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2000 Fiscal Year Final Research Report Summary

"Control of surface and interfaces of nano-structures for single electron devices"

Research Project

Project/Area Number 08247101
Research Category

Grant-in-Aid for Scientific Research on Priority Areas

Allocation TypeSingle-year Grants
Research InstitutionHOKKAIDO UNIVERSITY

Principal Investigator

HASEGAWA Hideki  Hokkaido Univ., Grad.School of Eng., Pro., 大学院・工学研究科, 教授 (60001781)

Co-Investigator(Kenkyū-buntansha) SAWAKI Nobuhiko  Nagoya Univ., Grad. School of Eng., Pro.., 工学研究科, 教授 (70023330)
KOMA Atsushi  Univ. of Tokyo, Grad.School of Sci., Pro, 理学系研究科, 教授 (00010950)
IWAMI Motohiro  Okayama Univ., Fuclty of Science, Pro., 理学部, 教授 (80029123)
SUGANO Takuo  Toyo Univ., Faculty of Eng., Pro.., 工学部, 教授 (50010707)
YASUDA Yukio  Nagoya Univ., Grad.School of Eng., Pro.., 工学研究科, 教授 (60126951)
Project Period (FY) 1996 – 1999
KeywordsSingle electron devices / nanostructure / surfaces and interfaces / tunnel barrier / quantum dot / quantum devices / atomic-scale control / high-density intgration
Research Abstract

The pupose of this research was to control surfaces and interfaces of nanostructures in an atomic scale and its application to the device processing techniques for fabricating and integrating novel single electron devices. The main results are listed below.
(l) Novel GaAs- and InGaAs-based single electron transistors having Schottky in-plane and wrap gates were proposed and fabricated. They operated at high temperatures and achieved the voltage gain greater than unity. Furthermore, small-scale integrated circuits such as logic inverter circuits and binary decision diagram (BDD) circuits were stuccessfully fabricated.
(2) Variotus types of Si-based quantum structures and devices were fabricated and characterized. Coulomb staircase and single electron transport through nano-crystal Si dots were observed at room temprature. In addition, quantized conductance was seen for the first time in vertical-type Si transistor with a 20-nm channel. Coulomb blockade phenomena were found in a narrow Si channel where a hopping transport is dominant. A novel structure for single electron devices was proposed on the basis of asymmetric tunneling barriers.
(3) Surface properties of SiC and GaSe were investigated in an atomic scale. Formation processes of metal particles with nanometer sizes on the reconstructed SiC surfaces were clarified. Furthermore, a novel process for formtion of GaAs quantum dots on the GaSe-terminated (111) Si surface was realized.
(4) Tunneling time and propagation process of wave packet in quantun dots were theoretically investigated.

  • Research Products

    (198 results)

All Other

All Publications (198 results)

