" Phys.Rev.E. 55・5B. 5901-5908 (1997)
[Publications] T.Makabe: "Toward charging free plasma prcesses:phase space modeling between pulsed plasma and microtrench" Proceedings of 3rd Int.Symp.On Plasma Process-Induced Damage. 1. (1998)
[Publications] J.Matsui: "Electron and Ion Transport in a charged micro-trench" Proceedings of 193rd Meetings of Electrochemical society. (1998)
[Publications] M.Hasebe: "2D modeling of nonvolatile particle transport from etched surface in RIE" Proceedings of 15^<th> Symp.On Plasma Processing. 1. 186-189 (1998)
[Publications] J.Matsui: "Electron and Ion transport to/ in a Topographical etched surface in plasma presessing(I)" Proceedings of 15^<th> Symp.On Plasma Processing. 1. 190-193 (1998)
[Publications] N.Nakano: "Modeling of dual frequency capacitively coupled plasma by two dimensional relaxation contimuum model" Proceedings of 15^<th> Symp.On Plasma Processing. 1. 194-197 (1998)
[Publications] K.Iyanagi: "Effect of metastableso on 2D-RF inductively coupled plasma in Ar by usingRCT model" Proceedings of 15^<th> Symp.On Plasma Processing. 1. 198-201 (1998)
[Publications] T.Makabe: "Modeling and diagnostics for an ICP in a collision dominated region" Bulletin of the American Phys.Soc.42・8. 1772- (1997)
[Publications] J.Matsui: "Electron transport to a substrate in an rf capacitively coupled plasma by the Boltzmann equation" Bulletin of the American Phys.Soc. 42・8. 1745- (1997)
[Publications] H.Hasebe: "Nonvolatile particle transport from etched surface in 2-D CCP modelling" Bulletin of the American Phys.Soc. 42・8. 1731- (1997)
[Publications] M.Kurihara: "Electron transport in CF4 by using DNP of the Boltzmann equation" Bulletin of the American Phys.Soc. 42・8. 1705- (1997)
[Publications] T.Kitajima: "Two-Demission profile of parallel plate rf plasma.-effect of driving frequency-" Bulletin of the American Phys.Soc. 42・8. 1742- (1997)
[Publications] K.Iyanagi: "Two dimensional modeling of Ar RF ICP by RCT model" Bulletin of the American Phys.Soc. 42・8. 1750- (1997)

1997 Fiscal Year Annual Research Report

半導体プロセス用低温高周波プラズマの理論体系の確立

Principal Investigator

真壁 利明 慶應義塾大学, 理工学部, 教授 (60095651)

Research Products

[Publications] Jun Matsui: "Electon transport to a substrate ina radio frequency capacitively coupled plasma by the Boltzmann equation" J.Vac.Sci.Technol.A. 16・1. 294-299 (1998)

[Publications] M.Tadokoro: "Time resolved optical emission spectroscopy of an inductively couplec plasma in argon and oxygen" Phys.Rev.E(Rapid Communication). 57・1. R43-R46 (1998)

[Publications] R.E.Robson: "Charged particle transport in harmonically varying electric fields: Foundations and Phenomenology" Annals of Physics. 261・1. 74-113 (1997)

[Publications] A.Okigawa: "Three dimensional optical emission tomography of an inductively coupled plasma" Jpn.J.Appl.Phys.36・7B. 4605-4616 (1997)

[Publications] R.Hashido: "Two-dimensional transport of submicton particles in capacitively coupled plasma reactor" Jpn.J.Appl.Phys.36・6A. 3707-3713 (1997)

[Publications] K.Maeda: "Diffusion tensorin electron transport in gases in a radio-frequency field" Phys.Rev.E. 55・5B. 5901-5908 (1997)

[Publications] T.Makabe: "Toward charging free plasma prcesses:phase space modeling between pulsed plasma and microtrench" Proceedings of 3rd Int.Symp.On Plasma Process-Induced Damage. 1. (1998)

[Publications] J.Matsui: "Electron and Ion Transport in a charged micro-trench" Proceedings of 193rd Meetings of Electrochemical society. (1998)

[Publications] M.Hasebe: "2D modeling of nonvolatile particle transport from etched surface in RIE" Proceedings of 15^<th> Symp.On Plasma Processing. 1. 186-189 (1998)

[Publications] J.Matsui: "Electron and Ion transport to/ in a Topographical etched surface in plasma presessing(I)" Proceedings of 15^<th> Symp.On Plasma Processing. 1. 190-193 (1998)

[Publications] N.Nakano: "Modeling of dual frequency capacitively coupled plasma by two dimensional relaxation contimuum model" Proceedings of 15^<th> Symp.On Plasma Processing. 1. 194-197 (1998)

[Publications] K.Iyanagi: "Effect of metastableso on 2D-RF inductively coupled plasma in Ar by usingRCT model" Proceedings of 15^<th> Symp.On Plasma Processing. 1. 198-201 (1998)

[Publications] T.Makabe: "Modeling and diagnostics for an ICP in a collision dominated region" Bulletin of the American Phys.Soc.42・8. 1772- (1997)

[Publications] J.Matsui: "Electron transport to a substrate in an rf capacitively coupled plasma by the Boltzmann equation" Bulletin of the American Phys.Soc. 42・8. 1745- (1997)

[Publications] H.Hasebe: "Nonvolatile particle transport from etched surface in 2-D CCP modelling" Bulletin of the American Phys.Soc. 42・8. 1731- (1997)

[Publications] M.Kurihara: "Electron transport in CF4 by using DNP of the Boltzmann equation" Bulletin of the American Phys.Soc. 42・8. 1705- (1997)

[Publications] T.Kitajima: "Two-Demission profile of parallel plate rf plasma.-effect of driving frequency-" Bulletin of the American Phys.Soc. 42・8. 1742- (1997)

[Publications] K.Iyanagi: "Two dimensional modeling of Ar RF ICP by RCT model" Bulletin of the American Phys.Soc. 42・8. 1750- (1997)

真壁利明慶應義塾大学, 理工学部, 教授 (60095651)