  • [Publications] K.Jinushi: "Novel GaAs-Based Single-Electron Transistors with Schottky In-Plane Gates Operating up to 20K"Jpn.J.Appl.Phys.. 35. 1132-1139 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Kasai: "Fabrication and Characterization of Navel Lateral Surface Superlattice Structure Utilizing Schottky Barrier Height Control by Doped Silicon Interface Control Lavers"Jpn.J.Appl.Phys.. 35. 1340-1347 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Fujikura: "Photoluminescence and Cathodoluminescence Investigation of Optical Properties of InP-Based InGaAs Ridge Quantum Wires Formed by Selective Molecular Beam Epitaxy"Jpn.J.Appl.Phys.. 35. 1333-1339 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Fujikura: "Surface Passivation of InGaAs Ridge Quantum Wires Using Silicon Interface Control Laver"J.Vac.Sci.Technol.B. 14. 2888-2894 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Hashizume: "Quantum Transport in A Schottky In-Plane-Gate Controlled GaAs/ AlGaAs Quantum Well Wires"Phisica B. 227. 42-45 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Tomozawa: "Design and Fabrication of GaAs/AlGaAs Single Electron Transistors Based on In-Plane Schottky Gate Control of 2DEG"Phisica B. 227. 112-115 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Fujikura: "Fabrication of InP-Based InGaAs Ridge Quantum Wires Utilizing Selective Molecular Beam Epitaxial Growth on (311)A Facets"J.Electron.Mater. 25. 619 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Kasai: "Electron Beam Induced Current Characterization of Novel GaAs Quantum Nanostructures Based on Potential Modulation of 2DEG by Schottky In-Plane Gates"Jpn.J.Appl.Phys. vol.34, part1. No.12B 6652-6658 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Okada: "Realization of GaAs-Based Small Quantum Structures by Schottky In-Plane-Gate Control of 2DEG"Proceedings of the 23rd International Conference on the Physics of Semiconductors. 1237-1240 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.0kada: "Realization of GaAs-Based Small Quantum Structures by Schottky In-Plane-Gate Control of 2DEG"Proceedings of 23rd International Conference on the Physics of Semiconductors. 1237-1240 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 長谷川英機: "化合物半導体量子細線および量子ドットの製作"光学. 25巻、8号. 448-455 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 長谷川英機: "化合物半導体量子構造表面の Si 超薄膜界面制御層によるパッシべーション"表面科学. 17巻、9号. 567-574 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Araki: "Fabrication of InGaAs Quantum Wires and Dots by Selective Molecular Beam Epitaxial Growth on Various Mesa-Patterned (001) InP Substrates"Jpn.J.Appl.Phys.. 36. 1763-1769 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Fujikura: "Excitation Power Dependent Photoluminescence Behavior in Etched Quantum Wires Having Silicon Interlayer-Based Edge Passivation and Its Interpretation"Jpn.J.Appl.Phys.. 36. 1937-1943 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Kasai: "Fabrication and Characterization of GaAs Single Electron Devices Having Single and Multiple Dots Based on Schottky In-Plane-Gate and Wrap-Gate Control of Two Dimensional Electron Gas"Jpn.J.Appl.Phys.. 36. 1678-1685 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Okada: "0bservation of Coulomb Blockade Oscillations up to 50K in Gated InGaAs Ridge Quantum Wires Grown by Molecular Beam Epitaxy in InP substrates"Jpn.J.Appl.Phys.. vol.36, part1. No.3B 1672-1677 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Kudoh: "Controlled Formation of Metal-Semiconductor Interface to 2DEG Layer by In-Situ Electrochemical Process and Its Application to In-Plane Gated Electron Waveguide Devices"Appl.Sur.Sci. vol.117/118. 342-346 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Kihara: "Effect of Mis-Orientation of Mesa-Stripes on the Growth of InGaAs Quantum Wires by Selective Molecular Beam Epitaxy"Appl.Sur.Sci.. Vol.117/118. 385-389 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Hasegawa: "Excitation Power Dependent Photoluminescence Characterization of Insulator-Semiconductor Interfaces on Near Surface Quantum Structures Passivated by Silicon Interface Control Layer Technology"Appl.Surf.Sci.. 117/118. 710-713 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Ikeya: "Successful Surface Passivation of Air-Exposed AlGaAs by a Silicon Interface Control LAyer-Based Technique"Jpn.J.Appl.Phys.. vol.36, part1. No.3B, 1756-1762 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Fujikura: "Formation of Two-Dimensional Arrays of InP-Based InGaAs Quantum Dots on Patterned Substrates by Selective Molecular Beam Epitaxy"Jpn.J.Appl.Phys.. 36. 4092-4096 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Okada: "Basic Control Characteristics of Novel Schottky In-Plane and Wrap Gate Structures Studied by Simulation and Transport Measurements in GaAs and InGaAs Quantum Wires"Jpn.J.Appl.Phys.. vol.36, part1. No.6B 4156-4160 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Ishikawa: "Kink defects and fermi level pinning on (2x4) reconstructed molecular beam epitaxially grown surfaces of GaAs and InP studied by ultrahigh-vacuum scanning tunneling microscopy and X ray photoelectron spectroscopy"J.Vac.Sci.Technol.B. vol.15. 1163-1172 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Hasegawa: "Evolution Mechanism of Nearly-Pinning Platinum/N-Type Indium Phosphide Interface with a High Schottky Barrier Height by In-Situ Electrochemical Process"J.Vac.Sci.Technol.B. vol.15. 1227-1235 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Hashizume: "Dominant Electron Trap with Metastable state in Molecular Beam Epitaxial GaAs Grown at Low Temperatures"Jpn.J.Appl.Phys.. vol.36. 1775-1780 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Ikeya: "Successful Surface Passivation of Air-Exposed AlGaAs by a Silicon Interface Control Layer-Based Technique"Jpn.J.Appl.Phys.. vol.36. 1756-1762 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Dohmae: "Capacitance-Voltage Behavior of Insulated Gate InGaAs HEMT Capacitor Having Silicon Interface Control Layer"Jpn.J.Appl.Phys.. vol.36. 1834-1840 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Ishikawa: "Missing-dimer structures and their kink defects on molecular beam epitaxially grown (2x4) reconstructed (001) InP and GaAs surfaces studied by ultrahigh-vacuum scanning tunneling microscopy"Jpn.J.Appl.Phys.. vol.36. 1749-1755 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Yoshida: "Characterization of Interface Electronic Properties or Low Temperature Ultrathin Oxides and Oxynitrides Formed on Si (111) Surfaces by Contactless Capacitance-Voltage and Photoluminescence Methods"Jpn.J.Appl.Phys.. vol.36. 1453-1459 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Sato: "30), S.Uno, T.Hashizume and H.Hasegawa : "Large Schottky Barrier Heights on Indium Phosphide-Based Materials Realized by In-Situ Electrochemical Process"Jpn.J.Appl.Phys.. vol.36. 1811-1817 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Hasegawa: "Interface-controlled Schottky barriers on InP and related materials"Solid-State Electron. 41. 1441-1450 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Iizuka: "Small-Signal Response of Interface States at Passivated InGaAs Surfaces from Low Frequencies up to Microwave Frequencies"Solid-State Electron. 41. 1463-1468 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Suzuki: "Fabrication and electrical characterization of InP-based insulated gate power HEMTs using ultrathin Si interface control layer"Solid-State Electron.. 41. 1641-1646 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Hasegawa: "Electrochemical Formation and Characterization of Schottky In-Plane and Wrap Gate Structures for Realization of GaAs- and InP-Based Quantum Wires and Dots"Appl.Surf.Sci.. 123/124. 335-338 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Hashizume: "Surface Passivation of GaAs with Ultrathin Si3N4/Si Interface Control Layer Formed by MBE and In Situ ECR Plasma Nitridation"Appl.Surf.Sci. 123/124. 599-602 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Takahashi: "Novel InP Metal-Insulator-Semiconductor Structure Having an Ultrathin Silicon Interface Comctrol Layer"Appl.Surf.Sci. 123/124. 615-618 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] B.Adamowicz: "Computer analysis of Surface Recombination process at Si and compound semiconductor surfaces and behayior of surface recombination velocity"Japanese Journal of Applied Physics. 37. 1631-1637 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Takahashi: "Novel InP Metal-Insulator-Semiconductor Structure Having and Ultrathin Silicon Interface Control Layer"Applied Surface Science. 123/124. 615-618 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Satoh: "Computer Simulation and Experimental Characterization of Single Electron Transistors Based on Schottky Wrap Gate Control of 2DEG"Japanese Journal of Applied Physics. 37. 1584-1590 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Fujikura: "Controlled Formation of Narrow and Uniform InP-Based In0.53Ga0.47As Ridge Quantum Wire Arrays by Selective Molecular Beam Epitaxy"Japanese Journal of Applied Physics. 37. 1584-1590 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Hashizume: "Surface Passivation of GaAs with Ultrathin Si3N4/SiInterface Control Layer Formed by MBE and in situ ECR Plasma Nitridation"Applied Surface Science. 123/124. 599-602 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N.Tsurumi: "In-situ Tunneling Microscope Study of Formation Process of Ultrathin Si Layer by Molecular Beam Epitaxy on GaAs (001 )-(2x4) Surface"Japanese Journal of Applied Physics. 37. 1501-1507 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Hashizume: "In-Situ Contactless Characterization of Microscopic and Macroscopic Properties of Si-doped MBE-Grown (2x4) GaAs Surfaces"Japanese Journal of Applied Physics. 37. 1626-1630 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Hasegawa: "Electrochemical Formation and Characterization of Schottky In-Plane and Wrap Gate Structures for Realization of GaAs- and InP-Based Quantum Wires and Dots"Applied Surface Science. 123/124. 335-338 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Ishikawa: "Scanning tunneling microscopy and x-ray photoelectron spectroscopy studies of atomic level structure and Fermi Level pinning on GaAs (110) surfaces grown by molecular beam epitaxy"Journal of Vacuum Science and Technology B. 16. 2387-2394 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Chakraborty: "Formation of ultrathin oxynitride layers on Si (100) by low-temperature electron cyclotron resonance N20 plasma oxynitridation process"Journal of Vacuum Science and Technology B. 16. 2159-2164 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] B.Adamowicz: "Photoluminescence characterization of air exposed AlGaAs surface and passivated ex situ by ultrathin silicon interface control layer"Physica E. 2. 261-266 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Sai: "Gas Source Molecular Beam Epitaxial Growth of Inl-xGaxP on GaAs Using Tertiarybutylphosphine"Japanese Journal of Applied Physics. 38. 151-158 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Satoh: "Voltage Gain in GaAs-Based Lateral Single Electron Transistors Habing Three Schottky Wrap Gates"Japanese Journal of Applied Physics. 38. 415-417 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Fujikura: "Control of Dot Size and Tunneling Barrier Profile in In0.53Ga0.47As Coupled Quantum Wire-Dot Structures Grown by Selective Molecular Beam Epitaxy on Patterned InP Substrates"Japanese Journal of Applied Physics. 38. 421-424 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Sai: "Study of Reflection High-Energy Electron Diffraction Oscillation for Optimization fo Tertiarybutylposphine-Based Molectular Beam Epitaxial Growth of In0.48GaO.52P on GaAs"Japanese Journal of Applied Physics. 38. 824-831 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Fujikura: "Extra-Side-Facet Control in Selectrive Molecular Beam Epitaxial Growth of InGaAs Ridge Quantum Wires for Improvement of Wire Uniformity"Japanese Journal of Applied Physics. 38. 1067-1070 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Muranaka: "Size-Controlled Formation of Decananometer InGaAs Quantum Wires by Selective Molecular Beam Epitaxy on InP Patterned Substrates"Japanese Journal of Applied Physics. 38. 1071-1074 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Hasegawa: "Fermi Level Pinning and Schottky Barrier Height Control at Metal Semiconductor Interfaces of GaN and Related Materials"Japanese Journal of Applied Physics. 38. 1098-1102 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Sato: "Strong Correlation Between Interface Microstructure and Barrier Height in n-InP Schottky Contacts Formed by In Situ Electrochemical Process"Japanese Journal of Applied Physics. 38. 1103-1106 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.B.Takeyama: "Interfacial Reaction and Electrical Properties in the Sputter-Deposited At/Ti Ohmic Contact to n-InP"Japanese Journal of Applied Physics. 38. 1115-1118 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Takahashi: "X-ray Photoelectron Spectroscopy and Ultrahigh Vacuum Contactless Capacitance-Voltage Characterization of Novel Oxide-Free InP Passivation Process Using a Silicon Surface Quantum Well"Japanese Journal of Applied Physics. 38. 1128-1132 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] C.Kaneshiro: "Electrochemical Etching of Indium Phosphide Surfaces Studied by Volammetry and Scanned Probe Microscopes"Japanese Journal of Applied Physics. 38. 1147-1152 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] B.Adamowicz: "Electronic Properties of AlxGal-xAs Surface Passivated by Ultrathin Silicon Interface Control Layer"Applied Surface Science. 141. 326-332 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Fujikura: "Selective Growth of Quantum Wire-Dot Coupled Structures with Novel High Index Facets for InGaAs Single Electron Transistor Arrays"Microelectronics. 30. 397-401 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Mutoh: "Effects of Initial Surface Reconstruction on Silicon Interface Control Layer Based Passivation of (001) GaAs Surfaces Studied in an Ultrahigh-Vacuum Multichamber System"Japanese Journal of Applied Physics. 38. 2538-2543 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Yoshida: "A Novel Non-Destructive Characterization Method of Electronic Properties of Pre- and Post-Processing Silicon Surfaces Based on Ultrahigh-Vacuum Contactless Capacitance-Voltage Measurements"Japanese Journal of Applied Physics. 38. 2349-2354 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Hasegawa: "Properties of Metal-Semiconductor Interfaces Formed on n-Type GaN"Japanese Journal of Applied Physics. 38. 634-2639 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Sato: "Formation of Size- and Position-Controlled Nanometer Size Pt Dots on GaAs and InP Substrates by Pulsed Electrochemical Deposition"Japanese Journal of Applied Physics. 38. 2448-2452 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] J.Nakamura: "Transport Properties of Schottky In-Plane-Gate GaAs Single and Coupled Quantum Wire Transistors"Inst.Phys.Conf.Ser.. 162. 409-414 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N.Ono: "Study of Selective MBE Growth on Patterned (001) InP Substrates Toward Realization of $$\langle100\rangle$$-Oriented InGaAs Ridge Quantum Wires"Inst.Phys.Conf.Ser.. 162. 385-390 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] C.Kaneshiro: "Realization of Strongly Metal-Dependent Schottky Barrier Heights on n GaAs by In Situ Electrochemical Process"Inst.Phys.Conf.Ser. 162. 585-590 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Muranaka: "Realization of InP-Based InGaAs Single Electron Transistors on Wires and Dots Grown by Selective MBE"Microelectronic Engineering. 47. 201-203 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Okada: "GaAs-Based Single Electron Logic and Memory Devices Using Electro-Deposited Nanometer Schottky Gates"Microelectronic Engineering. 47. 285-287 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Sai: "Growth of Device Quality InGaP/GaAs Heterostructures by Gas Source Molecular Beam Epitaxy using Tertiarybutylphosphine"Solid State Electronics. 43. 1541-1546 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Takahashi: "In-situ Characterization Technique of Compound Semiconductor Heterostructure Growth and Device Processing Steps Based on UHV Contactless Capacitance-Voltage Measurement"Solid State Electronics. 43. 1561-1570 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Koyama: "Formation Processes and Properties of Schottky and Ohmic Contacts on n-type GaN form Field Effect Transistor Applications"Solid State Electronics. 43. 1483-1488 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] A.Hamamatsu: "Formation of <001>-Aligned Nano-Scale Pores on (001) n-InP Surfaces by Photoelectrochemical Anodization in HCl"J.Electroanalytical Chem.. 473. 223-229 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Hasegawa: "Molecular Beam Epitaxy and Device Applications or III-V Semiconductor Nanowires"MRS Bulletin. 24. 25-30 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] B.Adamowicz: "Computer Simulation of the Surface Photovoltage on Si and GaAs Surfaces with U-shaped Surface State Continuum"Vacuum. 54. 173-177 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Hasegawa: "Properties of nanometer-sized metal-semiconductor interfaces of GaAs and InP formed by an in situ electrochemical process"Journal of Vacuum Science and Technology B. 17. 1856-1866 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Okada: "Characterization of GaAs Schottky in-plane gate quantum wire transistors for switching of quantized conductance"Physica B. 272. 23-126 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Kasai: "Conductance oscillation characteristics of GaAs Schottky wrap-gate single electron transistors"Physica B. 272. 88-91 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 長谷川英機: "量子構造と MBE"Crystarl Letters. 51. 8-9 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Hasegawa: "Unpinning of Fermi level in nanometer-sized Schottky contacts on GaAs and InP"Applied Surface Science. 166. 92-96 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Takahashi: "In situ UHV contactless C-V and XPS characterization of surface passivation process for InP using a partially nitrided Si interface control layer"Applied Surface Science. 166. 526-531 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Fujikura: "Formation of device-oriented InGaAs coupled quantum structures by selective MBE growth on patterned InP substrates"Physica E. 7. 864-869 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] C.Jiang: "Vertical barrier layer formation during selective MBE growth of InGaAs ridge quantum wires on InP patterned substates"Physica E. 7. 902-906 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Hasegawa: "Prospects and Key Issues for Compound Semiconductor Quantum Devices"Tehcnical Report of IEICE. ED2000-51. 43-48 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Iyawa: "Chemical and Electrochemical Nanofabrication Processes for Schottky In-Plane Gate GaAs Single and Coupled Quantum Wire Transistors"Jpn.J.Appl.Phys.. 39. 4651-4652 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Fujikura: "Electrochemical Formation of Uniform and Straight Nano-Pore Arrays on (001) InP Surfaces and Their Photoluminescence Characterizations"Jpn.J.Appl.Phys.. 39. 4616-4620 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Yoshida: "Ultrahigh-Vacuum Contactless Capacitance-Voltage Characterization of Hydrogen Terminated-Free Silicon Surfaces"Jpn.J.Appl.Phys.. 39. 4504-4508 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Sato: "Electrical Properties of Nanometer-Sized Schottky Contacts on n-GaAs and n-InP Formed by in Situ Electrochemical Process"Jpn.J.Appl.Phys.. 39. 4609-4615 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Yamada: "Fabrication and Characterization of Novel Oxide-Free InP Metal-Insulator-Semiconductor FETs Having an Ultra Narrow Si Surface Ouantum Well"Jpn.J.Appl.Phys.. 39. 2439-2443 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Ootomo: "Nitridation of GaP (1OO) Surfaces by rf Nitrogen Radicals and by Electron Cyclotron Resonance Nitrogen Plasma"Jpn.J.Appl.Phys.. 39. 2407-2413 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Muranaka: "Selective MBE Growth of InGaAs Quantum Wire-Dot Coupled Structures with Controlled Double-Barrier Potential Profiles"Inst.Phys.Conf.Ser.. 166. 187-190 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Kasai: "GaAs Quantum Wire Transistors and Single Electron Transistors using Schottky Wrap Gates for Quantum Integrated Circuits"Inst.Phys.Conf.Ser.. 166. 219-222 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Muranaka: "Origing of Non-Uniformity in MBE Grown Nanometer-Sized InGaAs Ridge Quantum Wires and Its Removal by Atomic Hydrogen-Assisted Cleanin"Thin Solid Film. 380. 189-191 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] R.Nakasaki: "Insulator-GaN interface structures formed by plasma-assisted chemical vapor deposition"Physica E. 7. 953-957 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] B.Adamowicz: "Analysis of photoluminescence efficiency and surface recombination velocity of MBE-grown AlGaAs layers"Thin Solid Films. 367. 180-183 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] B.Adamowicz: "Computer analysis of photon-induced non-equilibrium phenomena at Si and AlGaAs surfaces"Vacuum. 57. 111-120 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] B.Adamowicz: "Computer Analysis of The Fermi Level Behavior at SiO2/n-GaAs Interfaces"Electron Technology. 33. 249-252 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Kasai: "GaAs-Based Single Electron Transistors and Logic Inverters Utilizing Schottky Wrap-Gate Controlled Quantum Wires and Dots"Japanese Journal of Applied Physics (in press). 40. (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Sato: "Electrical Properties of Nanometer-Sized Schottky Contacts for Gate Control of III-V Single Electron Devices and Quantum Devices"Japanese Journal of Applied Physics. 40 (in press). (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Jinushi, H.Okada, T.Hashizume and H.Hasegawa: "Novel GaAs-Based Single-Electron Transistors with Schottky In-Plane Gates Operating up to 20K"Jpn.J.Appl.Phys.. Vol.35. 1132-1139 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Kasai and H.Hasegawa: "Fabrication and Characterization of Noves Lateral Surface Superlattice Structure Utilizing Schottky Barrier Height Control by Doped Silicon Interface Control Layers"Jpn.J.Appl.Phys.. 35. 1340-1347 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Fujikura and H.Hasegawa: "Photoluminescence and Cathodoluminescence Investigation of Optical Properties of InP-Based InGaAs Ridge Quantum Wires Formed by Selective Molecular Beam Epitaxy"Jpn.J.Appl.Phys. 35. 1333-1339 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Fujikura, S.Kodama, T.Hashizume and H.Hasegawa: "Surface Passivation of InGaAs Ridge Quantum Wires Using Silicon Interface Control Layer"J.Vac.Sci.Technol. B. vol.14. 2888-2894 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Hashizume, H.Okada and H.Hasegawa: "Quantum Transport in A Schottky In-Plane-Gate Controlled GaAs/AlGaAs Quantum Well Wires"Phisica B. vol.227. 42-45 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Tomozawa, K.Jinushi, H.Okada, T.Hashizume and H.Hasegawa: "Design and Fabrication of GaAs/AlGaAs Single Electron Transistors Based on In-Plane Schottky Gate Control of 2DEG"Phisica B. vol.227. 112-115 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Fujikura and H.Hasegawa: "Fabrication of InP-Based InGaAs Ridge Quantum Wires Unltzing Selective Molecular Beam Epitaxial Growth on (311) A Facets"J.Electron. Mater.. 25. 619 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Kasai, T.Hashizume and H.Hasegawa: "Electron Beam Induced Current Characterization of Novel GaAs Quantum Nanostructures Based on Potential Modulation of 2DEG by Schottky In-Plane Gates"Jpn.J.Appl.Phys.. vol.34, Part 1, No.12B. 6652-6658 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Okada, T.Hashizume, K.Jinushi, T.Kudon and H.Hasegawa: "Realization of GaAs-Based Small Quantum Structures by Schottky In-Plane-Gate Control of 2DEG"Proceedings of the 23rd International Conference on the Physics of Semiconductors. 1237-1240 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Okada, T.Hashizume, K.Jinushi, T.Kudoh and H.Hasegawa: "Realization of GaAs-Based Small Quantum Structures by Schottky In-Plane-Gate Control of 2DEG"Proceedings of 23rd International Conference on the Physics of Semiconductors. 1237-1240 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Araki, Y.Hanada, H.Fujikura and H.Hasegawa: "Fabrication of InGaAs Quantum Wires and Dots by Selective Molecular Beam Epitaxial Growth on Various Mesa-Patterned (001) InP Substrates"Jpn.J.Appl.Phys. 36. 1763-1769 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Fujikura, M.Kubo and H.Hasegawa: "Excitation Power Dependent Photoluminescence Behavior in Etched Quantum Wires Having Silicon Interlayer-Based Edge Passivation and Its Interpretation"Jpn.J.Appl.Phys.. 36. 1937-1943 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Kasai, K.Jinushi, H.Tomozawa and H.Hasegawa: "Fabrication and Characterization of GaAs Single Electron Devices Having Single and Multiple Dots Based on Schottky In-Plane-Gate and Wrap-Gate Control of Two dimensional Electron Gas"Jpn.J.Appl.Phys. 36. 1678-1685 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Okada, H.Fujikura, T.Hashizume and H.Hasegawa: "Observation of Coulomb Blockade Oscillations up to 50K in Gated InGaAs Ridge Quantum Wires Grown by Molecular Beam Epitaxy in InP substrates"Jpn.J.Appl.Phys.. vol.36, part 1, No.3B. 1672-1677 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Kudoh, H.Okada, T.Hashizume and H.Hasegawa: "Controlled Formation of Metal-Semiconductor Interface to 2DEG Layer by In-Situ Electrochemical Process and Its Application to In-Plane Gated Electron Waveguide Devices"Appl.Sur.Sci.. vol.117/118. 342-346 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Kihara, H.Fujikura and H.Hasegawa: "Effect of Mis-Orientation of Mesa-Stripes on the growth of InGaAs Quantum Wires by Selective Molecular Beam Epitaxy"Appl.Sur.Sci.. vol.117/118. 385-389 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa, S.Kodama, K.Ikeya and H.Fujikura: "Excitation Power Dependent Photoluminescence Characterization of Insulator-Semiconductor Interfaces on Near Surface Quantum Structures Passivated by Silicon Interface Control Layer Technology"Appl.Surf.Sci.. 117/118. 710-713 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Ikeya, T.Hashizume and H.Hasegawa: "Successful Surface Passivation of Air-Exposed AlGaAs by a Silicon Interface Control LAyer-Based Technique"Jpn.J.Appl.Phys.. vol.36, part 1, No.3B. 1756-1762 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Fujikura, M.Araki, Y.Hanada, M.Kihara and H.Hasegawa: "Formation of Two-Dimensional Arrays of InP-Based InGaAs Quantum Dots on Patterned Substrates by Selective Molecular Beam Epitaxy"Jpn.J.Appl.Phys.. 36. 4092-4096 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Okada, S.Kasai, H.Fujikura, T.Hashizume and H.Hasegawa: "Basic Control Characteristics of Novel Schottky In-Plane and Wrap Gate Structures Studied by Simulation and Transport Measurements in GaAs and InGaAs Quantum Wires"Jpn.J.Appl.Phys.. vol.36, part 1, No.6B. 4156-4160 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Ishikawa, T.Fukui and H.Hasegawa: "Kink defacts and fermi level pinning on (2x4) reconstructed molecular beam epitaxially grown surfaces of GaAs and InP studied by ultrahigh-vacuum scanning tunneling microscopy and X ray photoelectron spectroscopy"J.Vac.Sci.Technol. B. vol.15. 1163-1172 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa, T.Sato and T.Hashizume: "Evolution Mechanism of Nearly-Pinning Platinum/N-Type Indium Phosphide Interface with a High Schottky Barrier Height by In-Situ Electrochemical Process"J.Vac.Sci.Technol. B. vol.15. 1227-1235 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Hashizume, S.Shiobara and H.Hasegawa: "Dominant Electron Trap with Metastable state in Molecular Beam Epitaxial GaAs Grown at Low Temperatures"Jpn.J.Appl.Phys.. vol.36. 1775-1780 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Ikeya, T.Hashizume and H.Hasegawa: "Successful Surface Passivation of Air-Exposed AlGaAs by a Silicon Interface Control Layer-Based Technique"Jpn.J.Appl.Phys.. vol.36. 1756-1762 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Dohmae, S.Suzuki, T.Hashizume and H.Hasegawa: "Capacitance-Voltage Behavior of Insulated Gate InGaAs HEMT Capacitor Having Silicon Interface Control Layer"Jpn.J.Appl.Phys.. vol.36. 1834-1840 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Ishikawa, T.Fukui and H.Hasegawa: "Missing-dimer structures and their kink defects on molecular beam epitaxially grown (2x4) reconstructed (001) InP and GaAs surfaces studied by ultrahigh-vacuum scanning tunneling microscopy"Jpn.J.Appl.Phys.. vol.36. 1749-1755 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Yoshida, T.Hashizume and H.Hasegawa: "Characterization of Interface Electronic Properties of Low Temperature Ultrathin Oxides and Oxynitrides Formed on Si (111) Surfaces by Contactless Capacitance-Voltage and Photoluminescence Methods"Jpn.J.Appl.Phys.. vol.36. 1453-1459 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Sato, S.Uno, T.Hashizume and H.Hasegawa: "Large Schottky Barrier Heights on Indium Phosphide-Based Materials Realized by In-Situ Electrochemical Process"Jpn.J.Appl.Phys.. vol.36. 1811-1817 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa: "Interface-controlled Schottky barriers on InP and related materials"Solid-State Electron.. 41. 1441-1450 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Iizuka, T.Hashizume and H.Hasegawa: "Small-Signal Response of Interface States at Passivated InGaAs Surfaces fromn Low Frequencies up to Microwave Frequencies"Solid-State Electron.. 41. 1463-1468 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Suzuki, Y.Dohmae and H.Hashegawa: "Fabrication and electrical characterization of InP-based insulated gate power HEMTs using ultrathin Si interface control layer"Solid-State Electron.. 41. 1641-1646 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa, T.Sato, H.Okada, K.Jinushi, S.Kasai and Y.Satoh: "Electrochemical Formation and Characterization of Schottky In-Plane and Wrap Gate Structures for Realization of GaAs- and InP-Based Quantum Wires and Dots"Appl.Surf.Sci.. 123/124. 335-338 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Hashizume, K.Ikeya, M.Mutoh and H.Hasegawa: "Surface Passivation of GaAs with Ultrathin Si3N4/Si Interface Control Layer Formed by MBE and In Situ ECR Plasma Nitridation"Appl.Surf.Sci.. 123/124. 599-602 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Takahashi, T.Hashizume and H.Hasegawa: "Novel InP Metal-Insulator-Semiconductor Structure Having an Ultrathin Silicon Interface Control Layer"Appl.Surf.Sci.. 123/124. 615-618 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] B.Adamowicz and H.Hasegawa: "Computer analysis of Surface Recombination process at Si and Compound semiconductor surfaces and behavior of surface recombination velocity"Japanese Journal of Applied Physics.. 37. 1631-1637 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Takahashi, T.Hashizume and H.Hasegawa: "Novel InP Metal-Insulator-Semiconductor Structure Having and Ultrathin silicon Interface Control Layer"Applied Surface Science.. 123/124. 615-618 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Satoh, S.Kasai, K.Jinushi and H.Hasegawa: "Computer Simulation and Experimental Characterization of Single Electron Transistors Based on Schottky Wrap Gate Control of 2DEG"Jpanese Journal of Applied Physics.. 37. 1584-1590 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Fujikura, Y.Hanada, M.Kihara and H.Hasegawa: "Controlled Formation of Narrow and Uniform InP-Based In0.53Ga0.47As Ridge Quantum Wire Arrays by Selective Molecular Beam Epitaxy"Japanese Journal of Applied Physics.. 37. 1584-1590 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Hashizume K.Ikeya, M.Muto and H.Hasegawa: "Surface Passivation of GaAs with Ultrathin Si3N4/SiInterface Control Layer Formed by MBE and in situ ECR Plasma Nitridation"Applied Surface Science.. 123/124. 599-602 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N.Tsurumi, Y.Ishikawa, T.Fukui and H.Hasegawa: "In-situ Tunneling Microscope Study of Formation Process of Ultrathin Si Layer Molecular Beam Epitaxy on GaAs (001)-(2x4) Surface"Japanese Journal of Applied Physics.. 37. 1501-1507 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Hashizume, Y.Ishikawa, T.Yoshida and H.Hasegawa: "In-Situ Contactless Characterization of Microscopic and Macroscopic Properties of Si-Doped MBE-Grown (2x4) GaAs Surfaces"Japanese Journal of Applied Physics. 37. 1626-1630 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa, T.Sato, H.Okada, K.Jinushi, S.Kasai and Y.Satoh: "Electrochemical Formation and Characterization of Schottky In-Plane and Wrap Gate Structures for Realization of GaAs-and InP-Based Quantum Wires and Dots"Applied Surface Science.. 123/124. 335-338 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Ishikawa, N.Tsurumi, T.Fukui and H.Hasegawa: "Scanning tunneling microscopy and x-ray photoelectron spectroscopy studies of atomic level structure and Fermi Level pinning on GaAs (110) surfaces grown by molecular beam epitaxy"Journal of Vacuum Science and Technology B. 16. 2387-2394 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Chakraborty, T.Yoshida, T.Hashizume and H.Hasegawa: "Formation of ultrathin oxynitride layers on Si (100) by low-temperature electron cyclotron resonance N2O plasma oxynitridation process"Journal of Vacuum Science and Technology B. 16. 2159-2164 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] B.Adamowicz, K.Ikeya, M.Mutoh, T.Saitoh, H.Fujikura and H.Hasegawa: "Photoluminescence characterization of air exposed AlGaAs surface and passivated ex situ by ultrathin silicon interface control layer"Physica E. 2. 261-266 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Sai, H.Fujikura and H.Hasegawa: "Gas Source Molecular Beam Epitaxial Growth of Inl-xGaxP on GaAs Using Tertiarybutylphosphine"Japnaese Journal of Applied Physics. 38. 151-158 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Satoh, H.Okada, K.Jinushi, H.Fujikura and H.Hasegawa: "Voltage Gain in GaAs-Based Lateral Single Electron Transistors Habing Three Schottky Wrap Gates"Japanese Journal of Applied Physics. 38. 415-417 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Fujikura, Y.Hanada, T.Muranaka and H.Hasegawa: "Control of Dot Size and Tunneling Barrier Profile in In0.53Ga0.47As Coupled Quantum Wire-Dot Structures Grown by Selective. Molecular Beam Epitaxy on Patterned InP Substrates"Japanese Journal of Applied Physics. 38. 421-424 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Sai, H.Fujikura and H.Hasegawa: "Study of Reflection High-Energy Electron Diffraction Oscillation for Optimization fo Tertiarybutylposphine-Based Molecutular Beam Epitaxial growth of In0.48Ga0.52P on GaAs"Japanese Journal of Applied Physics. 38. 824-831 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Fujikura, M.Kihara, and H.Hasegawa: "Extra-Side-Facet Control in Selectrive Molecular Beam Epitaxial Growth of InGaAs Ridge Quantum Wires for Improvement of Wire Uniformity"Japanese Journal of Applied Physics. 38. 1067-1070 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Muranaka, H.Okada, H.Fujikura and H.Hasegawa: "Size-Controlled Formation of Decananometer InGaAs Quantum Wires by Selective Molecular Beam Epitaxy on InP Patterned Substrates"Japanese Journal of Applied Physics. 38. 1071-1074 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa Koyama, Y and T.Hashizume: "Fermi Level Pinning and Schottky Barrier Height Control at Metal Semiconductor Interfaces of GaN and Related Materials"Japanese Journal of Applied Physics. 38. 1098-1102 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Sato, C.Kaneshiro and H.Hasegawa: "Strong Correlation Between Interface Microstructure and Barrier Height in n-InP Schottky Contacts Formed by In Situ Electrochemical Process"Japanese Journal of Applied Physics. 38. 1103-1106 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.B.Takeyama, A.Noya, Hashizume. T and H.Hasegawa: "Interfacial Reaction and Electrical Properties in the Sputter-Deposited Al/Ti Ohmic Contact to n-InP"Japanese Journal of Applied Physics. 38. 1115-1118 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Takahashi, T.Sato and H.Hasegawa: "X-ray Photoelectron Spectroscopy and Ultrahigh Vacuum Contactless Capacitance-Voltage Characterization of Novel Oxide-Free InP Passivation Process Using a Silicon Surface Quantum Well"Japanese Journal of Applied Physics. 38. 1128-1132 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] C.Kaneshiro, T.Sato and H.Hasegawa: "Electrochemical Etching of Indium Phosphide Surfaces Studied by Volammetry and Scanned Probe Microscopes"Japanese Journal of Applied Physics. 38. 1147-1152 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] B.Adamowicz, M.Miczek, K.Ikeya, M.Mutoh, T.Saitoh, H.Fujikura and H.Hasegawa: "Electronic Properties of AlxGal-xAs surface Passivated by Ultrathin Silicon Interface Control Layer"Applied Surface Science.. 141. 326-332 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Fujikura, T.Muranaka and H.Hasegawa: "Selective Growth of Quantum Wire-Dot Coupled Structures with Novel High Index Facets for InGaAs Single Electron Transistor Arrays"Microelectronics. 30. 397-401 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Mutoh, M.Tsurumi and H.Hasegawa: "Effects of Initial Surface Reconstruction on Silicon Interface Control Layer Based Passivation of (001) GaAs Surfaces Studied in an Ultrahigh-Vacuum Multichamber System"Japanese Journal of Applied Physics. 38. 2538-2543 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Yoshida, H.Hasegawa and T.Sakai: "A Novel Non-Destructive Characterization Method of Electronic Properties of Pre-and Post-Processing Silicon Surfaces Based on Ultrahigh-Vacuum Contactless Capacitance-Voltage Measurements"Japanese Journal of Applied Physics. 38. 2349-2354 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa, Y.Koyama and T.Hashizume: "Properties of Metal-Semiconductor Interfaces Formed on n-Type GaN"Japanese Journal of Applied Physics. 38. 634-2639 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Sato, C.Kaneshiro, H.Okada and T.Hasegawa: "Formation of Size-and Position-Controlled Nanometer Size Pt Dots on GaAs and InP Substrates by Pulsed Electrochemical Deposition"Japanese Journal of Applied Physics. 38. 2448-2452 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] J.Nakamura, T.Kudoh, H.Okada and H.Hasegawa: "Transport Properties of Schottky In-Plane-Gate GaAs Single and Coupled Quantum Wire Transistors"Inst.Phys.Conf.Ser.. 162. 409-414 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N.Ono, H.Fujikura and H.Hasegawa: "Study of Selective MBE Growth on Patterned (001) InP Substrates Toward Realization of $\langle100\rangle$-Oriented InGaAs Ridge Quantum Wires"Inst.Phys.Conf.Ser.. 162. 385-390 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] C.Kaneshiro, T.Sato and H.Hasegawa: "Realization of Strongly Metal-Dependent Schottky Barrier Heights on n GaAs by In Situ Electrochemical Process"Inst.Phys.Conf.Ser. 162. 585-590 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Muranaka, H.Okada, H.Fujikura and H.Hasegawa: "Realization of InP-Based InGaAs Single Electron Transistors on Wires and Dots Grown by Selective MBE"Microelectronic Engineering. 47. 201-203 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Okada, T.Sato, K.Jinushi and H.Hasegawa: "GaAs-Based Single Electron Logic and Memory Devices Using Electro-Deposited Nanometer Schottky Gates"Microelectronic Engineering. 47. 285-287 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Sai, H.Fujikura, A.Hirama and H.Hasegawa: "Growth of Device Quality InGaP/GaAs Heterostructures by Gas Source Molecular Beam Epitaxy using Tertiarybutylphosphine"Solid State Electronics. 43. 1541-1546 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Takahashi, T.Yoshida, M.Mutoh, T.Sakai and H.Hasegawa: "In-situ Characterization Technique of Compound Semiconductor Heterostructure Growth and Device Processing Steps Based on UHV Contactless Capacitance-Voltage Measurement"Solid State Electronics. 43. 1561-1570 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Koyama, T.Hashizume and H.Hasegawa: "Formation Processes and Properties of Schottky and Ohmic Contacts on n-type GaN form Field Effect Transistor Applications"Solid State Electronics. 43. 1483-1488 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] A.Hamamatsu, C.Kaneshiro, H.Fujikura and H.Hasegawa: "Formation of <001>-Aligned Nano-Scale Pores on (001) n-InP Surfaces by Photoelectrochemical Anodization in HCI"J.Electroanalytical Chem.. 473. 223-229 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa H.Fujikura and H.Okada: "Molecular Beam Epitaxy and Device Applications of III-V Senmiconductor Nanowires"MRS Bulletin. 24. 25-30 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] B.Adamowicz and H.Hasegawa: "Computer Simulation of the Surface Photovoltage on Si and GaAs Surfaces with U-shaped Surface State Continuum"Vacuum. 54. 173-177 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa, T.Sato and C.Kaneshiro: "Properties of nanometer-sized metal-semiconductor interfaces of GaAs and InP formed by an in situ electrochemical process"Journal of Vacuum Science and Technology B. 17. 1856-1866 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Okada and H.Hasegawa: "Characterization of GaAs Schottky in-plane gate quantum wire transistors for switching of quantized conductance"Physica B. 272. 23-126 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Kasai, Y.Satoh and H.Hasegawa: "Conductance oscillation characteristics of GaAs Schottky wrap-gate single electron transistors"Physica B. 272. 88-91 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa, T.Sato and S.Kasai: "Unpinning of Fermi level in nanometer-sized Schottky contacts on GaAs and InP"Applied Surface Science. 166. 92-96 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Takahashi and H.hasegawa: "In situ UHV contactless C-V and XPS characterization of surface passivation process for InP using a partially nitrided Si interface control layer"Applied Surface Science.. 166. 526-531 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Fujikura, T.Muranaka and H.Hasegawa: "Formation of device-oriented InGaAs coupled quantum structures by selective MBE growth on patterned InP substrates"Physica E. 7. 864-869 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] C.Jiang, H.Fujikura and H.Hasegawa: "Vertical barrier layer formation during selective MBE growth of InGaAs ridge quantum wires on InP patterned substates"Physica E. 7. 902-906 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa and S.Kasai: "Prospects and Key Issues for Compound Semiconductor Quantum Devices"Tehenical Report of IEICE. ED2000-51. 43-48 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa: "Advanced mesoscopic device concepts and technology"Microelectronic Engineering. 53. 29-36 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N.Negoro, H.Fujikura and H.Hasegawa: "Scanning tunneling microscopy and spectroscopy study of ultrathin Si interface control layers grown on (001) GaAs for surface passivation"Applied Surface Science. 159/160. 292-300 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Anantathanasarn, S.Ootomo, T.Hashizume and H.Hasegawa: "Surface passivation of GaAs by ultra-thin cubic GaN layer"Applied Surface Science. 159/160. 456-461 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Shiozawa, T.Yoshida, T.Hashizume and H.Hasegawa: "Correlation between interface state properties and electron transport at ultrathin insulator/Si interfaces"Applied Surface Science. 159/160. 98-103 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa: "MBE growth and applications of silicon interface control layers"Thin Solid Films. 367. 58-67 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Hasegawa, N.Negoro, S.Kasai, Y.Ishikawa and H.Fujikura: "Effects of gap states on scanning tunneling spectra observed on (110)-and (001)-oriented molecular beam epitaxy"Journal of Vacuum Science & Technology B. 18. 2100-2108 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Iyawa, S.KaH.Sai, Okada, J.Nakamura and H.Hasegawa: "Chemical and Electrochemical Nanofabrication Processes for Schottky In-Plane Gate GaAs Single and Coupled Quantum Wire Transistors"Jpn.J.Appl.Phys.. 39. 4651-4652 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Fujikura, A.Liu, A.Hamamatsu, T.Sato and H.Hasegawa: "Electrochemical Formation of Uniform and Straight Nano-Pore Arrays on (001) InP Surfaces and Their Photoluminescence Characterizations"Jpn.J.Appl.Phys.. 39. 4616-4620 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Yoshida and H.Hasegawa: "Ultrahigh-Vacuum Contactless Capacitance-Voltage Characterization of Hydrogen Terminated-Free Silicon Surfaces"Jpn.J.Appl.Phys.. 39. 4504-4508 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Sato, S.Kasai, Okada and H.Hasegawa: "Electrical Properties of Nanometer-Sized Schottky Contacts on n-GaAs and n-InP Formed by in Situ Electrochemical Process"Jpn.J.Appl.Phys.. 39. 4609-4615 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Yamada, H.Takahashi, T.Hashizume and H.Hasegawa: "Fabrication and Characterization of Novel Oxide-Free InP Metal-Insulator-Semiconductor FETs Hving an Ultra Narrow Si Surface Quantum Well"Jpn.J.Appl.Phys.. 39. 2407-2413 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Ootomo, T.Hashizume and H.Hasegawa: "Nitridation of GaP (100) Surfaces by rf Nitrogen Radicals and by Electron Cyclotron Resonance Nitrogen Plasma"Jpn.J.Appl.Phys.. 39. 2407-2413 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Muranaka H.Fujikura and H.Hasegawa: "Selective MBE Growth of InGaAs Quantum Wire-Dot Coupled Structur es with Controlled Double-Barrier Potential Profiles"Inst.Phys.Conf.Ser.. 166. 187-190 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Kasai, Y.Satoh and H.Hasegawa: "GaAs Quantum Wire Transistors and Single Electron Transistors using Schottky Wrap Gates for Quantum Integrated Circuits"Inst.Phys.Conf.Ser. 166. 219-222 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Muranaka, C.Jiang, A.Ito and H.Hasegawa: "Origing of Non-Uniformity in MBE Grown Nanometer-Sized InGaAs Ridge Quantum Wires and Its Removal by Atomic Hydrogen-Assisted Cleaning"Thin Solid Film. 380. 189-191 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] R.Nakasaki, T.Hashizume and H.Hasegawa: "Insulator-GaN interface structures formed by plasma-assisted chemical vapor deposition"Physica E. 7. 953-957 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] B.Adamowicz and H.Hasegawa: "Analysis of photoluminescence efficiency and surface recombination velocity of MBE- grown AlGaAs layers"Thin Solid Films. 367. 180-183 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] B.Adamowicz and H.Hasegawa: "computer analysis of photon-induced non-equilibrium phenomena at Si and AlGaAs surfaces"Vacuum. 57. 111-120 (2000)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2002-03-26  

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